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Hot-filament chemical vapor deposition has been used to deposit copolymer thin films consisting of fluorocarbon and siloxane groups. The presence of covalent bonds between the fluorocarbon and organosilicon moieties in the thin film has been confirmed by Infrared, X-ray Photoelectron (XPS) and solid

Hot-filament chemical vapor deposition has been used to deposit copolymer thin films consisting of fluorocarbon and siloxane groups. The presence of covalent bonds between the fluorocarbon and organosilicon moieties in the thin film has been confirmed by Infrared, X-ray Photoelectron (XPS) and solid-state 29Si, 19F, and 13C Nuclear Magnetic Resonance (NMR) spectroscopy. The film structure consists of chains with linear and cyclic siloxane groups and CF2 groups as repeat units.

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1. A method for forming a copolymer thin film on surface of a structure, comprising the steps of:exposing at least two monomer gasses selected independently from the group consisting of organosilicons and halocarbons to a source of heat having a temperature sufficient to pyrolyze the monomer gasses,

1. A method for forming a copolymer thin film on surface of a structure, comprising the steps of:exposing at least two monomer gasses selected independently from the group consisting of organosilicons and halocarbons to a source of heat having a temperature sufficient to pyrolyze the monomer gasses, the monomer gases selected to produce upon pyrolysis sources of reactive species that include polymerizable species and that selectively promote copolymerization, the reactive species sources being in the vicinity of a structure surface on which a copolymer thin film is to be formed; wherein halocarbons are selected from the group consisting of hexafluoropropylene oxide, tetrafluoroethylene, hexafluorocyclopropane, octafluorocyclobutane, perfluorooctanesulfonyl fluoride, octafluoropropane, trifluoromethane, difluoromethane, difluorodichloromethane, difluorodibromomethane, difluorobromomethane, difluorochloromethane, trifluorochloromethane, tetrafluorocyclonronane, tetrachlorodifluorocyclopropane, trichlorotrifluoroethane, and dichlorotetrafluorocyclopropane; and maintaining the structure surface at a substantially lower temperature an that of the heat source to induce deposition and polymerization of the reactive species on the structure surface. 2. The method of claim 1, wherein one of the monomer gassed is an organosilicon.3. The method of claim 2, wherein the halocarbon is hexafluoropropylene oxide and the organosilicon is selected from the group consisting of hexamethylcyclotrisiloxane (D3) and octamethylcyclotetrasiloxane (D4).4. A halocarbon organosilicon copolymer coating prepared by the method of claim 2.5. The method of claim 1, wherein the halocarbon is hexafluoropropylene oxide.6. The method of claim 2, wherein the organosilicon is selected from the group consisting of hexamethylcyclotrisiloxane (D3) and octamethylcyclotetrasiloxane (D4).7. The method of claim 1, wherein the heat source to which the monomer gasses are exposed comprises a resistively-heated conducting filament suspended above the structure surface.8. The method of claim 1, wherein the heat source to which the monomer gasses are exposed comprises a heated plate having a pyrolysis surface that faces the structure.9. The method of either claim 7 or 8, wherein the heat source temperature is greater than about 400K, and wherein the step of maintaining the structure surface temperature comprises maintaining the structure surface at a temperature less than about 300K.10. The method of claim 1, wherein the structure comprises a length of wire.11. The method of claim 1, wherein the structure microfabrication comprises a substrate.12. The method of claim 11, wherein the structure microfabrication is an electronic circuit including at least one conducting layer having a fluorocarbon-organosilicon copolymer thin film of less than about 20 microns in thickness thereon.13. The method of claim 1, wherein the structure comprises a neural probe.14. The method of claim 1, wherein the structure comprises a razor blade.15. The method of claim 1, wherein the structure comprises a microstructure having multiple surfaces all of which are maintained at a substantially lower temperature than that of the heat source.16. A copolymer coating prepared by the method of claim 1.17. A method of forming a multilayer copolymer in film on a surface of a structure, comprising the sequential steps of:a) exposing a monomer gas to a source of heat having a temperature sufficient to pyrolyze the monomer gas, the monomer gas selected to produce upon pyrolysis a source of reactive species that selectively promotes polymerization, the reactive species being in the vicinity of a structure surface on which a polymer thin film is to be formed; and maintaining the structure surface at a substantially lower temperature than that of the heat source to induce deposition and polymerization of the reactive species on the structure surface; b) exposing at least two monomer gasses selected independently from the group consisting of organosilicons and halocarbons to a source of heat having a temperature sufficient to pyrolyze the monomer gasses, the monomer gasses selected to produce upon pyrolysis sources of reactive species that include polymerizable species and that selectively promote copolymerization, the reactive species sources being in the vicinity of the coated structure surface from step a) on which a copolymer thin film is to be formed; and maintaining the coated structure surface from step a) at a substantially lower temperature than that of the heat source to induce deposition and polymerization of the reactive species on the coated structure surface; wherein halocarbons are selected from the group consisting of hexafluoropropylene oxide, tetrafluoroethylene, hexafluorocyclopropane, octafluorocyclobutane, perfluorooctanesulfonyl fluoride, octafluoropropane, trifluoromethane, difluoromethane, difluorodichloromethane, difluorodibromomethane, difluorobromomethane, difluorochloromethane, trifluorochloromethane, tetrafluorocyclonronane, tetrachlorodifluorocyclopropane, trichlorotrifluoroethane, and dichlorotetrafluorocyclopropane; and c) exposing a monomer gas to a source of heat having a temperature sufficient to pyrolyze the monomer gas, the monomer gas selected to produce upon pyrolysis a source of reactive species that selectively promotes polymerization, the reactive species being in the vicinity of the coated structure surface from step b) on which a polymer thin film is to be formed; and maintaining the coated structure surface from step b) at a substantially lower temperature than that of the heat source to induce deposition and polymerization of the reactive species on the coated structure surface. 18. The method of claim 17, wherein one of the at least two monomer gasses is a halocarbon.19. The method of claim 17, wherein one of the at least two monomer gasses is an organosilicon.20. The method of claim 17, wherein one of the at least two monomer gasses is a halocarbon; and one of the at least two monomer gasses is an organosilicon.21. The method of claim 20, wherein the halocarbon is hexafluoropropylene oxide and the organosilicon is selected from the group consisting of D3 and D4.22. The method of claim 17, wherein the copolymer of step b) is formed from the reactive species of steps a) and c).23. The method of claim 22, wherein the reactive species from step a) is formed from an organosilicon monomer gas, and the reactive species from step c) is formed from a halocarbon monomer gas.24. The method of claim 22, wherein the reactive species from step a) is formed from a halocarbon monomer gas, and the reactive species from step c) is formed from an organosilicon monomer gas.25. The method of claim 23 or 24, wherein the halocarbon monomer gas is hexafluoropropylene oxide and the organosilicon monomer gas is selected from the group consisting of D3 or D4.26. A multilayer halocarbon organosilicon copolymer coating prepared by the method of claim 23 or 24.27. A multilayer copolymer coating prepared by the method of claim 17.28. A structure having a fluorocarbon-organosilicon copolymer thin film of less than about 20 microns in thickness thereon; wherein the fluorocarbon is selected from the group consisting of hexafluoropropylene oxide, tetrafluoroethylene, hexafluorocyclopropane, octafluorocyclobutane, perfluorooctanesulfonyl fluoride, octafluoropropane, trifluoromethane, difluoromethane, difluorodichloromethane, difluorodibromomethane, difluorobromomethane, difluorochloromethane, trifluorochloromethane, tetrafluorocyclopropane, tetrachlorodifluorocyclopropane, trichlorotrifluoroethane, and dichlorotetrafluorocyclopropane.29. The structure of claim 28, wherein the copolymer thin film as a dangling bond density less than about 1018 spins/cm3.30. The structure of claim 28, comprising a substrate having the halocarbon organosilicon copolymer thin film thereon.31. The structure of claim 30, wherein the substrate comprises a microfabrication wafer.32. A structure comprising a razor blade with a blade edge having a halocarbon organosilicon copolymer thin film thereon, wherein said film is less than about 20 microns in thickness.33. The structure of claim 32, wherein the halocarbon organosilicon copolymer thin film on the razor edge is of less than about 1 micron in thickness.34. The structure of claim 33, wherein the halocarbon organosilicon copolymer thin film on the razor edge is of less than about 0.1 micron in thickness.35. A structure comprising a neural probe having a substantially cylindrical shaft portion of a diameter less than about 100 microns and a tip portion that is of a diameter less than about 15 microns and that is connected to the cylindrical shaft portion by a tapered shaft portion, the tapered shaft and the cylindrical shaft portions of the probe having a fluorocarbon-organosilicon copolymer thin film thereon, wherein said film is less th about 20 microns in thickness.36. A structure comprising a length of wire at least a portion of which has a fluorocarbon-organosilicon copolymer thin film thereon, wherein said film is less than about 20 microns in thickness.37. The structure of claim 36, wherein the length of wire comprises a plurality of entwined wires.38. A structure comprising a ribbon cable having a fluorocarbon-organosilicon copolymer thin film thereon, wherein said film is less than about 20 microns in thickness.39. A method for forming a polymer thin film on a surface of a structure, comprising the steps of:exposing a vaporized vinyl siloxane and a vaporized initiator to a source of heat having a temperature sufficient to initiate polymerization of the vinyl siloxane in the vicinity of a structure surface on which a polymer thin film is to be formed; and maintaining the structure surface at a substantially lower temperature an that of the heat source to induce deposition and polymerization of the reactive species on the structure surface. 40. The method of claim 39, wherein the vinyl siloxane is 1,3,5-trivinyl-1,3,5-trimethylcyclotrisiloxane.41. The method of claim 39, wherein the vinyl siloxane is 1,3,5,7-tetravinyl-1,3,5,7-tetramethylcyclotetrasiloxane.42. The method of claim 39, wherein the initiator is perfluorooctane sulfonyl fluoride.43. The method of claim 39, wherein the vinyl siloxane is 1,3,5-trivinyl-1,3,5-trimethylcyclotrisiloxane, and the initiator is perfluorooctane sulfonyl fluoride.44. The method of claim 39, wherein the heat source to which the vinyl siloxane and initiator are exposed comprises a resistively-heated conducting filament suspended above the structure surface.45. The method of claim 39, wherein the heat source temperature is between about 623K and 813K, and wherein the step of maintaining the structure surface temperature comprises maintaining the structure surface at a temperature les than about 300K.46. The method of claim 39, wherein the structure comprises a length of wire.47. The method of claim 39, wherein the structure comprises a neural probe.48. The method of claim 39, wherein the structure comprises a razor blade.49. The method of claim 39, wherein the structure comprises a microstructure having multiple surfaces all of which are maintained at a substantially lower temperature than that of the heat source.50. A structure having a 1,3,5-trivinyl-1,3,5-trimethylcyclotrisiloxane polymer thin film thereon; wherein said structure is selected from the group consiting of razor blade, wire and neutral probe.51. The structure of claim 50, wherein the structure is a wire.52. The structure of claim 50, wherein the structure is a razor blade.53. The structure of claim 50, wherein the structure comprises neural probe.