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A pixel structure, which forms one element of a focal plane array, includes a bolometer having a detector and an insulator. The detector that is made from a material that absorbs incident thermal radiation and has an electrical resistance that varies in response to changes in the temperature of the

A pixel structure, which forms one element of a focal plane array, includes a bolometer having a detector and an insulator. The detector that is made from a material that absorbs incident thermal radiation and has an electrical resistance that varies in response to changes in the temperature of the material. The insulator has a plurality of serpentine legs disposed completely underneath the detector so that the insulator extends between the detector and the substrate. And the insulator supports the detector in a spaced-apart relationship with respect to the substrate to thermally isolate the detector from the substrate. To further improve the performance of the bolometer, the bolometer includes a resonant layer between the detector and the insulator. The resonant layer is disposed such that areas defined between the detector and the resonant layer, and between the resonant layer and the insulator, form first and second resonant cavities, respectively.

대표청구항 ▼

1. A pixel structure of a bolometer-based focal plane array for detecting radiation comprising:a substrate; and a bolometer comprising: a detector supported in a spaced-apart relationship with respect to said substrate, said detector adapted to absorb incident thermal radiation, wherein said detecto

1. A pixel structure of a bolometer-based focal plane array for detecting radiation comprising:a substrate; and a bolometer comprising: a detector supported in a spaced-apart relationship with respect to said substrate, said detector adapted to absorb incident thermal radiation, wherein said detector has an electrical resistance that varies in response to changes in the temperature of said detector; an insulator comprising a plurality of serpentine legs disposed completely underneath said detector, wherein said insulator extends between said detector and said substrate to support said detector in a spaced-apart relationship with respect to said substrate; and a resonant layer disposed between said detector and said insulator, wherein said resonant layer is disposed such that an area defined between said detector and said resonant layer forms a first resonant cavity, and wherein said resonant layer is disposed such that an area defined between said resonant layer and said insulator forms a second resonant cavity. 2. A pixel structure according to claim 1 wherein said detector and said insulator are disposed in respective planes and are at least partially separated by a gap.3. A pixel structure according to claim 2 wherein said substrate and said insulator are disposed in respective planes and are at least partially separated by a gap.4. A pixel structure according to claim 1 wherein said detector comprises vanadium oxide.5. A pixel structure according to claim 1 further comprising a plurality of base anchors extending between said substrate and said insulator, wherein said base anchors support said insulator in a spaced-apart relationship with respect to said substrate.6. A pixel structure according to claim 5 wherein said base anchors are frustum shaped.7. A pixel structure according to claim 5 wherein said bolometer further comprises at least one elevation anchor extending between said detector and said insulator, wherein said at least one elevation anchor supports said detector in a spaced-apart relationship with respect to said insulator.8. A pixel structure according to claim 7 wherein said at least one elevation anchor is frustum shaped.9. A pixel structure according to claim 1 wherein said insulator further at least partially reflects incident thermal radiation at least partially toward said detector.10. A pixel structure according to claim 1 wherein said plurality of serpentine legs of said insulator comprise a plurality of branches comprised of a first set of branches extending in a first direction and a second set of branches that interconnect respective branches of the first set and that extend in a second direction that is different than the first direction.11. A pixel structure comprising:a substrate; and a bolometer comprising: a detector supported in a spaced-apart relationship with respect to said substrate, said detector adapted to absorb incident thermal radiation, wherein said detector has an electrical resistance that varies in response to changes in the temperature of said detector; an insulator comprising a plurality of two-dimensional serpentine legs extending between said detector and said substrate to support said detector in a spaced-apart relationship with respect to said substrate; and a resonant layer disposed between said detector and said insulator, wherein said resonant layer is disposed such that an area defined between said detector and said resonant layer forms a first resonant cavity, and wherein said resonant layer is disposed such that an area defined between said resonant layer and said insulator forms a second resonant cavity. 12. A pixel structure according to claim 11 wherein said insulator is disposed completely underneath said detector.13. A pixel structure according to claim 11 wherein said two-dimensional serpentine legs of said insulator comprise a plurality of branches comprised of a first set of branches extending in a first direction and a second set of branches that interconnect respective branches of the first set and that extend in a second direction that is different than the first direction.14. A pixel structure according to claim 11 wherein said detector and said insulator are disposed in respective planes and are at least partially separated by a gap.15. A pixel structure according to claim 14 wherein said substrate and said insulator are disposed in respective planes and are at least partially separated by a gap.16. A pixel structure according to claim 11 wherein said detector comprises vanadium oxide.17. A pixel structure according to claim 11 further comprising a plurality of base anchors extending between said substrate and said insulator, wherein said base anchors support said insulator in a spaced-apart relationship with respect to said substrate.18. A pixel structure according to claim 17 wherein said base anchors are frustum shaped.19. A pixel structure according to claim 17 wherein said bolometer further comprises at least one elevation anchor extending between said detector and said insulator, wherein said at least one elevation anchor supports said detector in a spaced-apart relationship with respect to said insulator.20. A pixel structure according to claim 19 wherein said at least one elevation anchor is frustum shaped.21. A pixel structure according to claim 11 wherein said insulator further at least partially reflects incident thermal radiation at least partially toward said detector.22. A method of fabricating a pixel structure comprising:depositing a first sacrificial layer upon a substrate; forming a plurality of thermal impedance legs upon the first sacrificial layer; depositing a second sacrificial layer upon the thermal impedance legs; depositing a resonant layer upon the second sacrificial layer, wherein the resonant layer comprises an electrically conductive material; depositing a bolometer material upon the resonant layer, wherein the bolometer material is adapted to absorb incident thermal radiation, wherein the bolometer material has an electrical resistance that varies in response to changes in the temperature of the bolometer material, and wherein the bolometer material is deposited such that an area defined between the bolometer material and the resonant layer forms a first resonant cavity; and removing the first and second sacrificial layers such that the bolometer material is spaced-apart from the substrate, wherein the second sacrificial layer is removed such that an area defined between the thermal impedance legs and the resonant layer forms a second resonant cavity. 23. A method according to claim 22 wherein depositing the bolometer material comprises depositing the bolometer material such that the bolometer material completely covers the thermal impedance legs following the removal of the first and second sacrificial layers.24. A method according to claim 22 wherein forming the thermal impedance legs comprises forming the plurality of thermal impedance legs in a serpentine shape.25. A method according to claim 24 wherein forming the thermal impedance legs comprises forming the plurality of thermal impedance legs in a two-dimensional serpentine leg shape having a plurality of branches comprised of a first set of branches extending in a first direction and a second set of branches that interconnect respective branches of the first set and that extend in a second direction that is different than the first direction.26. A method according to claim 22 wherein forming the thermal impedance legs comprises:creating a plurality of contact holes completely through the first sacrificial layer; forming a plurality of base anchors within the contact holes; and forming the plurality of thermal impedance legs upon the first sacrificial layer and in mechanical connection with the base anchors such that the base anchors support the thermal impedance legs in a spaced-apart relationship with respect to said substrate when the first sacrificial layer is removed. 27. A method according to claim 26 wherein forming the base anchors comprises forming the plurality of base anchors in a v-shape in cross-section.28. A method according to claim 22 wherein forming the thermal impedance legs comprises:creating a plurality of holes completely through the first sacrificial layer to thereby define a plurality of contact locations; depositing a first thermal insulating layer upon the first sacrificial layer and at least partially within the holes at the contact locations; creating a plurality of apertures through the first thermal insulating layer at the contact locations; depositing a first electrically conductive layer upon at least a portion of the first thermal insulating layer and within the apertures; and depositing a second thermal insulating layer upon the first thermally conductive material, wherein depositing the first thermal insulating layer, the first electrically conductive layer and second thermal insulating layer at the contact locations forms a plurality of base anchors. 29. A method according to claim 28 wherein said depositing the bolometer material comprises depositing the bolometer material such that the bolometer material is in electrical communication with said first electrically conductive layer.30. A method according to claim 29 further comprising forming an electrical connector between the electrically conductive layer and the bolometer material before depositing the bolometer material, wherein forming the electrical connector comprises:creating at least one cavity completely through the resonant layer, the second sacrificial layer and second thermal insulating layer to thereby define at least one connection location on the first electrically conductive layer; depositing a thermal insulating layer upon the resonant layer and at least partially within the at least one cavity at the at least one connection location; creating at least one opening through the thermal insulating layer at the at least one connection location to thereby expose the first electrically conductive layer; and depositing a second electrically conductive layer within the opening upon the exposed first electrically conductive layer such that the second electrically conductive layer is in electrical communication with the first electrically conductive layer and at least partially extends beyond the opening such that when the bolometer material is deposited upon the second sacrificial layer the bolometer material is in electrical communication with the second electrically conductive material.