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An apparatus and a method to manipulate at least one beam of charged particles are provided. The apparatus comprises two rows of field source members 13 which are disposed periodically at a distance from each other such that there exist planes of symmetry S, S′ with respect to which the field source

An apparatus and a method to manipulate at least one beam of charged particles are provided. The apparatus comprises two rows of field source members 13 which are disposed periodically at a distance from each other such that there exist planes of symmetry S, S′ with respect to which the field source members 13 are symmetrically disposed. The field has a component which is displaceable in the x-direction. To provide such field, a pattern of source strengths according to the formula F1(x)=Fm(x)+Fc(x) is applied to the field source members, wherein Fm is a component which is substantially independent of the displacement x0 and Fc is a correction component which is dependent on x0.

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1. A method for operating a particle-optical apparatus to manipulate at least one beam of charged particles, the apparatus comprising at least one row of field source members extending in a row direction, the field source members being disposed periodically in the row direction and at a distance fro

1. A method for operating a particle-optical apparatus to manipulate at least one beam of charged particles, the apparatus comprising at least one row of field source members extending in a row direction, the field source members being disposed periodically in the row direction and at a distance from each other such that there exists at least one set of symmetry planes such that the field source members of the row are disposed symmetrically with respect to each of the symmetry planes, the method comprising:setting source strengths of the field source members to generate a field for manipulating the beam such that a field intensity distribution of the field in a region of the field comprises a first intensity component and a second intensity component, wherein the first intensity component is displaceable in the row direction and the second intensity component is substantially independent of a displacement of the first intensity component, wherein the source strengths of the field source members are substantially representable according to a formula Ui=Fm(xi?x0)+F2(xi)??(1) wherein Ui is the source strength of an ith field source member, xi represents a position of the ith field source member in the row direction, x0 represents the displacement of the first intensity component, Fm(x) is a function representing the first intensity component, and F2(x) is a function representing the second intensity component, and wherein the source strengths of the field source members are further representable by at least one correction term applied to the formula (1), said correction term having an amount which increases in an interval of |x0?xs| as |x0?xs| increases from zero, wherein xs represents a position in the row direction of that symmetry plane of the at least one set of symmetry planes which is closest to the position x0. 2. The method according to claim 1, wherein on each of two sides of a field source member next to the position x0 a group of field source members is selected from the field source members of the row,wherein source strengths Uj′ of the field source members of each group are determined according to a formula Uj′=Uj+Cj(x0?xs) wherein Uj is the source strength of a jth field source member of the two groups determined according to formula (1), and Cj(x) represents the correction term for the jth field source member, wherein the correction terms substantially provide a dipole field adjacent to the row at the position x0, and wherein the dipole field increases in an interval of |x0?xs| as |x0?xS| increases from zero. 3. The method according to claim 2, wherein correction terms are provided which satisfy Cj(0)≠0.4. The method according to claim 2, wherein a first symmetry plane of a first set of symmetry planes and a second symmetry plane of the first set of symmetry planes is disposed next to position x0, and wherein a third symmetry plane of a second set of symmetry planes is located between the first and second symmetry planes at a position xf, and wherein the correction terms satisfy Cj(xf?xs)=0.5. The method according to claim 2, wherein each group of the two groups of field source members comprises only one field source member.6. The method according to claim 2, wherein the dipole field substantially vanishes as |x0?xs| approaches zero.7. The method according to claim 1, wherein the function Fm(x) is substantially symmetrical with respect to x=0.8. The method according to claim 1, wherein the source strengths of the field source members are determined according to a formulaUi=Fm(xi?x0+δx(x0?xs))+F2(xi)??(2) wherein δx(x) is the correction term. 9. The method according to claim 1, wherein the beam of charged particles is directed to the field adjacent to the row of field source members such that it passes through a plane of the field source members at a position x=x0.10. The method according to claim 1, wherein the amount of the correction term substantially vanishes as |x0?xs| approaches zero.11. A method for operating a particle-optical apparatus to manipulate at least one beam of charged particles, the apparatus comprising at least one row of field source members extending in a row direction, the field source members being disposed periodically in the row direction and at a distance from each other such that there exists at least one set of symmetry planes such that the field source members of the row are disposed symmetrically with respect to each of the symmetry planes, the apparatus comprising a beam guiding arrangement for directing the beam of charged particles at a predetermined angle with respect to the row direction to the field at a beam location, or for accepting the beam of charged particles when it emerges at a predetermined angle from the beam location, the method comprising:setting source strengths of the field source members to generate a field for manipulating the beam such that a field intensity distribution of the field in a region of the field comprises a first intensity component and a second intensity component, wherein the first intensity component is displaceable in the row direction and the second intensity component is substantially independent of a displacement of the first intensity component, wherein the source strengths of the field source members are determined according to a formula Ui=Fm(xi?x0)+F2(xi)??(1) wherein Ui is the source strength of an ith field source member, xi represents a position of the ith field source member in the row direction, x0 represents the displacement of the first intensity component, Fm(x) is a function representing the first intensity component, and F2(x) is a function representing the second intensity component, and wherein the beam guiding arrangement changes the predetermined angle by a correction term having an amount which increases in an interval of |x0?xs| as |x0?xs| increases from zero, wherein xs represents a position in the row direction of that symmetry plane of the at least one set of symmetry planes which is closest to the position x0. 12. The method according to claim 9, wherein the amount of the correction term substantially vanishes as |x0?xs| approaches zero.13. A particle-optical apparatus for manipulating at least one beam of charged particles, the apparatus comprising:at least one row of field source members extending in a row direction, the field source members being disposed periodically in the row direction and at a distance from each other such that there exists at least one set of symmetry planes such that the field source members of the row are disposed symmetrically with respect to each of the symmetry planes; and a controller for setting source strengths of the field source members to generate a field for manipulating the beam such that a field intensity distribution of the field in a region of the field comprises a first intensity component and a second intensity component, wherein the first intensity component is displaceable in the row direction and the second intensity component is substantially independent of a displacement of the first intensity component, and wherein the controller is configured to set the source strengths of the field source members according to a formula Ui=F1(xi?x0)+F2(xi)??(1) wherein Ui is the source strength of an ith field source member, xi represents a position of the ith field source member in the row direction, x0 represents the displacement of the first intensity component, F1(x) is a function representing the first intensity component, and F2(x) is a function representing the second intensity component, and wherein F1(x) is given in a region around x0 by F1(x)=Fm(x)+Fc(x), wherein Fm(x) represents a main component which is substantially independent of x0, and Fc(x) represents a correction component which is dependent on x0, and wherein Fc(x) substantially satisfies the equation Fc(x)?Ia(x0?xs)·A(x)+Is(x0?xs)·S(x) in an interval of |x0?xs| as |x0?xs| increases from zero wherein xs represents a position in the row direction of that symmetry plane of the at least one set of symmetry planes which is closest to the position x0, S(x) is a function which is substantially independent of x0 and symmetric in x, A(x) is a function which is substantially independent of x0 and anti-symmetrical in x, Is(x) is an arbitrary function, and Ia(x) is a function which is zero at x?0. 14. The particle-optical apparatus according to claim 13, wherein Fm(x) is symmetric with respect to x=0.15. The particle-optical apparatus according to claim 13, wherein Fc(x)?0 is satisfied in a region |x|<k·d, wherein d is the distance between adjacent field source members in the row direction and k is an integer number greater than 1.16. The particle-optical apparatus according to claim 15, wherein k>3.17. The particle-optical apparatus according to claim 13, wherein each field source member of a first row of field source members extends in a direction oriented transversely to the row direction toward a second row of field source members, and wherein the field source member comprises a front face directed toward the second row.18. The particle-optical apparatus according to claim 13, wherein each of field source members is a source of electric fields, and wherein the controller is adapted to apply adjustable electric voltages to the field source members.19. The particle-optical apparatus according to claim 13, wherein each of the field source members is a source of magnetic fields, wherein a plurality of windings are provided in correspondence with the field source members, and wherein the controller is adapted to supply adjustable electric currents to the plurality of windings.20. The particle-optical apparatus according to claim 13, wherein the row of field source members is disposed between of a pair of shielding apertures for shielding the field in a direction of the beam.21. The particle-optical apparatus according to claim 13, further comprising:an electron source for generating a plurality of electron beams; and at least one deflector for deflecting the plurality of electron beams upstream of the at least one row of field source members. 22. The particle-optical apparatus according to claim 21, wherein the electron source is adapted to selectively switch individual electron beams on and off.23. The particle-optical apparatus according to claim 13, further comprising:at least one deflector for deflecting a plurality of electron beams downstream of the at least one row of field source members; and an electron detector for detecting intensities of the electron beams. 24. The apparatus of claim 10, wherein Fc(x) depends upon a value of |x0?xs| such that if |x0?xs|>δ, then there exist values of x in the region around x0 at which Fc(x)≠0, wherein δ is small in comparison with the distance of adjacent field source members in the row direction.25. A method for operating a particle-optical apparatus to manipulate at least one group of at least one beam of charged particles, wherein the at least one beam of charged particles is incident on the apparatus, the apparatus comprising at least one row of field source members extending in a row direction, the field source members being disposed periodically in the row direction and at a distance from each other, the method comprising:setting source strengths of the field source members to generate a field for manipulating the at least one beam of charged particles, wherein a separate field region is provided for each group of the at least one beam of charged particles and wherein a number of the field regions is equal to a number of groups of the at least one beam of charged particles, wherein an additional field region is provided at at least one end of a row of said field regions, wherein a field in the additional field region is substantially symmetric to the field at the end of the row of field regions, or an intensity of the field in the additional field region changes along the row direction substantially according to a same function as fields in the row of said field regions. 26. The method according to claim 25, wherein the at least one group of at least one beam of charged particles is displaced in the row direction and wherein the field regions are displaced in the row direction synchronised with the beams.27. A particle-optical apparatus for manipulating at least one group of at least one beam of charged particles, the at least one beam of charged particles being incident on the apparatus, the apparatus comprising:at least one row of field source members extending in a row direction, the field source members being disposed periodically in the row direction and at a distance from each other; and a controller which is adapted for setting source strengths of the field source members to generate at least one field region for manipulating the at least one beam of charged particles, wherein the controller is further adapted for setting the source strengths of the field source members to generate an additional field region at at least one end of a row of field regions, wherein a field in the additional field region is substantially symmetric to a field at the end of the row of field regions, or an intensity of the field in the additional field region changes along the row direction substantially according to a same function as fields in the row of field regions. 28. The particle-optical apparatus according to claim 27, further comprising:an electron source for generating a plurality of electron beams; and at least one deflector for deflecting the plurality of electron beams upstream of the at least one row of field source members. 29. The particle-optical apparatus according to claim 28, wherein the electron source is adapted to selectively switch individual electron beams on and off.30. The particle-optical apparatus according to claim 27, further comprising:at least one deflector for deflecting a plurality of electron beams downstream of the at least one row of field source members; and an electron detector for detecting intensities of the electron beams.