Wafer holding ring for chemical and mechanical polisher
원문보기
IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0398600
(2002-05-08)
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국제출원번호 |
PCT/JP02/07973
(2003-04-04)
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§371/§102 date |
20030404
(20030404)
|
국제공개번호 |
WO03/01514
(2003-02-20)
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발명자
/ 주소 |
- Oshita, Tetsuya
- Aizawa, Masami
- Sakamoto, Katsuyuki
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출원인 / 주소 |
- Clariant Finance (BVI) Limited
|
인용정보 |
피인용 횟수 :
3 인용 특허 :
7 |
초록
▼
Disclosed is a wafer-holding ring adapted for holding a wafer on a chemical mechanical polishing apparatus, which can prevent damage to a wafer, possesses excellent abrasion resistance, and can reduce replacement work and consequently can realize mass production of polished wafers. In the wafer-hold
Disclosed is a wafer-holding ring adapted for holding a wafer on a chemical mechanical polishing apparatus, which can prevent damage to a wafer, possesses excellent abrasion resistance, and can reduce replacement work and consequently can realize mass production of polished wafers. In the wafer-holding ring for a chemical mechanical polishing apparatus, the surface of the wafer-holding ring at least in its portion, which can come into contact with a wafer, is formed of a resin composition comprising not less than 30% by weight of polybenzimidazole.
대표청구항
▼
1. A wafer-holding ring for a chemical mechanical polishing apparatus, adapted for holding a wafer on the chemical mechanical polishing apparatus, wherein the surface of said wafer-holding ring at least in its portion, which can come into contact with a wafer, is formed of a resin composition compri
1. A wafer-holding ring for a chemical mechanical polishing apparatus, adapted for holding a wafer on the chemical mechanical polishing apparatus, wherein the surface of said wafer-holding ring at least in its portion, which can come into contact with a wafer, is formed of a resin composition comprising not less than 30% by weight of polybenzimidazole and not more than 70% by weight of polyarylene ketone.2. The wafer-holding ring for a chemical mechanical polishing apparatus according to claim 1, wherein the resin composition further comprises not more than 40% by weight of a filler.3. The wafer-holding ring for a chemical mechanical polishing apparatus according to claim 2, wherein the filler is a glass fiber, a carbon fiber, graphite, boron nitride, carbon black, titanium oxide, or silicon oxide.4. The wafer-holding ring for a chemical mechanical polishing apparatus according to claim 3, wherein a surface resin layer formed of the resin composition is provided on the surface of said wafer-holding ring at least in its portion which can come into contact with a wafer and has a thickness of not less than 50 μm.5. The wafer-holding ring for a chemical mechanical polishing apparatus according to claim 2, wherein a surface resin layer formed of the resin composition is provided on the surface of said wafer-holding ring at least in its portion which can come into contact with a wafer and has a thickness of not less than 50 μm.6. The wafer-holding ring for a chemical mechanical polishing apparatus according to claim 1, wherein a surface resin layer formed of the resin composition is provided on the surface of said wafer-holding ring at least in its portion which can come into contact with a wafer and has a thickness of not less than 50 μm.7. The wafer-holding ring for a chemical mechanical polishing apparatus according to claim 1, wherein the whole wafer-holding ring is formed of the resin composition.8. A wafer-holding ring for a chemical mechanical polishing apparatus, adapted for holding a wafer on the chemical mechanical polishing apparatus, wherein the surface of said wafer-holding ring at least in its portion, which can come into contact with a wafer, is formed of a resin composition comprising not less than 30% by weight of polybenzimidazole, not more than 70% by weight of polyarylene ketone and not more than 40% by weight of a filler.9. A wafer-holding ring for a chemical mechanical polishing apparatus, adapted for holding a wafer on the chemical mechanical polishing apparatus, wherein the surface of said wafer-holding ring at least in its portion, which can come into contact with a wafer, is formed of a resin composition comprising not less than 30% by weight of polybenzimidazole and not more than 70% by weight of polyarylene ketone, wherein a surface resin layer formed of the resin composition is provided on the surface of said wafer-holding ring at least in its portion which can come into contact with a wafer and has a thickness of not less than 50 μm.
이 특허에 인용된 특허 (7)
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Nishikiori Kazuhiko,JPX ; Hirano Hiroshi,JPX ; Kawasumi Taiki,JPX, Disc holder.
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Sheratte Martin B. (Canoga Park CA), Linear and cross-linked polybenzimidazoles.
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Lancaster, William G., Package sealing apparatus.
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Murata Makoto,JPX, Polybenzimidazole material with low metallic concentration and a process for production thereof.
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Helminiak, Thaddeus E.; Benner, Charles L.; Arnold, Fred E.; Husman, George, Process for producing aromatic heterocyclic polymer alloys.
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Choe Eui W. (Randolph NJ), Single-stage melt polymerization process for the production of high molecular weight polybenzimidazole.
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Robert T. Lum ; David W. Groechel ; Li Wu ; Chiu Chan, Tungsten CMP with improved alignment mark integrity, reduced edge residue, and reduced retainer ring notching.
이 특허를 인용한 특허 (3)
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Chen, Hung Chih; Zuniga, Steven M.; Garretson, Charles C.; McAllister, Douglas R.; Lin, Jian; Meyer, Stacy; Huey, Sidney P.; Oh, Jeonghoon; Doan, Trung T.; Schmidt, Jeffrey P.; Wohlert, Martin S.; Hughes, Kerry F.; Wang, James C.; Lu, Danny Cam Toan; De Lamenie, Romain Beau; Balagani, Venkata R.; Allen, Aden Martin; Fong, Michael Jon, Retaining ring with Shaped Surface.
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Chen, Hung Chih; Zuniga, Steven M.; Garretson, Charles C.; McAllister, Douglas R.; Lin, Jian; Meyer, Stacy; Huey, Sidney P.; Oh, Jeonghoon; Doan, Trung T.; Schmidt, Jeffrey P.; Wohlert, Martin S.; Hughes, Kerry F.; Wang, James C.; Lu, Danny Cam Toan; De Lamenie, Romain Beau; Balagani, Venkata R.; Allen, Aden Martin; Fong, Michael Jon, Retaining ring with shaped surface.
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Chen, Hung Chih; Zuniga, Steven M.; Garretson, Charles C.; McAllister, Douglas R.; Lin, Jian; Meyer, Stacy; Huey, Sidney P.; Oh, Jeonghoon; Doan, Trung T.; Schmidt, Jeffrey; Wohlert, Martin S.; Hughes, Kerry F.; Wang, James C.; Lu, Danny Cam Toan; De Lamenie, Romain Beau; Balagani, Venkata R.; Allen, Aden Martin; Fong, Michael Jon, Retaining ring with shaped surface.
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