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Methods for identifying optimizing catalysts in parallel-flow microreactors 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-031/10
출원번호 US-0728732 (2000-11-28)
발명자 / 주소
  • Bergh, H. Sam
  • Guan, Shenheng
출원인 / 주소
  • Symyx Technologies, Inc.
인용정보 피인용 횟수 : 35  인용 특허 : 69

초록

A chemical processing microsystem useful for identifying and optimizing, materials (e.g., catalysts) that enhance chemical processes or for characterizing and/or optimizing chemical processes is disclosed. The chemical processing microsystem comprises a plurality of microreactors 600 and, in a prefe

대표청구항

1. A method for effecting chemical reactions of interest in a parallel processing microsystem, the method comprisingsimultaneously loading at least four catalyst materials into four or more microreactors such that the materials are individually resident in a reaction cavity of a separate microreacto

이 특허에 인용된 특허 (69)

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  2. Satitpunwaycha, Peter; Endo, Richard; Fresco, Zachary; Kumar, Nitin, Combinatorial processing including rotation and movement within a region.
  3. Nelson, James Michael; Davidson, Robert Stephen; Cernohous, Jeffrey Jacob; Annen, Michael John; McNerney, James Robert; Ferguson, Robert Wade; Maistrovich, Anthony Robert; Higgins, James Alan, Continuous process for the production of combinatorial libraries of materials.
  4. Nelson,James M.; Marx,Ryan E.; Cernohous,Jeffrey J.; McNerney,James R., Continuous process for the production of combinatorial libraries of modified materials.
  5. Takagi,Fumio, Device and method for manufacturing bead array, and method for detecting target substance.
  6. Buchberger, Jr., Douglas A.; Brillhart, Paul, Electrostatic chuck assembly.
  7. Tonkovich, Anna Lee; Arora, Ravi; Kilanowski, David, Flow distribution channels to control flow in process channels.
  8. Lazovsky, David E.; Malhotra, Sandra G.; Boussie, Thomas R., Formation of a masking layer on a dielectric region to facilitate formation of a capping layer on electrically conductive regions separated by the dielectric region.
  9. Lazovsky, David E.; Malhotra, Sandra G.; Boussie, Thomas R., Formation of a masking layer on a dielectric region to facilitate formation of a capping layer on electrically conductive regions separated by the dielectric region.
  10. Lazovsky,David E.; Malhotra,Sandra G.; Boussie,Thomas R., Formation of a masking layer on a dielectric region to facilitate formation of a capping layer on electrically conductive regions separated by the dielectric region.
  11. Hansmann, Hans-Ullrich; Mohrmann, Andreas; Tröllsch, Arne; Polzius, Rainer, Gas measurement system.
  12. Mae, Kazuhiro, Method of multiple reaction in microreactor, and microreactor.
  13. Chiang, Tony P.; Lazovsky, David E.; Boussie, Thomas R.; Gorer, Alexander, Methods for discretized processing of regions of a substrate.
  14. Chan, Selena; Kwon, Sunghoon; Sundararajan, Narayan, Methods for uniform metal impregnation into a nanoporous material.
  15. Chan, Selena; Kwon, Sunghoon; Sundararajan, Narayan, Methods for uniform metal impregnation into a nanoporous material.
  16. Gilligan, Mark Peter Timothy; Homewood, Philip James; Briant, John Philip; Lovatt, Andrew Mark, Microfluidic system.
  17. Chan, Selena; Kwon, Sunghoon; Sundararajan, Narayan, Microfluidic system incorporating a metal impregnated nanoporous material in a microfluidic pathway thereof.
  18. Lazovsky,David E.; Chiang,Tony P.; Keshavarz,Majid, Molecular self-assembly in substrate processing.
  19. Bergh,H. Sam; Guan,Shenheng; Engstrom,James R.; Hardt,Steffen; Lohf,Astrid; Michel,Frank, Parallel flow reactor having improved thermal control.
  20. Carin, Christianne; Gorbell, Brian N.; Carin, legal representative, Christianne; Fedkenheuer, Alvin W.; Jonasson, John S.; Starosud, Alexander, Process and system for drying and heat treating materials.
  21. Carin, Christianne; Gorbell, Brian N.; Fedkenheuer, Alvin W.; Jonasson, John S.; Starosud, Alexander, Process and system for drying and heat treating materials.
  22. Gorbell, Brian N.; Carin, legal representative, Christianne; Fedkenheuer, Alvin W.; Jonasson, John S.; Starosud, Alexander, Process and system for drying and heat treating materials.
  23. Gorbell, Brian N.; Carin, legal representative, Christianne; Fedkenheuer, Alvin W.; Jonasson, John S.; Starosud, Alexander, Process and system for drying and heat treating materials.
  24. Nelson, James M.; Marx, Ryan E.; Cernohous, Jeffrey J.; McNerney, James R.; Jones, Todd D.; Hanley, Kenneth J., Process to modify polymeric materials and resulting compositions.
  25. Nelson, James M.; Marx, Ryan F.; Cernohous, Jeffrey J.; McNerney, James R.; Jones, Todd D.; Hanley, Kenneth J., Process to modify polymeric materials and resulting compositions.
  26. Chiang, Tony P.; Lazovsky, David E.; Malhotra, Sandra G., Processing substrates using site-isolated processing.
  27. Fresco, Zachary; Lang, Chi-I; Malhotra, Sandra G.; Chiang, Tony P.; Boussie, Thomas R.; Kumar, Nitin; Tong, Jinhong; Duong, Anh, Substrate processing including a masking layer.
  28. Nguyen, Andrew; Cheng, Wing Lau; Hanawa, Hiroji; Kats, Semyon; Ramaswamy, Kartik; Ye, Yan; Wong, Kwok Manus; Hoffman, Daniel J.; Ishikawa, Tetsuya; Lue, Brian C., Substrate support having fluid channel.
  29. Nguyen, Andrew; Cheng, Wing Lau; Hanawa, Hiroji; Kats, Semyon L.; Ramaswamy, Kartik; Ye, Yan; Wong, Kwok Manus; Hoffman, Daniel J.; Ishikawa, Tetsuya; Lue, Brian C., Substrate support having heat transfer system.
  30. Nguyen,Andrew; Cheng,Wing Lau; Hanawa,Hiroji; Kats,Semyon L.; Ramaswamy,Kartik; Ye,Yan; Wong,Kwok Manus; Hoffman,Daniel J.; Ishikawa,Tetsuya; Lue,Brian C., Substrate support having heat transfer system.
  31. Weiner, Kurt H.; Chiang, Tony P.; Pinto, Gustavo A., System and method for increasing productivity of combinatorial screening.
  32. Chiang, Tony P.; Lazovsky, David E.; Boussie, Thomas R.; McWaid, Thomas H.; Gorer, Alexander, Systems for discretized processing of regions of a substrate.
  33. Carin, Christianne; Gorbell, Brian N.; Carin, legal representative, Christianne; Fedkenheuer, Alvin W.; Jonasson, John S.; Starosud, Alexander, Systems for prevention of HAP emissions and for efficient drying/dehydration processes.
  34. Francis, Aaron; Schmidt, John; Williams, Kenneth Alfred, Vented combinatorial processing cell.
  35. Adhiprakasha, Edwin, Vertically retractable flow cell system.
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