Method and apparatus for the preparation of clean gases
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01D-050/00
B01D-053/04
B01D-053/22
출원번호
US-0746278
(2003-12-29)
발명자
/ 주소
Fujii, Toshiaki
Suzuki, Tsukuru
Suzuki, Hidetomo
Sakamoto, Kazuhiko
출원인 / 주소
Ebara Research Co., Ltd.
대리인 / 주소
Oblon, Spivak, McClelland, Maier &
인용정보
피인용 횟수 :
2인용 특허 :
20
초록▼
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semico
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.
대표청구항▼
1. A method of preparing a dry and clean gas capable of use in a clean room which comprises:dehydrating a gas by techniques using cooling, adsorption, compression or membrane separation or a combination thereof to reduce the water concentration of the gas; passing the dehydrated gas through an adsor
1. A method of preparing a dry and clean gas capable of use in a clean room which comprises:dehydrating a gas by techniques using cooling, adsorption, compression or membrane separation or a combination thereof to reduce the water concentration of the gas; passing the dehydrated gas through an adsorber and/or absorber and bringing the gas into contact with said adsorber and/or absorber to reduce the level of non-methane hydrocarbons, thereby forming a treated gas; and passing the treated gas through a dust removing means to remove fine particles. 2. The method according to claim 1, wherein the water concentration is reduced to a relative humidity of 50% or less.3. The method according to claim 2, wherein the water concentration is reduced to a relative humidity of 30% or less.4. The method according to claim 1, wherein said adsorber and/or absorber is regenerated and used.5. The method according to claim 4, wherein said adsorber and/or absorber is regenerated by pressure-swing adsorption, thermal swing adsorption or a combination thereof.6. The method according to claim 1, wherein the level of non-methane hydrocarbons is reduced to 0.2 ppm or below.7. The method according to claim 1, wherein the concentration of fine particles is reduced to class 10 or below.8. The method according to claim 1, wherein the adsorber and/or absorber operates at a super-atmospheric pressure.9. A method of preparing a dry and clean gas capable of use in a clean room which comprises:passing a gas through an adsorber and/or absorber capable of removing water and of adsorbing non-methane hydrocarbons to reduce both the water content and the level of non-methane hydrocarbons, thereby forming a treated gas; and passing the treated gas through a dust removing means to remove fine particles. 10. The method according to claim 9, wherein said adsorber and/or absorber is selected from the group consisting of silica gel and zeolite.11. The method according to claim 9, wherein the water concentration is reduced to a relative humidity of 50% or less.12. The method according to claim 11, wherein the water concentration is reduced to a relative humidity of 30% or less.13. The method according to claim 9, wherein said adsorber and/or absorber is regenerated and used.14. The method according to claim 13, wherein said adsorber and/or absorber is regenerated by pressure-swing adsorption, thermal swing adsorption or a combination thereof.15. The method according to claim 9, wherein the level of non-methane hydrocarbons is reduced to 0.2 ppm or below.16. The method according to claim 9, wherein the concentration of fine particles is reduced to class 10 or below.17. The method according to claim 9, wherein the adsorber and/or absorber operates at a super-atmospheric pressure.18. An apparatus for preparing a dry and clean gas capable of use in a clean room, which comprises:a dehumidifier for reducing a relative humidity of a gas to be treated which has at least one inlet for introducing said gas, said dehumidifier relying on at least one technique selected from the group consisting of cooling, adsorption, compression and membrane separation; an adsorber and/or absorber, being disposed downstream of the dehumidifier, for reducing the level of non-methane hydrocarbons; and a filter for removing fine particles, being disposed downstream of the adsorber and/or absorber, which filter has an outlet to discharge the dried and clean gas. 19. The apparatus according to claim 18, wherein said dehumidifier is relying on at least one technique selected from the group consisting of cooling and adsorption.20. The apparatus according to claim 18, wherein said dehumidifier is relying on adsorption technique employing silica gel, zeolite or a combination thereof.21. An apparatus for preparing a dry and clean gas capable of use in a clean room, which comprises:an adsorber and/or absorber for reducing a relative humidity and decreasing the level of non-methane hydrocarbons of a gas to be treated; and a filter for removing fine particles, being disposed downstream of the adsorber and/or absorber, which filter has an outlet to discharge the dried and clean gas. 22. The apparatus according to claim 21, wherein said adsorber and/or absorber comprises silica gel, zeolite or a combination thereof.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (20)
Bingham Larry A. (Mission Viejo CA), Adsorption process.
Spiegel Ronald J. (Chapel Hill NC) Sederquist Richard A. (Newington CT) Trocciola John C. (Glastonbury CT) Healy Herbert C. (Hebron CT) Lesieur Roger R. (Enfield CT) Sandelli Gregory J. (Newington CT, Landfill gas treatment system.
Karbachsch Massoud (Gottingen DEX) Kaul Wilfried (Weinsheim DEX) Strohm Gerhard (Oestrich-Winkel DEX), Membrane filtering device for micro and ultra filtration of fluids by the crossflow method.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.