초록 ▼

A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The layer was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of sai

A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The layer was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of said metal.

대표청구항 ▼

1. A metal mold comprising at least one monomolecular non-sticking layer, said layer obtained by reacting the metal mold with at least one fluoroalkyl compound comprising at least one mercapto group, and said layer comprising at least one sulfide of the metal mold as a result of said reaction.2. The

1. A metal mold comprising at least one monomolecular non-sticking layer, said layer obtained by reacting the metal mold with at least one fluoroalkyl compound comprising at least one mercapto group, and said layer comprising at least one sulfide of the metal mold as a result of said reaction.2. The metal mold of claim 1, wherein the metal mold is chosen from a mold of solid metal and a mold with a metal surface.3. The metal mold of claim 2, wherein the metal mold comprises a layer of metal applied on a base material.4. The metal mold of claim 1, wherein the metal mold is nickel or chromium.5. The metal mold of claim 2, wherein the metal surface is nickel or chromium.6. The metal mold of claim 1, wherein the metal mold is unalloyed.7. The metal mold of claim 2, wherein the metal surface is unalloyed.8. The metal mold of claim 1, wherein the fluoroalkyl compound comprising at least one mecapto group is denoted RX, whereinR is a group with non-sticking properties, and X comprises at least one mercapto group, wherein R is a linear fluoroalkyl group, which is branched or unbranched, and which has a first end comprising at least one fluorinated carbon atom and a second end bound to X. 9. The metal mold of claim 8, wherein at least one of the one fluorinated carbon atom is a perfluorinated carbon atom.10. The metal mold of claim 8, wherein the first end of R comprises 1, 2 or 3 branches, each independently with a length of 1, 2, or 3 carbon atoms, and wherein each of the branches and the first end of R comprise at least one perfluorinated carbon atom.11. The metal mold of claim 8, wherein the main chain of R has a total length of 2-3 carbon atoms.12. The metal mold of claim 1, wherein immediately prior to said reaction the fluoroalkyl compound is in a gaseous phase.13. The metal mold of claim 1, wherein during said reaction the fluoroalkyl compound is in a gaseous phase.14. The metal mold of claim 1, wherein immediately prior to said reaction the fluoroalkyl compound is in a liquid phase or is dissolved in a solvent.15. The metal mold of claim 1, wherein during said reaction the fluoroalkyl compound is in a liquid phase or is dissolved in a solvent.16. The metal mold of claim 1, wherein the monomolecular non-sticking layer is firmly adhering.17. A nano-imprinting process comprising the use of a metal mold, said metal mold comprising at least one monomolecular non-sticking layer, said layer obtained by reacting the metal mold with at least one fluoroalkyl compound comprising at least one mercapto group, and said layer comprising at least one sulfide of the metal mold as a result of said reaction.18. The nano-imprinting process of claim 17, wherein said process is nano-imprint lithography.