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System and method for dispensing liquids 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05D-001/26
  • G06F-017/00
출원번호 US-0191749 (2002-07-09)
§371/§102 date 20020726 (20020726)
발명자 / 주소
  • Watts, Michael P. C.
  • Choi, Byung-Jin
  • Sreenivasan, Sidlgata V.
출원인 / 주소
  • Molecular Imprints, Inc.
인용정보 피인용 횟수 : 23  인용 특허 : 120

초록

The present invention provides a method and a system to dispense a liquid, contained in a cartridge, onto a substrate employing a dispensing system under control of a processor in data communication with a memory.

대표청구항

1. A method for dispensing a liquid, contained in a cartridge, onto a substrate, employing a dispensing system under control of a processor in data communication with a memory, said method comprising:associating an identification code with said cartridge, defining a verifiable identification code, s

이 특허에 인용된 특허 (120)

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이 특허를 인용한 특허 (23)

  1. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Capillary imprinting technique.
  2. Schumaker, Philip D., Drop pattern generation for imprint lithography.
  3. Schumaker, Philip D., Drop pattern generation with edge weighting.
  4. Schmid, Gerard M.; Resnick, Douglas J., Etch-enhanced technique for lift-off patterning.
  5. Khusnatdinov, Niyaz; Jones, Christopher Ellis; Perez, Joseph G.; LaBrake, Dwayne L.; McMackin, Ian Matthew, Extrusion reduction in imprint lithography.
  6. Lu, Xiaoming; Schumaker, Philip D., High throughput imprint based on contact line motion tracking control.
  7. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Meissl, Mario Johannes, Imprint lithography system and method.
  8. Sreenivasan, Sidlgata V.; Singhal, Shrawan; Choi, Byung Jin; McMackin, Ian Matthew, Large area roll-to-roll imprint lithography.
  9. Ryu, Joung-Ho; Kwak, Soo-Min; Son, Hae-Joon, Liquid crystal dispensing system which can read information of liquid crystal container and method of dispensing liquid crystal material using same.
  10. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
  11. Xu, Frank; McMackin, Ian; Lad, PanKaj B.; Watts, Michael P. C., Method for controlling distribution of fluid components on a body.
  12. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian M.; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  13. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian Matthew; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  14. McMackin, Ian M.; Lad, Pankaj B.; Truskett, Van N., Method for fast filling of templates for imprint lithography using on template dispense.
  15. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  16. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Patterning substrates employing multiple chucks.
  17. Nguyen, Houng T.; Xu, Ren; Barnes, Michael S., Process for optimization of island to trench ratio in patterned media.
  18. Schumaker, Philip D., Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement.
  19. Xu, Frank Y.; Khusnatdinov, Niyaz, Single phase fluid imprint lithography method.
  20. Liu, Weijun; Xu, Frank Y.; Fletcher, Edward Brian, Solvent-assisted layer formation for imprint lithography.
  21. Sreenivasan, Sidlgata V.; Choi, Byung J.; Schumaker, Norman E.; Voisin, Ronald D.; Watts, Michael P. C.; Meissl, Mario J., Step and repeat imprint lithography processes.
  22. Shackleton,Steven C.; McMackin,Ian M.; Lad,Pankaj B.; Truskett,Van N., System for controlling a volume of material on a mold.
  23. Selinidis, Kosta S.; Choi, Byung-Jin; Schmid, Gerard M.; Thompson, Ecron D.; McMackin, Ian Matthew, Template having alignment marks formed of contrast material.
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