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Formation of discontinuous films during an imprint lithography process 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29C-033/42
  • B29C-033/60
  • B29C-035/08
  • B29C-035/12
  • B29C-041/02
  • B29C-041/20
  • B29C-059/02
  • B29C-059/16
출원번호 US-0194411 (2002-07-11)
발명자 / 주소
  • Choi, Byung Jin
  • Meissl, Mario J.
  • Sreenivasan, Sidlagata V.
  • Watts, Michael P. C.
출원인 / 주소
  • Molecular Imprints, Inc.
인용정보 피인용 횟수 : 138  인용 특허 : 176

초록

The present invention is directed to methods for patterning a substrate by imprint lithography. An imprint lithography method includes placing a curable liquid on a substrate. A template may be contacted with the curable liquid. Surface forces at the interface of the curable liquid and the template

대표청구항

1. A method of forming a pattern on a substrate, the method comprising:obtaining a patterned template, the patterned template comprising a first surface and a plurality of recesses formed in the patterned template extending from the first surface toward an opposing second surface, where the pluralit

이 특허에 인용된 특허 (176)

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이 특허를 인용한 특허 (138)

  1. GanapathiSubramanian,Mahadevan; Sreenivasan,Sldlgata V., Adaptive shape substrate support method.
  2. Nimmakayala, Pawan Kumar; Choi, Byung-Jin, Alignment system and method for a substrate in a nano-imprint process.
  3. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Apparatus to control displacement of a body spaced-apart from a surface.
  4. Wang, Yongcai; Lebens, John Andrew; Wright, Mitchell Lawrence; Cummings, Julie A., Articles with conductive micro-wire pattern.
  5. Snyder,Bryan L., Automated pattern recognition of imprint technology.
  6. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Capillary imprinting technique.
  7. Cherala, Anshuman; Choi, Byung Jin; Lad, Pankaj B.; Shackleton, Steven C., Chucking system comprising an array of fluid chambers.
  8. GanapathiSubramanian, Mahadevan; Meissl, Mario Johannes; Panga, Avinash; Choi, Byung-Jin, Chucking system with recessed support feature.
  9. Watts,Michael P. C.; Voisin,Ronald D.; Sreenivasan,Sidlgata V., Compliant hard template for UV imprinting.
  10. Xu, Frank Y., Composition for adhering materials together.
  11. Xu, Frank Y.; Miller, Michael N., Composition to reduce adhesion between a conformable region and a mold.
  12. Xu,Frank Y.; Miller,Michael N., Composition to reduce adhesion between a conformable region and a mold.
  13. Sreenivasan, Sidlgata V.; Choi, Byung-Jin; Voisin, Ronald D., Conforming template for patterning liquids disposed on substrates.
  14. Sreenivasan,Sidlgata V; Choi,Byung J.; Voisin,Ronald D., Conforming template for patterning liquids disposed on substrates.
  15. Khusnatdinov, Niyaz; LaBrake, Dwayne L., Contaminate detection and substrate cleaning.
  16. Schumaker, Philip D., Drop pattern generation for imprint lithography.
  17. Fletcher, Edward Brian; Schmid, Gerard M.; Im, Se-Hyuk; Khusnatdinov, Niyaz; Srinivasan, Yeshwanth; Liu, Weijun; Xu, Frank Y., Drop pattern generation for imprint lithography with directionally-patterned templates.
  18. Schumaker, Philip D., Drop pattern generation with edge weighting.
  19. Sreenivasan,Sidlgata V., Eliminating printability of sub-resolution defects in imprint lithography.
  20. Menezes, Marlon; Xu, Frank Y.; Wan, Fen, Enhanced densification of silicon oxide layers.
  21. Nimmakayala, Pawan Kumar; Choi, Byung-Jin; Rafferty, Tom H.; Schumaker, Philip D., Enhanced multi channel alignment.
  22. Khusnatdinov, Niyaz; Jones, Christopher Ellis; Perez, Joseph G.; LaBrake, Dwayne L.; McMackin, Ian Matthew, Extrusion reduction in imprint lithography.
  23. Resnick, Douglas J.; Miller, Michael N.; Xu, Frank Y., Fabrication of seamless large area master templates for imprint lithography using step and repeat tools.
  24. Fletcher, Edward B.; Ye, Zhengmao; LaBrake, Dwayne L.; Xu, Frank Y., Facilitating adhesion between substrate and patterned layer.
  25. Willson, Carlton Grant; Ogawa, Tsuyoshi; Lin, Michael W.; Hellebusch, Daniel J.; Jacobsson, B. Michael; Bell, William K., Fluorinated silazane release agents in nanoimprint lithography.
  26. Choi,Byung Jin; Meissl,Mario J.; Sreenivasan,Sidlagata V.; Watts,Michael P. C., Formation of discontinuous films during an imprint lithography process.
  27. Imhof, Joseph Michael; Selinidis, Kosta S.; LaBrake, Dwayne L., High contrast alignment marks through multiple stage imprinting.
  28. Lu, Xiaoming; Schumaker, Philip D., High throughput imprint based on contact line motion tracking control.
  29. Voisin, Ronald D., Imprint alignment method, system and template.
  30. Voisin, Ronald D., Imprint alignment method, system, and template.
  31. Kruijt Stegeman, Yvonne Wendela; Knaapen, Raymond Jacobus; Dijksman, Johan Frederik; Krastev, Krassimir Todorov; Wuister, Sander Frederik; Kolesnychenko, Aleksey Yurievich; Van Der Mast, Karel Diederick; Simon, Klaus, Imprint lithography.
  32. Kruijt-Stegeman, Yvonne Wendela; Dijksman, Johan Frederik; Kolesnychenko, Aleksey Yurievich; Van Der Mast, Karel Diederick; Simon, Klaus; Knaapen, Raymond Jacobus Wilhelmus; Krastev, Krassimir Todorov; Wuister, Sander Frederik, Imprint lithography.
  33. Kruijt-Stegeman, Yvonne Wendela; Dijksman, Johan Frederik; Kolesnychenko, Aleksey Yurievich; Van Der Mast, Karel Diederick; Simon, Klaus; Knaapen, Raymond Jacobus; Krastev, Krassimir Todorov; Wuister, Sander Frederik, Imprint lithography.
  34. Kruijt-Stegeman, Yvonne Wendela; Dijksman, Johan Frederik; Kolesnychenko, Aleksey Yurievich; Van Der Mast, Karel Diederick; Simon, Klaus; Knaapen, Raymond Jacobus; Krastev, Krassimir Todorov; Wuister, Sander Frederik, Imprint lithography.
  35. Simon, Klaus, Imprint lithography.
  36. Simon, Klaus, Imprint lithography.
  37. Simon, Klaus, Imprint lithography.
  38. Simon, Klaus, Imprint lithography.
  39. Simon, Klaus; Van Der Mast, Karel Diederick; Dijksman, Johan Frederik, Imprint lithography.
  40. Xu, Frank Y.; Lad, Pankaj B.; McMackin, Ian Matthew; Truskett, Van Nguyen; Fletcher, Edward Brian, Imprint lithography method.
  41. Xu, Frank Y.; McMackin, Ian Matthew; Lad, Pankaj B., Imprint lithography method.
  42. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Meissl, Mario Johannes, Imprint lithography system and method.
  43. Choi, Byung-Jin; Choi, Yeong-Jun; Selinidis, Kosta S.; Shackleton, Steven C., Imprint lithography template.
  44. Haase, Gaddi S.; Selinidis, Kosta S.; Ye, Zhengmao, Imprint lithography template and method for zero-gap imprinting.
  45. Bailey,Todd C.; Choi,Byung Jin; Colburn,Matthew E.; Sreenivasan,Sidlgata V.; Willson,Carlton G.; Ekerdt,John G., Imprint lithography template having a feature size under 250 nm.
  46. Liu, Weijun; Stachowiak, Timothy Brian; DeYoung, James P.; Khusnatdinov, Niyaz, Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography.
  47. Sreenivasan, Sidlgata V.; Choi, Byung-Jin, Imprinting of partial fields at the edge of the wafer.
  48. Nimmakayala,Pawan Kumar; Rafferty,Tom H.; Aghili,Alireza; Choi,Byung Jin; Schumaker,Philip D.; Babbs,Daniel A., Interferometric analysis for the manufacture of nano-scale devices.
  49. Nimmakayala, Pawan Kumar; Rafferty, Tom H.; Aghili, Alireza; Choi, Byung Jin; Schumaker, Philip D.; Babbs, Daniel A.; Truskett, Van N., Interferometric analysis method for the manufacture of nano-scale devices.
  50. Nimmakayala, Pawan Kumar; Rafferty, Tom H.; Aghili, Alireza; Choi, Byung-Jin; Schumaker, Philip D.; Babbs, Daniel A.; Truskett, Van Nguyen, Interferometric analysis method for the manufacture of nano-scale devices.
  51. DeSimone, Joseph M.; Denison Rothrock, Ginger; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  52. DeSimone, Joseph M.; Rothrock, Ginger Denison; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  53. Sreenivasan, Sidlgata V.; Singhal, Shrawan; Choi, Byung Jin; McMackin, Ian Matthew, Large area roll-to-roll imprint lithography.
  54. Meissl, Mario Johannes; Cherala, Anshuman; Choi, Byung-Jin; Bamesberger, Seth J., Low contact imprint lithography template chuck system for improved overlay correction.
  55. Xu, Frank Y.; Chun, Jun Sung; Watts, Michael P. C., Low-K dielectric functional imprinting materials.
  56. Xu, Frank Y.; Watts, Michael P. C.; Stacey, Nicholas A., Materials for imprint lithography.
  57. Bamesberger, Seth J.; Srinivasan, Yeshwanth, Method and system for controlled ultraviolet light exposure.
  58. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
  59. Xu, Frank Y., Method for adhering materials together.
  60. Xu, Frank; McMackin, Ian; Lad, PanKaj B.; Watts, Michael P. C., Method for controlling distribution of fluid components on a body.
  61. Schumaker, Philip D., Method for detecting a particle in a nanoimprint lithography system.
  62. Choi, Byung-Jin; GanapathiSubramanian, Mahadevan; Choi, Yeong-jun; Meissl, Mario J., Method for expelling gas positioned between a substrate and a mold.
  63. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian M.; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  64. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian Matthew; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  65. Colburn, Matthew E.; Carter, Kenneth Raymond; McClelland, Gary M.; Pfeiffer, Dirk, Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning.
  66. McMackin, Ian M.; Lad, Pankaj B.; Truskett, Van N., Method for fast filling of templates for imprint lithography using on template dispense.
  67. LaBrake, Dwayne L.; Resnick, Douglas J., Method for forming planarized etch mask structures over existing topography.
  68. Xu, Frank Y.; Sreenivasan, Sidlgata V.; Fletcher, Edward Brian, Method for imprint lithography utilizing an adhesion primer layer.
  69. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  70. Sreenivasan, Sidlgata V.; McMackin, Ian M.; Melliar-Smith, Christopher Mark; Choi, Byung-Jin, Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks.
  71. McMackin, Ian M.; Stacey, Nicholas A.; Babbs, Daniel A.; Voth, Duane J.; Watts, Mathew P. C.; Truskett, Van N.; Xu, Frank Y.; Voisin, Ronald D.; Lad, Pankaj B., Method of creating a turbulent flow of fluid between a mold and a substrate.
  72. Sreenivasan,Sidlgata V., Method of forming a recessed structure employing a reverse tone process.
  73. Sreenivasan,Sidlgata V., Method of forming stepped structures employing imprint lithography.
  74. Choi, Byung Jin; Cherala, Anshuman; Babbs, Daniel A., Method of retaining a substrate to a wafer chuck.
  75. Khusnatdinov, Niyaz; LaBrake, Dwayne L., Method of reverse tone patterning.
  76. Choi, Yeong-Jun; Choi, Byung-Jin, Method to control an atmosphere between a body and a substrate.
  77. Choi,Byung Jin; Xu,Frank Y.; Stacey,Nicholas A.; Truskett,Van Xuan Hong; Watts,Michael P. C., Method to reduce adhesion between a conformable region and a pattern of a mold.
  78. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  79. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  80. Schmid, Gerard M.; Miller, Michael N.; Choi, Byung-Jin; Resnick, Douglas J.; Sreenivasan, Sidlgata V.; Xu, Frank Y.; Donaldson, Darren D., Methods and systems of material removal and pattern transfer.
  81. Ye, Zhengmao; Khusnatdinov, Niyaz; Fletcher, Edward Brian, Methods for controlling spread of imprint material.
  82. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larkin E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography.
  83. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  84. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  85. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography.
  86. Ye, Zhengmao; LaBrake, Dwayne L., Methods for uniform imprint pattern transfer of sub-20 nm features.
  87. Miller, Michael N.; Xu, Frank Y.; Stacey, Nicholas A., Micro-conformal templates for nanoimprint lithography.
  88. Bowen, M. Shane; Gunderson, Kevin L.; Lin, Shengrong; Rogert Bacigalupo, Maria Candelaria; Vijayan, Kandaswamy; Wu, Yir-Shyuan; Venkatesan, Bala Murali; Tsay, James; Beierle, John M.; Berti, Lorenzo; Park, Sang Ryul, Microarray fabrication system and method.
  89. Bowen, M. Shane; Gunderson, Kevin L.; Lin, Shengrong; Rogert Bacigalupo, Maria Candelaria; Vijayan, Kandaswamy; Wu, Yir-Shyuan; Venkatesan, Bala Murali; Tsay, James; Beierle, John M.; Berti, Lorenzo; Park, Sang Ryul, Microarray fabrication system and method.
  90. McMackin,Ian M.; Lad,Pankaj B., Moat system for an imprint lithography template.
  91. Ahn, Se Hyun; Choi, Byung-Jin; Xu, Frank Y., Nano imprinting with reusable polymer template with metallic or oxide coating.
  92. Ahn, Se Hyun; Choi, Byung-Jin; Xu, Frank Y., Nano imprinting with reusable polymer template with metallic or oxide coating.
  93. Liu, Weijun; Xu, Frank Y., Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers.
  94. Menezes, Marlon, Nano-imprint lithography templates.
  95. Wan, Fen; Liu, Weijun; Stachowiak, Timothy Brian, Nanoimprint lithography adhesion layer.
  96. Cavallini,Massimiliano; Biscarini,Fabio, Nanoprinting method.
  97. Yang, Shuqiang; Miller, Michael N.; Hilali, Mohamed M.; Wan, Fen; Schmid, Gerard M.; Wang, Liang; Sreenivasan, Sidlgata V.; Xu, Frank Y., Nanostructured solar cell.
  98. Yang, Shuqiang; Miller, Michael N.; Hilali, Mohamed M.; Wan, Fen; Schmid, Gerard M.; Wang, Liang; Sreenivasan, Sidlgata V.; Xu, Frank Y., Nanostructured solar cell.
  99. Wu, Wei; Robinett, Warren; Wang, Shih Yuan; Gao, Jun; Yu, Zhaoning, Optical gratings, lithography tools including such optical gratings and methods for using same for alignment.
  100. Khusnatdinov, Niyaz; Selinidis, Kosta S.; Imhof, Joseph Michael; LaBrake, Dwayne L., Optically absorptive material for alignment marks.
  101. Cherala,Anshuman; Lad,Pankaj B.; McMackin,Ian M.; Choi,Byung Jin, Partial vacuum environment imprinting.
  102. Sreenivasan, Sidlgata V., Pattern reversal employing thick residual layers.
  103. Russel, William B; Chou, Stephen Y; Pease, III, Leonard F; Deshpande, Parikshit A, Pattern-free method of making line gratings.
  104. Lin, Shengrong; Wu, Yir-Shyuan; Gunderson, Kevin; Moon, John A., Patterned flow-cells useful for nucleic acid analysis.
  105. Sreenivasan, Sidlgata V.; Schumaker, Philip D., Patterning a plurality of fields on a substrate to compensate for differing evaporation times.
  106. Sreenivasan, Sidlgata V.; Singh, Vikramjit; Xu, Frank Y.; Choi, Byung-Jin, Patterning of non-convex shaped nanostructures.
  107. Stacey,Nicholas A.; Sreenivasan,Sidlgata V.; Miller,Michael N., Patterning substrates employing multi-film layers defining etch-differential interfaces.
  108. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Patterning substrates employing multiple chucks.
  109. Kaida, Yuriko; Sakamoto, Hiroshi; Yamamoto, Hirotsugu, Photocurable composition, process for producing fine patterned product and optical element.
  110. DeSimone, Joseph M.; Rolland, Jason P.; Quake, Stephen R.; Schorzman, Derek A.; Yarbrough, Jason; Van Dam, Michael, Photocurable perfluoropolyethers for use as novel materials in microfluidic devices.
  111. Xu, Frank Y.; Liu, Weijun; Fletcher, Edward Brian; Sreenivasan, Sidlgata V.; Choi, Byung Jin; Khusnatdinov, Niyaz; Cherala, Anshuman; Selinidis, Kosta S., Porous template and imprinting stack for nano-imprint lithography.
  112. Sreenivasan,Sidlgata V., Positive tone bi-layer imprint lithography method.
  113. Wang, Yongcai; Lebens, John Andrew; Wright, Mitchell Lawrence; Cummings, Julie A., Preparation of articles with conductive micro-wire pattern.
  114. Nguyen, Houng T.; Xu, Ren; Barnes, Michael S., Process for optimization of island to trench ratio in patterned media.
  115. Kaida, Yuriko; Sakamoto, Hiroshi; Miyagi, Takahira; Sakurai, Hiromi; Ikeda, Yasuhiro; Shidoji, Eiji; Kawamoto, Masako, Process for producing wire-grid polarizer.
  116. Tokita, Toshinobu; Ota, Hirohisa; Kawakami, Eigo; Nakamura, Takashi; Kasumi, Kazuyuki, Processing apparatus.
  117. Xu, Frank Y.; Sreenivasan, Sidlgata V., Reduction of stress during template separation.
  118. Xu, Frank Y.; Liu, Weijun, Release agent partition control in imprint lithography.
  119. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Johnson,Stephen C., Remote center compliant flexure device.
  120. Stachowiak, Timothy Brian; Liu, Weijun; Khusnatdinov, Niyaz; Ye, Zhengmao; Ito, Toshiki, Removing substrate pretreatment compositions in nanoimprint lithography.
  121. Jones, Christopher Ellis; Khusnatdinov, Niyaz; Johnson, Stephen C.; Schumaker, Philip D.; Lad, Pankaj B., Residual layer thickness measurement and correction.
  122. Schumaker, Philip D., Robust optimization to generate drop patterns in imprint lithography which are tolerant of variations in drop volume and drop placement.
  123. Choi, Byung-Jin, Roll-to-roll imprint lithography and purging system.
  124. Im, Se-Hyuk; GanapathiSubramanian, Mahadevan; Fletcher, Edward Brian; Khusnatdinov, Niyaz; Schmid, Gerard M.; Meissl, Mario Johannes; Cherala, Anshuman; Xu, Frank Y.; Choi, Byung-Jin; Sreenivasan, Sidlgata V., Safe separation for nano imprinting.
  125. Sreenivasan, Sidlgata V.; Melliar-Smith, Christopher Mark; LaBrake, Dwayne L., Self-aligned cross-point memory fabrication.
  126. Schmid, Gerard M.; Stacey, Nicholas A; Resnick, Douglas J.; Voisin, Ronald D.; Myron, Lawrence J., Self-aligned process for fabricating imprint templates containing variously etched features.
  127. Xu, Frank Y.; Khusnatdinov, Niyaz, Single phase fluid imprint lithography method.
  128. Liu, Weijun; Xu, Frank Y.; Fletcher, Edward Brian, Solvent-assisted layer formation for imprint lithography.
  129. Sreenivasan, Sidlgata V.; Choi, Byung J.; Schumaker, Norman E.; Voisin, Ronald D.; Watts, Michael P. C.; Meissl, Mario J., Step and repeat imprint lithography processes.
  130. Khusnatdinov, Niyaz; Xu, Frank Y.; Meissl, Mario Johannes; Miller, Michael N.; Thompson, Ecron D.; Schmid, Gerard M.; Nimmakayala, Pawan Kumar; Lu, Xiaoming; Choi, Byung-Jin, Strain and kinetics control during separation phase of imprint process.
  131. Khusnatdinov, Niyaz, System and method for discharging electrostatic charge in nanoimprint lithography processes.
  132. McMackin,Ian M.; Stacey,Nicholas A.; Babbs,Daniel A.; Voth,Duane J.; Watts,Mathew P. C.; Truskett,Van N.; Xu,Frank Y.; Voisin,Ronald D.; Lad,Pankaj B., System for creating a turbulent flow of fluid between a mold and a substrate.
  133. Schumaker, Philip D.; Fancello, Angelo; Kim, Jae H.; Choi, Byung-Jin; Babbs, Daniel A., System to transfer a template transfer body between a motion stage and a docking plate.
  134. GanapathiSubramanian, Mahadevan; Choi, Byung-Jin; Miller, Michael N.; Stacey, Nicholas A., Technique for separating a mold from solidified imprinting material.
  135. Selinidis, Kosta S.; Choi, Byung-Jin; Schmid, Gerard M.; Thompson, Ecron D.; McMackin, Ian Matthew, Template having alignment marks formed of contrast material.
  136. Selinidis, Kosta S., Templates having high contrast alignment marks.
  137. Sreenivasan, Sidlgata V.; Schumaker, Philip D.; McMackin, Ian M., Tessellated patterns in imprint lithography.
  138. Xu, Frank Y.; Fletcher, Edward Brian, Ultra-thin polymeric adhesion layer.
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