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Functional patterning material for imprint lithography processes 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29D-011/00
출원번호 US-0235314 (2002-09-05)
발명자 / 주소
  • Watts, Michael P. C.
출원인 / 주소
  • Molecular Imprints, Inc.
인용정보 피인용 횟수 : 89  인용 특허 : 21

초록

The present invention provides a method for forming an optical coupling device on a substrate by disposing a material onto the substrate that is polymerizable in response to actinic radiation. A stack of the material is formed by contacting the material with a template having a stepped-recess formed

대표청구항

1. A method of forming an optical coupling device on a substrate, said method including:forming a stress relief layer on said substrate producing, on said stress relief layer, an optically transparent body with a surface having a plurality of steps by disposing a material onto said stress relief lay

이 특허에 인용된 특허 (21)

  1. Maracas George N. (Phoenix AZ) Dworsky Lawrence N. (Scottsdale AZ) Tobin Kathleen (Tempe AZ), Apparatus and method for stamping a surface.
  2. Schueller Olivier J. A. ; Brittain Scott ; Whitesides George M., Fabrication of carbon microstructures.
  3. Chengzeng Xu ; Chengjiu Wu ; Kelly M. T. Stengel ; Lawrence W. Shacklette ; Louay Eldada ; James T. Yardley, High performance acrylate materials for optical interconnects.
  4. Bonnebat Claude (Pontault-Combault FRX) Quentin Jean-Pierre (Lyon FRX) Morin Alain (Villeurbanne FRX), Highly oriented thermotropic optical disc member.
  5. Sethumadhauan Chandrasekhar ; Andrew Gomperz Dentai, Integrated dual-wavelength transceiver.
  6. Tanigawa Makoto (Kitakatsuragi JPX) Tabuchi Hiroki (Nara JPX) Taniguchi Takayuki (Tenri JPX), Method for forming a fine resist pattern.
  7. Yuichi Iwasaki JP; Ichiro Tanaka JP, Method for forming fine structure.
  8. Kuwabara Kazuhiro (Hitachi JPX) Mori Yuji (Hitachi JPX) Mikami Yoshiro (Hitachi JPX), Method of manufacturing a thin-film pattern on a substrate.
  9. Harrison Christopher ; Park Miri ; Register Richard ; Adamson Douglas ; Mansky Paul ; Chaikin Paul, Method of nanoscale patterning and products made thereby.
  10. Haisma Jan (Eindhoven NLX) Verheijen Martinus (Eindhoven NLX) Schrama Johannes T. (Eindhoven NLX), Method of providing a patterned relief of cured photoresist on a flat substrate surface and device for carrying out such.
  11. Whitesides George M. ; Xia Younan ; Wilbur James L. ; Jackman Rebecca J. ; Kim Enoch ; Prentiss Mara G. ; Mrksich Milan ; Kumar Amit ; Gorman Christopher B. ; Biebuyck Hans,CHX ; Berggren Karl K., Methods of etching articles via microcontact printing.
  12. Whitesides George M. ; Xia Younan ; Wilbur James L. ; Jackman Rebecca J. ; Kim Enoch ; Prentiss Mara G. ; Mrksich Milan ; Kumar Amit ; Gorman Christopher B. ; Biebuyck Hans,CHX ; Berggren Karl K., Microcontact printing on surfaces and derivative articles.
  13. Lochhead Michael J. ; Yager Paul, Multiple patterned structures on a single substrate fabricated by elastomeric micro-molding techniques.
  14. Chou Stephen Y., Nanoimprint lithography.
  15. Heming Martin (Saulheim DEX) Hochhaus Roland (Mainz DEX) Kersten Ralf (Bremthal DEX) Krause Dieter (Mainz DEX) Otto Jrgen (Mainz DEX) Paquet Volker (Mainz DEX) Segner Johannes (Stromberg DEX) Fatting, Optical inorganic waveguide with a substantially planar organic substrate.
  16. Fontana ; Jr. Robert Edward ; Hsiao Richard ; Marinero Ernesto Esteban ; Santini Hugo Alberto Emilio ; Terris Bruce David, Patterned magnetic media and method of making the same using selective oxidation.
  17. Marsh Eugene P., Planarization of non-planar surfaces in device fabrication.
  18. Napoli Louis S. (Hamilton Township ; Mercer County NJ) Russell John P. (Pennington NJ), Process for forming a lithographic mask.
  19. Buermann Dale ; Forouhi Abdul Rahim ; Mandella Michael J., Reflectance spectroscopic apparatus with toroidal mirrors.
  20. Carlton Grant Willson ; Matthew Earl Colburn, Step and flash imprint lithography.
  21. Okubora Akihiko (Kanagawa JPX) Takano Chiaki (Kanagawa JPX) Tanaka Kiyoshi (Kanagawa JPX) Ishikawa Hideto (Kanagawa JPX), Three-dimensional optical-electronic integrated circuit device with raised sections.

이 특허를 인용한 특허 (89)

  1. Nimmakayala, Pawan Kumar; Choi, Byung-Jin, Alignment system and method for a substrate in a nano-imprint process.
  2. Cherala, Anshuman; Choi, Byung Jin; Lad, Pankaj B.; Shackleton, Steven C., Chucking system comprising an array of fluid chambers.
  3. GanapathiSubramanian, Mahadevan; Meissl, Mario Johannes; Panga, Avinash; Choi, Byung-Jin, Chucking system with recessed support feature.
  4. Xu, Frank Y., Composition for adhering materials together.
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  6. Xu,Frank Y.; Miller,Michael N., Composition to reduce adhesion between a conformable region and a mold.
  7. Khusnatdinov, Niyaz; LaBrake, Dwayne L., Contaminate detection and substrate cleaning.
  8. Fletcher, Edward Brian; Schmid, Gerard M.; Im, Se-Hyuk; Khusnatdinov, Niyaz; Srinivasan, Yeshwanth; Liu, Weijun; Xu, Frank Y., Drop pattern generation for imprint lithography with directionally-patterned templates.
  9. Menezes, Marlon; Xu, Frank Y.; Wan, Fen, Enhanced densification of silicon oxide layers.
  10. Khusnatdinov, Niyaz; Jones, Christopher Ellis; Perez, Joseph G.; LaBrake, Dwayne L.; McMackin, Ian Matthew, Extrusion reduction in imprint lithography.
  11. Resnick, Douglas J.; Miller, Michael N.; Xu, Frank Y., Fabrication of seamless large area master templates for imprint lithography using step and repeat tools.
  12. Fletcher, Edward B.; Ye, Zhengmao; LaBrake, Dwayne L.; Xu, Frank Y., Facilitating adhesion between substrate and patterned layer.
  13. Willson, Carlton Grant; Ogawa, Tsuyoshi; Lin, Michael W.; Hellebusch, Daniel J.; Jacobsson, B. Michael; Bell, William K., Fluorinated silazane release agents in nanoimprint lithography.
  14. Sreenivasan, Sidlgata V.; Yang, Shuqiang; Xu, Frank Y.; Singh, Vikramjit, Functional nanoparticles.
  15. Imhof, Joseph Michael; Selinidis, Kosta S.; LaBrake, Dwayne L., High contrast alignment marks through multiple stage imprinting.
  16. Bandic,Zvonimir Z.; Knigge,Bernhard E.; Mate,Charles Mathew, High resolution patterning of surface energy utilizing high resolution monomolecular resist for fabrication of patterned media masters.
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  18. Xu, Frank Y.; McMackin, Ian Matthew; Lad, Pankaj B., Imprint lithography method.
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  20. Haase, Gaddi S.; Selinidis, Kosta S.; Ye, Zhengmao, Imprint lithography template and method for zero-gap imprinting.
  21. Liu, Weijun; Stachowiak, Timothy Brian; DeYoung, James P.; Khusnatdinov, Niyaz, Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography.
  22. DeSimone, Joseph M.; Denison Rothrock, Ginger; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  23. DeSimone, Joseph M.; Rothrock, Ginger Denison; Maynor, Benjamin W.; Rolland, Jason P., Isolated and fixed micro and nano structures and methods thereof.
  24. Choi, Byung-Jin; Ahn, Se Hyun; GanapathiSubramanian, Mahadevan; Miller, Michael N.; Sreenivasan, Sidlgata V., Large area imprint lithography.
  25. Fonash, Stephen J.; Li, Handong; Stone, David, Lateral collection photovoltaics.
  26. Meissl, Mario Johannes; Cherala, Anshuman; Choi, Byung-Jin; Bamesberger, Seth J., Low contact imprint lithography template chuck system for improved overlay correction.
  27. Xu, Frank Y.; Chun, Jun Sung; Watts, Michael P. C., Low-K dielectric functional imprinting materials.
  28. Xu, Frank Y.; Watts, Michael P. C.; Stacey, Nicholas A., Materials for imprint lithography.
  29. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system for double-sided patterning of substrates.
  30. Choi, Byung-Jin; Sreenivasan, Sidlgata V., Method and system to control movement of a body for nano-scale manufacturing.
  31. Xu, Frank Y., Method for adhering materials together.
  32. Xu, Frank; McMackin, Ian; Lad, PanKaj B.; Watts, Michael P. C., Method for controlling distribution of fluid components on a body.
  33. Xu, Frank Y.; Sreenivasan, Sidlgata V.; Fletcher, Edward Brian, Method for imprint lithography utilizing an adhesion primer layer.
  34. Cherala, Anshuman; Sreenivasan, Sidlgata V.; Choi, Byung-Jin; Thompson, Ecron D., Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques.
  35. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
  36. Xu, Frank Y.; Lad, Pankaj B.; McMackin, Ian M.; Truskett, Van N.; Fletcher, Edward B., Method of providing desirable wetting and release characteristics between a mold and a polymerizable composition.
  37. Choi, Byung Jin; Cherala, Anshuman; Babbs, Daniel A., Method of retaining a substrate to a wafer chuck.
  38. Khusnatdinov, Niyaz; LaBrake, Dwayne L., Method of reverse tone patterning.
  39. Choi,Byung Jin; Xu,Frank Y.; Stacey,Nicholas A.; Truskett,Van Xuan Hong; Watts,Michael P. C., Method to reduce adhesion between a conformable region and a pattern of a mold.
  40. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  41. DeSimone, Joseph M.; Rolland, Jason P.; Rothrock, Ginger M. Denison; Resnick, Paul, Methods and materials for fabricating microfluidic devices.
  42. Schmid, Gerard M.; Miller, Michael N.; Choi, Byung-Jin; Resnick, Douglas J.; Sreenivasan, Sidlgata V.; Xu, Frank Y.; Donaldson, Darren D., Methods and systems of material removal and pattern transfer.
  43. Ye, Zhengmao; Khusnatdinov, Niyaz; Fletcher, Edward Brian, Methods for controlling spread of imprint material.
  44. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larkin E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- and nano-structures using soft or imprint lithography.
  45. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  46. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E.; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro- or nano-structures using soft or imprint lithography.
  47. DeSimone, Joseph M.; Rolland, Jason P.; Maynor, Benjamin W.; Euliss, Larken E.; Rothrock, Ginger Denison; Dennis, Ansley E; Samulski, Edward T.; Samulski, R. Jude, Methods for fabricating isolated micro-and nano-structures using soft or imprint lithography.
  48. Ye, Zhengmao; LaBrake, Dwayne L., Methods for uniform imprint pattern transfer of sub-20 nm features.
  49. Miller, Michael N.; Xu, Frank Y.; Stacey, Nicholas A., Micro-conformal templates for nanoimprint lithography.
  50. Lebl, Michal; Heiner, David L.; Zhao, Chanfeng; Barker, David L., Microfabrication methods for the optimal patterning of substrates.
  51. Ahn, Se Hyun; Choi, Byung-Jin; Xu, Frank Y., Nano imprinting with reusable polymer template with metallic or oxide coating.
  52. Ahn, Se Hyun; Choi, Byung-Jin; Xu, Frank Y., Nano imprinting with reusable polymer template with metallic or oxide coating.
  53. Liu, Weijun; Xu, Frank Y., Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers.
  54. Menezes, Marlon, Nano-imprint lithography templates.
  55. Wan, Fen; Liu, Weijun; Stachowiak, Timothy Brian, Nanoimprint lithography adhesion layer.
  56. Singh, Vikramjit; Xu, Frank Y.; Sreenivasan, Sidlgata V., Nanoimprint lithography formation of functional nanoparticles using dual release layers.
  57. Xu, Frank Y.; Sreenivasan, Sidlgata V.; Yang, Shuqiang, Nanoimprint lithography processes for forming nanoparticles.
  58. Yang, Shuqiang; Miller, Michael N.; Hilali, Mohamed M.; Wan, Fen; Schmid, Gerard M.; Wang, Liang; Sreenivasan, Sidlgata V.; Xu, Frank Y., Nanostructured solar cell.
  59. Yang, Shuqiang; Miller, Michael N.; Hilali, Mohamed M.; Wan, Fen; Schmid, Gerard M.; Wang, Liang; Sreenivasan, Sidlgata V.; Xu, Frank Y., Nanostructured solar cell.
  60. Khusnatdinov, Niyaz; Selinidis, Kosta S.; Imhof, Joseph Michael; LaBrake, Dwayne L., Optically absorptive material for alignment marks.
  61. Sreenivasan, Sidlgata V.; Schumaker, Philip D., Patterning a plurality of fields on a substrate to compensate for differing evaporation times.
  62. Sreenivasan, Sidlgata V.; Singh, Vikramjit; Xu, Frank Y.; Choi, Byung-Jin, Patterning of non-convex shaped nanostructures.
  63. Stacey,Nicholas A.; Sreenivasan,Sidlgata V.; Miller,Michael N., Patterning substrates employing multi-film layers defining etch-differential interfaces.
  64. DeSimone, Joseph M.; Rolland, Jason P.; Quake, Stephen R.; Schorzman, Derek A.; Yarbrough, Jason; Van Dam, Michael, Photocurable perfluoropolyethers for use as novel materials in microfluidic devices.
  65. Xu, Frank Y.; Fletcher, Edward Brian; Lad, Pankaj B.; Watts, Michael P. C., Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor.
  66. Xu, Frank Y.; Liu, Weijun; Fletcher, Edward Brian; Sreenivasan, Sidlgata V.; Choi, Byung Jin; Khusnatdinov, Niyaz; Cherala, Anshuman; Selinidis, Kosta S., Porous template and imprinting stack for nano-imprint lithography.
  67. Bietsch, Alexander; Delamarche, Emmanuel; Michel, Bruno; Schmid, Heinz; Wolf, Heiko, Printing in a medium.
  68. Bietsch, Alexander; Delamarche, Emmanuel; Michel, Bruno; Schmid, Heinz; Wolf, Heiko, Printing in a medium.
  69. Nguyen, Houng T.; Xu, Ren; Barnes, Michael S., Process for optimization of island to trench ratio in patterned media.
  70. Xu, Frank Y.; Sreenivasan, Sidlgata V., Reduction of stress during template separation.
  71. Xu, Frank Y.; Liu, Weijun, Release agent partition control in imprint lithography.
  72. Guo, Xing Cai; Kercher, Dan S.; Marchon, Bruno; Mate, Charles M.; Wu, Tsai Wei, Release layer and resist material for master tool and stamper tool.
  73. Stachowiak, Timothy Brian; Liu, Weijun; Khusnatdinov, Niyaz; Ye, Zhengmao; Ito, Toshiki, Removing substrate pretreatment compositions in nanoimprint lithography.
  74. Jones, Christopher Ellis; Khusnatdinov, Niyaz; Johnson, Stephen C.; Schumaker, Philip D.; Lad, Pankaj B., Residual layer thickness measurement and correction.
  75. Choi, Byung-Jin, Roll-to-roll imprint lithography and purging system.
  76. Im, Se-Hyuk; GanapathiSubramanian, Mahadevan; Fletcher, Edward Brian; Khusnatdinov, Niyaz; Schmid, Gerard M.; Meissl, Mario Johannes; Cherala, Anshuman; Xu, Frank Y.; Choi, Byung-Jin; Sreenivasan, Sidlgata V., Safe separation for nano imprinting.
  77. Sreenivasan, Sidlgata V.; Melliar-Smith, Christopher Mark; LaBrake, Dwayne L., Self-aligned cross-point memory fabrication.
  78. Liu, Weijun; Xu, Frank Y.; Fletcher, Edward Brian, Solvent-assisted layer formation for imprint lithography.
  79. Bietsch, Alexander; Delamarche, Emmanuel; Michel, Bruno; Schmid, Heinz; Wolf, Heiko, Stamp with drainage channels for transferring a pattern in the presence of a third medium.
  80. Bietsch, Alexander; Delamarche, Emmanuel; Michel, Bruno; Schmid, Heinz; Wolf, Heiko, Stamp with permeable hydrophylic matrix.
  81. Khusnatdinov, Niyaz; Xu, Frank Y.; Meissl, Mario Johannes; Miller, Michael N.; Thompson, Ecron D.; Schmid, Gerard M.; Nimmakayala, Pawan Kumar; Lu, Xiaoming; Choi, Byung-Jin, Strain and kinetics control during separation phase of imprint process.
  82. Choi, Byung-Jin; Nimmakayala, Pawan Kumar; GanapathiSubramanian, Mahadevan, Substrate alignment.
  83. Khusnatdinov, Niyaz, System and method for discharging electrostatic charge in nanoimprint lithography processes.
  84. Resnick, Douglas J.; Meissl, Mario Johannes; Choi, Byung-Jin; Sreenivasan, Sidlgata V., Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template.
  85. Sreenivasan, Sidlgata V., Template pattern density doubling.
  86. Selinidis, Kosta S., Templates having high contrast alignment marks.
  87. Sreenivasan, Sidlgata V.; Schumaker, Philip D.; McMackin, Ian M., Tessellated patterns in imprint lithography.
  88. Riedo, Elisa; Marder, Seth R.; de Heer, Walt A.; Szoskiewicz, Robert J.; Kodali, Vamsi K.; Jones, Simon C.; Okada, Takashi; Wang, Debin; Curtis, Jennifer E.; Henderson, Clifford L.; Hua, Yueming, Thermochemical nanolithography components, systems, and methods.
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