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Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two s

Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients.

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1. A method of controlling a laser beam system, the method comprising the steps of:a) directing an incident laser beam onto a workpiece; b) providing at least one command signal from a controller to at least one auxiliary device to control an output parameter generated by said at least one auxiliary

1. A method of controlling a laser beam system, the method comprising the steps of:a) directing an incident laser beam onto a workpiece; b) providing at least one command signal from a controller to at least one auxiliary device to control an output parameter generated by said at least one auxiliary device, wherein at least one auxiliary device is one of an energy source and an automatic process controller; c) detecting said output parameter generated by at least one auxiliary device and adjusting said at least one command signal provided to at least one auxiliary device based on said detected output; c1) detecting at least one signal emitted from said workpiece in response to said incident laser beam at an optical detector, said detector generating two outputs based on said at least one signal; and c2) adjusting at least one command signal from said controller to at least one auxiliary device to control said at least one signal emitted from said workpiece, said at least one command signal provided by said controller is based upon a ratio of said two outputs and a magnitude of at least one of said two outputs. 2. The method of claim 1 wherein the step of providing at least one command signal further comprises the steps of:b1) determining a location in a lookup table based on said ratio and said magnitude of at least one of said two outputs; and b2) providing a command signal based on said lookup table based upon said location in said lookup table. 3. The method of claim 1 wherein said at least one command signal is a laser beam command signal and said auxiliary device is said energy source for controlling said laser beam.4. The method of claim 1 wherein said at least one command signal is a gas flow command signal and said at least one auxiliary device is said automatic process controller for controlling said gas flow supplied by said automatic process controller.5. The method of claim 1 wherein said at least one auxiliary device is an automatic process controller for controlling a gas flow to said laser beam system and step c) comprises detecting pressure of a gas exiting said automatic process controller and adjusting said command signal provided to said automatic process controller based on said pressure.6. A method of controlling a laser beam system, the method comprising the steps of:a) directing an incident laser beam onto a workpiece; b) providing at least one command signal from a controller to at least one auxiliary device to control an output parameter generated by said at least one auxiliary device, wherein said at least one auxiliary device comprises a first auxiliary device that is an automatic process controller and a second auxiliary device that is an energy source; and c) detecting a pressure of an outlet gas exiting said automated process controller and adjusting said command signal provided to said energy source for controlling laser beam energy based on said pressure of said outlet gas. 7. The method of claim 6 wherein step c) comprises detecting a feedback signal generated by said energy source indicative of an energy beam of said laser beam system and adjusting said command signal provided to said automatic process controller for controlling a gas flow based on said feedback signal.8. The method of claim 7 wherein step of detecting a feedback signal comprises detecting at least one signal emitted from said workpiece in response to said incident laser beam at an optical detector, said detector generating two outputs based on said at least one signal.9. A method of controlling a laser beam system, the method comprising the steps of:a) directing an incident laser beam onto a workpiece; b) providing at least one command signal from a controller to at least one auxiliary device to control an output parameter generated by said at least one auxiliary device, wherein said at least one auxiliary device comprises a first auxiliary device that is an automatic process controller and a second auxiliary device that is a laser height controller; and c) detecting a feedback signal generated by said energy source indicative of an energy signal of said laser beam system and adjusting said command signal provided to said laser height control for controlling a standoff based on said feedback signal. 10. The method of claim 9 wherein said step of detecting a feedback signal comprises detecting at least one signal emitted from said workpiece in response to said incident laser beam at an optical detector, said detector generating two outputs based on said at least one signal.11. The method of claim 1 wherein said magnitude of said at least one of said two outputs is a maximum value.12. The method of claim 1 wherein said detector comprises at least two detector elements.13. The method of claim 1 wherein said two outputs comprise a first spectral band of light and a second spectral band of light.14. The method of claim 13 wherein said first spectral band of light has a lower band of wavelengths than said second spectral band of light.15. The method of claim 13 wherein said first spectral band of light is a spectral band between about 450 nm and about 650 nm.16. The method of claim 13 wherein said second spectral band of light is a spectral band between about 950 nm and about 1,150 nm.17. The method of claim 1 further comprising the steps of:d) inputting a first group of process parameters into a controller; and generating a second group of process parameters based on said first group of parameters. 18. The method of claim 1 wherein said laser beam is directed onto a workpiece by a cutting head, said cutting head comprises a plenum, a nozzle, a focusing lens, and an optical receiver, and the detector.19. The method of claim 18 wherein said optical receiver comprises at least one port for conveying said at least one signal emitted from said workpiece to a cable, said cable conveying said at least one signal emitted from said workpiece to said detector.20. An apparatus for controlling a laser beam system, said apparatus comprising:a light source that directs an incident laser beam onto a workpiece; a controller in communication with said light source that provides at least one command signal to at least one auxiliary device to control an output parameter generated by said at least one auxiliary device, wherein at least one auxiliary device is one of an energy source and an automatic process controller; and a detection module for detecting said output parameter generated by at least one auxiliary device for adjusting said at least one command signal provided to at least one auxiliary device based on said detected output, wherein the detection module comprises an optical detector for measuring at least one signal emitted from said workpiece in response to said incident laser beam, said optical detector generating two outputs based on said at least one signal, and said controller is in communication with said optical detector, and said controller passes at least one command signal from said controller to at least one auxiliary device to control said at least one signal emitted from said workpiece, said at least one command signal provided by said controller is based upon a ratio of said two outputs and a magnitude of at least one of said two outputs. 21. The apparatus of claim 20 wherein said controller controls said laser beam system by:determining a location in a lookup table based on said ratio and said magnitude of at least one of said two outputs; and providing a command signal based on said lookup table based upon said location in said lookup table. 22. The apparatus of claim 20 wherein said light source comprises a cutting head, said cutting head comprises a plenum, a nozzle, a focusing lens, and an optical receiver.23. The apparatus of claim 22 wherein said optical receiver comprises at least one port for conveying said at least one signal emitted from said workpiece to a cable, said cable conveying said at least one signal emitted from said workpiece to said detector.24. The apparatus of claim 23 wherein said optical receiver comprises an annular ring for locating said at least one port in a laser cutting head.25. The apparatus of claim 20 wherein said at least one command signal is a laser beam command signal and said auxiliary device is said energy source for controlling said laser beam.26. The apparatus of claim 20 wherein said at least one command signal is a gas flow command signal and said at least one auxiliary device is said automatic process controller for controlling said gas flow supplied by said automatic process controller.27. The apparatus of claim 20 wherein said at least one auxiliary device is an automatic process controller for controlling a gas flow to said laser beam system and said detection module detects pressure of a gas exiting said automatic process controller.28. An apparatus for controlling a laser beam system, said apparatus comprising:a light source that directs an incident laser beam onto a workpiece; a controller in communication with said light source that provides at least one command signal to at least one auxiliary device to control an output parameter generated by said at least one auxiliary device, wherein said first auxiliary device is an automatic process controller and said second auxiliary device is an energy source; and a detection module that detects a pressure of an outlet gas exiting said automated process controller and adjusts said command signal provided to said energy source for controlling laser beam energy based on said pressure of said outlet gas. 29. The apparatus of claim 28 wherein said detection module detects a feedback signal generated by said energy source indicative of an energy beam of said laser beam system and adjusts said command signal provided to said automatic process controller for controlling a gas flow based on said feedback signal.30. The apparatus of claim 29 wherein said feedback signal is at least one signal emitted from said workpiece in response to said incident laser beam, said detection module generates two outputs based on said at least one signal.31. An apparatus for controlling a laser beam system, said apparatus comprising:a light source that directs an incident laser beam onto a workpiece; a controller in communication with said light source that provides at least one command signal to at least one auxiliary device to control an output parameter generated by said at least one auxiliary device, wherein said first auxiliary device is an energy source and said second auxiliary device is a laser height controller; and a detection module that detects a feedback signal generated by said energy source indicative of an energy signal of said laser beam system and adjusts said command signal provided to said laser height controller for controlling a standoff based on said feedback signal. 32. The apparatus of claim 31 wherein said feedback signal is at least one signal emitted from said workpiece in response to said incident laser beam, said detection module generates two outputs based on said at least one signal.33. The apparatus of claim 20 wherein said magnitude of said at least one of said two outputs is a maximum value.34. The apparatus of claim 20 wherein said detector comprises at least two detector elements.35. The apparatus of claim 20 wherein said two outputs comprise a first spectral band of light and a second spectral band of light.36. The apparatus of claim 35 wherein said first spectral band of light has a lower band of wavelengths than said second spectral band of light.37. The apparatus of claim 35 wherein said first spectral band of light is a spectral band between about 450 nm and about 650 nm.38. The apparatus of claim 35 wherein said second spectral band of light is a spectral band between about 950 nm and about 1150 nm.39. A method of controlling a material processing system, the method comprising the steps of:directing a material processing stream onto a workpiece; providing at least one command signal from a controller to at least one auxiliary device to control an output parameter generated by said at least one auxiliary device, wherein at least one auxiliary device is one of a material processing stream source and an automatic process controller; and detecting said output parameter generated by at least one auxiliary device and adjusting said at least one command signal provided to at least one auxiliary device based on said detected output, detecting at least one signal emitted from said workpiece in response to said material processing stream at an optical detector, said detector generating two outputs based on said at least one signal; and adjusting at least one command signal from said controller to at least one auxiliary device to control said at least one signal emitted from said workpiece, said at least one command signal provided by said controller is based upon a ratio of said two outputs and a magnitude of at least one of said two outputs. 40. The method of claim 39 wherein the step of providing at least one command signal further comprises the steps of:determining a location in a lookup table based on said ratio and said magnitude of at least one of said two outputs; and providing a command signal based on said lookup table based upon said location in said lookup table. 41. The method of claim 39 wherein said material processing stream source is a laser system, and said material processing stream is a laser beam.42. The method of claim 39 wherein said material processing stream source is a plasma arc system and said material processing stream is a plasma arc.