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특허 상세정보

Electron source

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) H01J-049/00   
미국특허분류(USC) 250/288; 250/423.F
출원번호 US-0752194 (2004-01-05)
발명자 / 주소
인용정보 피인용 횟수 : 3  인용 특허 : 34
초록

A filament assembly configured for generating electrons and including nanoparticles and/or nanofilaments. The filament assembly is optionally incorporated an analytical systems such as a mass analyzer or x-ray source. The nanoparticles and/or nanofilaments are configured to produce improved electron generation, thermal stability, and/or other properties relative to the prior art. Methods of using the filament assembly are described.

대표
청구항

1. A mass analyzer comprising an electron source, the electron source including:an electron filament coupled to an electrical supply, the electron filament including a conductive wire or conductive ribbon, the electron filament configured to generate electrons when heated and configured to generate electrons while a background pressure in the source is greater than 1.0×10?5 Torr;a plurality of nanofilaments disposed on the surface of the electron filament; anda filament body for positioning the electron filament relative to a mass filter.2. The mass anal...

이 특허에 인용된 특허 (34)

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