초록 ▼

A substrate transfer apparatus capable of preventing contaminants from sticking to a substrate again when the substrate is unloaded, wherein a first support member and a second support member are provided on an arm, the first support member supporting the substrate when the substrate is loaded into

A substrate transfer apparatus capable of preventing contaminants from sticking to a substrate again when the substrate is unloaded, wherein a first support member and a second support member are provided on an arm, the first support member supporting the substrate when the substrate is loaded into a processing machine and the second support member supporting the substrate when the substrate is unloaded from the processing machine.

대표청구항 ▼

1. A substrate transfer method of transferring a substrate supported by a moving arm to a processing machine, the method comprising:disposing on a top surface of the arm a plurality of support sets each including a first support member and a second support member to support the substrate, the first

1. A substrate transfer method of transferring a substrate supported by a moving arm to a processing machine, the method comprising:disposing on a top surface of the arm a plurality of support sets each including a first support member and a second support member to support the substrate, the first support member being formed of a suction pad supported on a top surface of a diaphragm and the second support member being formed of projections fixed on the top face of the arm;supplying fluid under the diaphragm to support the substrate with the first support member rising due to upward expansion of the diaphragm when loading the substrate into the processing machine, anddepressurizing under the diaphragm to support the substrate with the second support member due to a downward dent of the diaphragm when unloading the substrate from the processing machine.2. The method according to claim 1, wherein the processing machine is a cleaning machine for cleaning a substrate.