초록 ▼

Novel methods of making laminated, microchannel devices are described. Examples include: assembly from thin strips rather than sheets; and hot isostatic pressing (HIPing) to form devices with a hermetically sealed wall. Laminated microchannel articles having novel features are also described. The in

Novel methods of making laminated, microchannel devices are described. Examples include: assembly from thin strips rather than sheets; and hot isostatic pressing (HIPing) to form devices with a hermetically sealed wall. Laminated microchannel articles having novel features are also described. The invention includes processes conducted using any of the articles described.

대표청구항 ▼

We claim: 1. A process of conducting a unit operation in device comprising a step of passing a process stream into a device comprising: a substrate having a surface, the surface having a first section and a second section; a first support on the first section of the surface of the substrate and a f

We claim: 1. A process of conducting a unit operation in device comprising a step of passing a process stream into a device comprising: a substrate having a surface, the surface having a first section and a second section; a first support on the first section of the surface of the substrate and a first thin sheet over the support and a microchannel between the substrate and the thin sheet, wherein the microchannel has a thickness defined by the surface of the support and a first surface of the thin sheet; wherein the first support has a thickness that is substantially equal to the thickness of the microchannel; a second support on the second section of the surface of the substrate and a second thin sheet over the second support and a first channel between a second surface of the first thin sheet and a surface of the second thin sheet, and a second channel between the substrate and the surface of the second thin sheet, and wherein the second support has a thickness that is greater than the thickness of the first support; and channel walls on the surface of the substrate and adjacent to the microchannel such that there is a continuous flow path between the microchannel and the second channel; and wherein the thickness of the second channel is greater than the thickness of the microchannel; and wherein the process stream passes through the continuous flow path formed by the microchannel and the second channel. 2. A process of conducting a unit operation in an integrated, laminated, microchannel device, comprising: passing a process stream into a microchannel in a first section of an laminated device; wherein the microchannel has a first cross-sectional area, and conducting a unit operation and exchanging heat between the microchannel and an adjacent heat exchange channel; wherein the process stream passes from the microchannel into a channel that is located in a second section of the laminated device; wherein the channel in the second section has a second cross-sectional area, wherein the second cross-sectional area is greater than the first cross-sectional area; and conducting a unit operation in the second section; wherein the heat exchange volume percentage is the volume percent of a section that is occupied by heat exchange channels; and wherein the heat exchange volume percentage of the first section is greater than the heat exchange volume percentage of the second section. 3. The process of claim 2 wherein the unit operation in the first section comprises a chemical reaction, and wherein the unit operation in the second section comprises a chemical reaction. 4. The process of claim 3 wherein the microchannel and the channel comprise catalyst and first section comprises at least twice as many microchannels as there are channels in second section. 5. The process of claim 2 wherein the second section comprises at least 2 layers and the first section comprises at least one more layer than the second section. 6. The process of claim 3 wherein the unit operation in the second section comprises a chemical reaction selected from the group consisting of: acetylation, addition reactions, alkylation, dealkylation, hydrodealkylation, reductive alkylation, amination, ammoxidation aromatization, arylation, autothermal reforming, carbonylation, decarbonylation, reductive carbonylation, carboxylation, reductive carboxylation, reductive coupling, condensation, cracking, hydrocracking, cyclization, cyclooligomerization, dehalogenation, dehydrogenation, oxydehydrogenation, dimerization, epoxidation, esterification, exchange, Fischer-Tropsch, halogenation, hydrohalogenation, homologation, hydration, dehydration, hydrogenation, dehydrogenation, hydrocarboxylation, hydroformylation, hydrogenolysis, hydrometallation, hydrosilation, hydrolysis, hydrotreating (including hydrodesulferization HDS/HDN), isomerization, methylation, demethylation, metathesis, nitration, oxidation, partial oxidation, polymerization, reduction, reformation, reverse water gas shift, Sabatier, sulfonation, telomerization, transesterification, trimerization, and water gas shift. 7. The process of claim 2 wherein the microchannel in the first section comprises flow modifiers and the process stream flows around the flow modifiers. 8. The process of claim 2 wherein, in the first section, heat transfers between the process stream and a heat exchange fluid; wherein the heat exchange fluid flows perpendicularly to the process stream. 9. The process of claim 8 wherein the cross-sectional area of the process stream changes in a stepwise fashion as the process stream passes from the first section to the second section. 10. The process of claim 3 wherein the unit operation in the first section comprises a dehydrogenation or oxydehydrogenation. 11. The process of claim 2 wherein the integrated, laminated, microchannel device comprises at least 2 repeating units and the process stream is passed into the microchannel in the first section of said at least 2 repeating units. 12. The process of claim 1 wherein the device comprises at least 2 repeating units and wherein the process stream passes through the continuous flow path formed by the microchannel and the second channel in each of the at least 2 repeating units. 13. The process of claim 3 wherein the unit operation in the first section comprises oxidation or partial oxidation. 14. The process of claim 3 wherein the unit operation in the first section comprises a Fischer-Tropsch synthesis. 15. The process of claim 1 wherein the device comprises at least 5 repeating units and wherein the process stream passes through the continuous flow path formed by the microchannel and the second channel in each of the at least 5 repeating units. 16. The process of claim 7 wherein the flow modifiers comprise support ribs that extend for 80% or less of a flow path through the first section. 17. The process of claim 1 wherein the microchannel in the device is made by a process comprising: providing a first thin strip having a length-to-width aspect ratio of at least 10 and a length of at least 5 cm; providing a second thin strip having a length-to-width aspect ratio of at least 10 and a length of at least 5 cm; placing the first and second strips on a stack so that the strips lie within the same plane wherein the plane is perpendicular to thickness; and bonding the first and second strips into the stack such that the strips form walls of a microchannel and the distance between the strips varies by less than 0.5 mm over the length of the strips. 18. The process of claim 16 wherein the flow modifiers have been bonded into the laminated device using heating and cooling rates of 1째 C./minute or less.