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Control system for a sputtering system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H02P-009/10
  • H02P-009/44
  • H02P-009/00
  • H02P-009/04
  • H02P-011/00
출원번호 US-0642505 (2003-08-18)
발명자 / 주소
  • Tracy,Mark D.
  • Klein,Jesse N.
출원인 / 주소
  • MKS Instruments, Inc.
대리인 / 주소
    Proskauer Rose LLP
인용정보 피인용 횟수 : 10  인용 특허 : 51

초록

A fault handling algorithm processes a plurality of fault status signals from a sputtering system in a period of time to generate at least one command signal for affecting the operation of a power generator.

대표청구항

What is claimed is: 1. A method for controlling the operation of a power generator, comprising: receiving a plurality of fault status signals from a sputtering system within a period of time; processing the plurality of fault status signals with a fault handling algorithm; and generating at least o

이 특허에 인용된 특허 (51)

  1. Eastburn Lindsey ; Mass Leon, Apparatus and method for controlling high throughput sputtering.
  2. Sadinsky Samuel (42-46 249th St. Little Neck NY 11363-1673), Apparatus and method for electronically controlled admittance matching network.
  3. Boling Norman L. (Santa Rosa CA), Apparatus for reducing the intensity and frequency of arcs which occur during a sputtering process.
  4. Sellers Jeff C. (Palmyra NY), Arc control and switching element protection for pulsed dc cathode sputtering power supply.
  5. Yoshizako Yuji,JPX ; Ito Tsuneo,JPX ; Nakamoto Akie,JPX, Automatic phase adjusting circuit for a plasma processing apparatus.
  6. Nerone Louis R., Ballast circuit for gas discharge lamp.
  7. Porter Thomas W. (Clearwater FL) Ross ; Jr. Craig G. (Largo FL), Computer-based metering arrangement including a circuit interrupter.
  8. Thomson William R., Control system and circuits for distributed electrical-power generating stations.
  9. Cousineau Kevin L. (Tehachapi CA), Control systems for controlling a wind turbine.
  10. Drummond Geoffrey N. ; Scholl Richard A., Enhanced reactive DC sputtering system.
  11. Drummond Geoffrey N. ; Scholl Richard A., Enhanced reactive DC sputtering system.
  12. Sellers Jeff C., Etch process employing asymmetric bipolar pulsed DC.
  13. Spiegel Ronald J. (Chapel Hill NC) Bose Bimal K. (Knoxville TN), Fuzzy logic integrated electrical control to improve variable speed wind turbine efficiency and performance.
  14. Harnett Sean, Fuzzy logic tuning of RF matching network.
  15. Hughes Frank Michael,GBX ; Ghazizadeh Mohammad Sadegh,IRX, Generator transfer function regulator.
  16. Da Ponte Manuel Dos Santos,ZAX ; Grzesiak Lech,PLX ; Koczara Wlodzimierz,PLX ; Pospiech Pawel,PLX ; Niedzialkowski Andrzej,PLX, Hybrid generator apparatus.
  17. Thomas C. Underwood ; William B. Hall ; Thomas C. Matty, Integrated control system and method for controlling mode, synchronization, power factor, and utility outage ride through for micropower generation systems.
  18. Thomas C. Underwood ; William B. Hall ; Thomas C. Matty, Integrated control system and method for controlling mode, synchronization, power factor, and utility outage ride-through for micropower generation systems.
  19. Underwood Thomas C. ; Hall William B. ; Matty Thomas C., Integrated control system and method for controlling mode, synchronization, power factor, and utility outage ride-through for micropower generation systems.
  20. Underwood Thomas C. ; Hall William B. ; Matty Thomas C., Integrated control system and method for controlling mode, synchronization, power factor, and utility outage ride-through for micropower generation systems.
  21. Sun Chuen-Tsai (Pao-Shan Shiang TWX) Jang Jyh-Shing (Framingham MA) Fu Chi-Yung (San Francisco CA), Intelligent system for automatic feature detection and selection or identification.
  22. Reyzelman, Leonid E.; Sortor, John E., Method and apparatus for VHF plasma processing with load mismatch reliability and stability.
  23. Friedlander Ariel ; Worden Bret Dwayne ; Smith Myron Lee ; Cooper Charles Earl ; Kumar Ajith Kuttannair, Method and apparatus for shoot-through detection and accommodation in an electric power system including a synchronous g.
  24. Sakaue Yoshitaka (Nara JPX) Ohno Eiji (Hirakata JPX) Ide Kazuhisa (Osaka JPX) Nagata Kenichi (Nishinomiya JPX) Yamada Noboru (Hirakata JPX), Method for fabricating optical information storage medium.
  25. Tretola Angelo R. (Berkeley Heights NJ), Method of controlling a plasma etching process by monitoring the impedance changes of the RF power.
  26. Poulsen ; Robert Gordon, Method of plasma etching.
  27. Farrington Ronald L. (Cedar Rapids IA) Porter Thomas W. (Clearwater FL), Microcomputer-controlled circuit breaker system.
  28. Cousineau Kevin L. (Tehachapi CA), Microcontroller based control system for use in a wind turbine.
  29. Farrington Ronald L. (Cedar Rapids IA), Microprocessor-controlled circuit breaker and system.
  30. Sebastien Raoux ; Mandar Mudholkar ; William N. Taylor ; Mark Fodor ; Judy Huang ; David Silvetti ; David Cheung ; Kevin Fairbairn, Mixed frequency CVD process.
  31. Schienbein, Lawrence A.; Hammerstrom, Donald J.; Droppo, Gerald W.; Harris, Brent Earle, Modular, integrated power conversion and energy management system.
  32. Nishizawa Junichi (Sendai JPX) Tamamushi Takashige (Sendai JPX) Miura Kimio (Izumi JPX) Mitsui Kiyoo (Sendai JPX) Mitamura Koichi (Sendai JPX), Optically controlled power converting apparatus.
  33. Drummond, Geoffrey; Scholl, Richard A., Periodically clearing thin film plasma processing system.
  34. Gagne Peter H. (Brookfield CT) Morrisroe Peter J. (New Fairfield CT), Plasma emission source.
  35. Nishimori Yasuhiro,JPX ; Taniguchi Michio,JPX ; Kondo Kazuki,JPX, Plasma monitoring apparatus.
  36. Imatake Mitsuko,JPX ; Sasaki Ichiro,JPX ; Otsubo Toru,JPX ; Tamura Hitoshi,JPX ; Kamimura Takashi,JPX, Plasma processing apparatus and processing method.
  37. Nagafuchi, Naoyuki; Iwai, Yasushi; Ikeda, Hiraku, Power plant operation control system and a power plant maintaining and managing method.
  38. Udren Eric A. (Monroeville PA), Power-line baseband communication system.
  39. Sellers Jeff C., Preferential sputtering of insulators from conductive targets.
  40. Sellers Jeff C. (Palmyra NY), Preferential sputtering of insulators from conductive targets.
  41. Bouyer Bernard (Grenoble FRX) Andries Bernard (Thones FRX) Ravel Guillaume (Annecy FRX) Peccoud Louise (Claix FRX), Process and apparatus for determining the impedance of the discharge in a plasma reactor system comprising a tuning box.
  42. Tobita Tomoyuki (Katsuta JPX) Yamamoto Yoshimi (Ibaraki-ken JPX) Fukunaga Masao (Tokyo JPX) Kobayahsi Teruo (Katsuta JPX) Nagasu Akira (Ibaraki-ken JPX), Process detection apparatus.
  43. Cheng-Hung Chang TW; Keh-Chyang Leou TW; Chaung Lin TW; Yi-Mei Yang TW; Chuen-Horng Tsai TW; I. G. Chen TW, Process for fabricating plasma with feedback control on plasma density.
  44. Jin-Yuan Chen ; John P. Holland ; Arthur H. Sato ; Valentin N. Todorow, Pulsed RF power delivery for plasma processing.
  45. Daniel J. Vona, Jr. ; Aaron T. Radomski ; Kevin P. Nasman ; William R. Pulhamus, Jr., Pulsing intelligent RF modulation controller.
  46. Wilbur Joseph, Ratiometric autotuning algorithm for RF plasma generator.
  47. Sellers, Jeff C., Sputtering apparatus using passive arc control system and method.
  48. Kenmotsu Akihiro (Fujisawa JPX) Kobayashi Shigeru (Setagaya JPX) Watanabe Kunihiko (Yokohama JPX) Matsuzaki Eiji (Yokohama JPX) Yoritomi Yoshifumi (Yokohama JPX) Koshita Toshiyuki (Yokohama JPX) Naka, Sputtering method and apparatus.
  49. Jahns Gary L., System for indirectly monitoring and controlling a process with particular application to plasma processes.
  50. Okano Manabu (Tokyo JPX), Topographically precise thin film coating system.
  51. Gyugyi Laszlo (Penn Hills Twp. ; Allegheny County PA) Schauder Colin D. (Murrysville Boro PA), Transmission line dynamic impedance compensation system.

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  1. Hoffa, Michael; Sanders, Nicholas A.; Shipulski, E. Michael, Automatically sensing consumable components in thermal processing systems.
  2. Hoffa, Michael; Shipulski, E. Michael, Configuring signal devices in thermal processing systems.
  3. Brandt, Aaron; Shipulski, E. Michael, Identifying components in a material processing system.
  4. Lindsay, Jon W.; Vandergon, Cedar J.; Chalmers, Eric J.; Hoffa, Michael; Shipulski, E. Michael, Identifying liquid jet cutting system components.
  5. Vandergon, Cedar J.; Lindsay, Jon W.; Voerding, Steve E.; Hansen, Brett A., Liquid pressurization pump and systems with data storage.
  6. Pohl, Thomas; Heller, Ulrich; Raschke, Holger; Gottschalk, Richard; Schaefer, Reinhard, Plasma and induction heating power supply systems and related methods.
  7. Brine, Erik; Roberts, Jesse A.; Mao, Junsong; Hoffa, Michael; Gould, Clayton; Twarog, Peter; Shipulski, E. Michael; Liebold, Stephen M.; Hansen, Brett Andrew, Plasma arc cutting system and persona selection process.
  8. Mao, Junsong; Kornprobst, Michael, Plasma torch with LCD display with settings adjustment and fault diagnosis.
  9. Mao, Junsong; Kornprobst, Michael F.; Hansen, Brett A.; Shipulski, E. Michael, Plasma torch with LCD display with settings adjustment and fault diagnosis.
  10. Pohl, Thomas; Heller, Ulrich, Systems for operating multiple plasma and/or induction heating systems and related methods.
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