Methods for forming a calibration standard and calibration standards for inspection systems
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G01N-021/88
출원번호
US-0185308
(2002-06-27)
발명자
/ 주소
Smith,Ian
Wolters,Christian
Guan,Yu
Brayton,Don
출원인 / 주소
KLA Tencor Technologies Corp.
대리인 / 주소
Daffer McDaniel, LLP
인용정보
피인용 횟수 :
12인용 특허 :
7
초록▼
Methods for forming calibration standards for an inspection system and calibration standards are provided. One method includes scanning a first and a second specimen with an optical system. Master standard particles having a lateral dimension traceable to a national or international authority or fir
Methods for forming calibration standards for an inspection system and calibration standards are provided. One method includes scanning a first and a second specimen with an optical system. Master standard particles having a lateral dimension traceable to a national or international authority or first principles measurements are deposited on the first specimen. Product standard particles are deposited on the second specimen. In addition, the method includes determining a lateral dimension of the product standard particles by comparing data generated by scanning the two specimens. One calibration standard includes particles having a lateral dimension of less than about 100 nm deposited on a specimen. A distribution of the lateral dimension has a full width at half maximum of less than about 3%. The uncertainty of the lateral dimension is less than about 2%. Therefore, the standard meets the requirements for the 130 nm technology generation of semiconductor devices.
대표청구항▼
What is claimed is: 1. A method for forming a calibration standard for an inspection system, comprising: scanning a first specimen with an optical system, wherein master standard particles having a traceable lateral dimension are deposited on the first specimen; scanning a second specimen with the
What is claimed is: 1. A method for forming a calibration standard for an inspection system, comprising: scanning a first specimen with an optical system, wherein master standard particles having a traceable lateral dimension are deposited on the first specimen; scanning a second specimen with the optical system, wherein product standard particles are deposited on the second specimen; and determining a lateral dimension of the product standard particles by comparing data generated by said scanning the first specimen to data generated by said scanning the second specimen. 2. The method of claim 1, wherein the lateral dimension of the master standard particles is traceable to a national or international authority. 3. The method of claim 1, wherein the lateral dimension of the master standard particles is traceable to first principles measurements. 4. The method of claim 1, wherein the lateral dimension of the product standard particles is less than about 100 nm. 5. The method of claim 1, wherein the master standard particles and the product standard particles comprise polystyrene latex spheres. 6. The method of claim 1, further comprising depositing the master standard particles on the first specimen without filtering the master standard particles. 7. The method of claim 1, further comprising filtering the product standard particles to reduce a lateral dimension distribution of the product standard particles and to select product standard particles having approximately a predetermined lateral dimension and depositing the product standard particles on the second specimen. 8. The method of claim 1, wherein an uncertainty of the lateral dimension of the product standard particles due to variations in parameters of a system used to deposit the product standard particles is substantially eliminated. 9. The method of claim 1, wherein an uncertainty of the lateral dimension of the product standard particles due to variations in particle charge uniformity is substantially eliminated. 10. The method of claim 1, wherein an uncertainty of the lateral dimension of the product standard particles due to differences between the system used to deposit the product standard particles and the inspection system is substantially eliminated. 11. The method of claim 1, wherein the optical system comprises a scanning scatterometry system. 12. The method of claim 1 wherein said scanning the first specimen and said scanning the second specimen comprise detecting light scattered from the master standard particles and the product standard particles, respectively, at a substantially constant scatter angle. 13. The method of claim 1, wherein an uncertainty of the lateral dimension of the product standard particles due to variations in a scatter angle of the optical system is substantially eliminated. 14. The method of claim 1, wherein the lateral dimension of the master standard particles is approximately equal to the lateral dimension of the product standard particles. 15. The method of claim 1, wherein the lateral dimension of the roaster standard particles is not equal to the lateral dimension of the product standard particles, and wherein said determining further comprises interpolation. 16. A method for certifying a calibration standard for an inspection system, comprising; calibrating an optical system with master standard particles deposited on a first specimen, wherein the master standard particles have a traceable lateral dimension; measuring a lateral dimension of product standard particles on a second specimen with the optical system; and certifying the product standard particles on the second specimen as a calibration standard for an inspection system if the lateral dimension of the product standard particles is substantially equal to a predetermined lateral dimension. 17. A calibration standard for an inspection system, comprising particles deposited on a specimen, wherein an uncertainty of a lateral dimension of the particles due to variations in parameters of a system used to deposit the particles on the specimen is substantially eliminated, and wherein the lateral dimension is certified by comparison to master standard particles having a traceable lateral dimension. 18. The standard of claim 17, wherein the lateral dimension of the particles is less than about 100 nm. 19. The standard of claim 17, wherein a distribution of the lateral dimension of the particles has a full width at half maximum of less than about 3%. 20. The standard of claim 17, wherein the uncertainty of the lateral dimension of the particles is less than about 2%. 21. The standard of claim 17, wherein the lateral dimension of the master standard particles is traceable to a national authority. 22. The standard of claim 17, wherein the lateral dimension of the master standard particles is traceable to first principles measurements. 23. The standard of claim 17, wherein the uncertainty of the lateral dimension of the particles due to differences between the system used to deposit the particles and the inspection system is substantially eliminated. 24. The standard of claim 17, wherein the uncertainty of the lateral dimension of the particles due to variations in a scatter angle of an optical system used to certify the calibration standard is substantially eliminated. 25. The standard of claim 17, wherein the lateral dimension of particles is certified timing an optical system having a configuration substantially equivalent to a configuration of the inspection system. 26. A method for forming a calibration standard for an inspection system, comprising: scanning a specimen with an optical system subsequent to depositing master standard particles having a traceable lateral dimension on the specimen; re-scanning the specimen with the optical system subsequent to depositing product standard particles on the specimen; and determining a lateral dimension of the product standard particles by comparing data generated by said scanning to data generated by said re-scanning.
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이 특허에 인용된 특허 (7)
Bates Eugene C. (Ft. Mill SC) Ferrara Michael B. (Charlotte NC), Calibration standard for calibrating a defect inspection system and a method of forming same.
Bindell Jeffrey Bruce ; Schrope Dennis Earl ; Stevie Fred Anthony ; Dare Richard J. ; Plew Larry E., Linewidth metrology of integrated circuit structures.
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