|국가/구분||United States(US) Patent 등록|
|미국특허분류(USC)||095/117; 095/052; 095/143; 095/237; 096/057; 096/074; 096/134; 096/135; 096/153; 055/385.2; 055/482.1; 055/485|
|발명자 / 주소|
|출원인 / 주소|
|대리인 / 주소||
|인용정보||피인용 횟수 : 1 인용 특허 : 27|
A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-me...
The invention claimed is: 1. A method for cleaning a substrate placed in a housing, which comprises the following steps: passing a gas supplied to the housing through an absorber and/or absorber for decreasing concentrations of non-methane hydrocarbons therein; passing the treated gas through a dust removing means to remove fine particles contained in the gas; and introducing the gas into the housing in which the substrate is placed. 2. The method of claim 1, wherein the absorber and/or absorber, and the dust removing means remove fine particles in t...