Method and materials for purifying hydride gases, inert gases, and non-reactive gases
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01D-053/02
C01F-007/02
C01F-007/00
출원번호
US-0260060
(2002-09-27)
발명자
/ 주소
Watanabe,Tadaharu
Fraenkel,Dan
출원인 / 주소
Matheson Tri Gas, Inc.
대리인 / 주소
Hogan &
인용정보
피인용 횟수 :
2인용 특허 :
19
초록▼
A process for removing trace amounts of moisture and/or one or more impurities from contaminated hydride, inert and non-reactive gases, thus decreasing the concentration of the impurities to parts-per-billion (ppb) or parts-per-trillion (ppt) levels. The gas purifier materials of this invention incl
A process for removing trace amounts of moisture and/or one or more impurities from contaminated hydride, inert and non-reactive gases, thus decreasing the concentration of the impurities to parts-per-billion (ppb) or parts-per-trillion (ppt) levels. The gas purifier materials of this invention include thermally activated aluminas, said aluminas including organic alumina materials, modified organic alumina materials, and modified inorganic aluminas. The thermally activated alumina materials of this invention are activated by heating the alumina material at a temperature between about 50째 C.-1000째 C. in an inert or non-inert atmosphere or in a vacuum and maintaining the activated material in the inert or non-inert atmosphere or in a vacuum atmosphere subsequent to said activation but prior to use.
대표청구항▼
We claim: 1. An activated gas purifier material capable of removing trace amounts of one or more impurities from a hydride, inert, or nonreactive gas at a temperature below 100째 C., said purifier comprising an alumina material selected from the group consisting of organic aluminas and modified orga
We claim: 1. An activated gas purifier material capable of removing trace amounts of one or more impurities from a hydride, inert, or nonreactive gas at a temperature below 100째 C., said purifier comprising an alumina material selected from the group consisting of organic aluminas and modified organic aluminas, said alumina material having been activated by heating said alumina material at a temperature greater than about 50째 C. in an inert or non-inert atmosphere or in a vacuum to form an activated alumina material and maintaining said activated alumina material in said inert or non-inert atmosphere or in said vacuum subsequent to said activation and prior to use, wherein said modified organic aluminas are prepared by treating said organic alumina material with a modifying agent prior to said activation, said modifying agent comprising an organic or inorganic compound of a metal selected from the group consisting of Na, K, Li, Rb, Cs, Mg, Ca, Sr, and Ba, wherein said impurities are selected from the group consisting of arsine, germane, phosphine, silane, hydrogen sulfide, siloxanes, phosphorus oxides, phosphorus oxyacids, carbon dioxide, water, and mixtures thereof. 2. The activated gas purifier material of claim 1, wherein said modifying agent is applied to said alumina material by incipient wetness impregnation. 3. The activated gas purifier material of claim 1, wherein said modifying agent is an oxide, hydroxide, bicarbonate, carbonate, nitrate, acetate, salt, or oxalate of Na, K, Li, Rb, Cs, Mg, Ca, Sr, or Ba. 4. The activated gas purifier material of claim 1, wherein said alumina material is heated at a temperature between about 200째 C. and 600째 C. 5. The activated gas purifier material of claim 1, wherein said contaminated inert or non-reactive gas contains at least one gas selected from the group consisting of nitrogen, helium, argon, hydrogen and a gaseous hydrocarbon. 6. The activated purifier material of claim 1, wherein said purifier is capable of reducing the concentration of said impurities down to parts-per-billion levels. 7. The activated purifier material of claim 1, wherein said purifier is capable of reducing the concentration of said impurities down to parts-per-trillion levels. 8. The activated purifier material of claim 1, wherein said purifier is capable of removing trace amounts of one or more impurities from a contaminated gas at a temperature between-85째 C. up to 100째 C. 9. An activated gas purifier material capable of removing trace amounts of one or more impurities from a contaminated gas at a temperature below 100째 C., said purifier comprising alumina material selected from the group consisting of organic aluminas and modified organic aluminas, said alumina material having been activated by heating said alumina material at a temperature greater than about 50째 C. in an inert or non-inert atmosphere or in a vacuum to form said activated alumina material and maintaining said inert or non-inert atmosphere or in said vacuum subsequent to said activation and prior to use, wherein said impurities are selected from the group consisting of arsine, germane, phosphine, silane, hydrogen sulfide, siloxanes, phosphorus oxides, phosphorus oxyacids, water, and mixtures thereof. 10. An activated gas purifier material capable of removing trace amounts of one or more impurities from a contaminated gas, said purifier comprising an alumina material selected from the group consisting of organic aluminas and modified organic aluminas, said alumina material having been activated by heating said alumina material at a temperature greater than 50째 C. in an inert or non-reactive atmosphere or in a vacuum to form an activated alumina material and maintaining said activated alumina material in said inert or non-reactive atmosphere or in said vacuum subsequent to said activation and prior to use, wherein said modified organic aluminas are prepared by treating said organic alumina material with a modifying agent prior to said activation, said modifying agent comprising an organic or inorganic compound of a metal selected from the group consisting of Na, K, Li, Rb, Cs, Mg, Ca, Sr, and Ba, wherein said impurities are selected from the group consisting of arsine, germane, phosphine, silane, hydrogen sulfide, siloxanes, phosphorus oxides, phosphorus oxyacids, water, and mixtures thereof. 11. An activated gas purifier material capable of removing trace amounts of one or more impurities from a contaminated gas, said purifier comprising alumina material selected from the group consisting of organic aluminas and modified organic aluminas, said alumina material having been activated by heating said alumina material at a temperature greater than about 50째 C. in an inert or non-inert atmosphere or in a vacuum to form an activated alumina material and maintaining said activated alumina material in said inert or non-inert atmosphere or in said vacuum subsequent to said activation and prior to use. 12. The activated gas purifier material of claim 11, wherein said purifier material is capable of removing said trace amounts of one or more impurities from said contaminated gas at a temperature below 100째 C. 13. A method of removing trace amounts of one or more impurities present in a contaminated hydride, inert, or non-reactive gas, said method comprising flowing said contaminated gas through a thermally activated alumina-based gas purifier, said alumina material selected from the group consisting of organic aluminas, modified organic aluminas, and modified inorganic aluminas and having been activated by heating said alumina material at a temperature greater than about 50째 C. in an inert or non-inert atmosphere or in a vacuum to form an activated alumina material and maintaining said activated alumina material in said inert or non-inert atmosphere or in said vacuum subsequent to said activation and prior to use, wherein said modified organic aluminas and modified inorganic aluminas are prepared by treating said organic alumina or inorganic alumina material with a modifying agent prior to said activation, said modifying agent comprising an organic or inorganic compound of a metal selected from the group consisting of Na, K, Li, Rb, Cs, Mg, Ca, Sr, and Ba, wherein said impurities are selected from the group consisting of arsine, germane, phosphine, silane, hydrogen sulfide, siloxanes, phosphorus oxides, phosphorus oxyacids, water, and mixtures thereof and wherein the activated alumina material is at least partially produced by decomposing an alkyl-aluminum or alkoxy-aluminum compound or mixtures thereof to form pseudoboehmite and subjecting the pseudoboehmite to a calcination process. 14. A method of removing trace amounts of one or more impurities from a contaminated hydride, inert, or non-reactive gas, wherein said impurities are selected from the group consisting of amine, germane, phosphine, silane, hydrogen sulfide, siloxanes, phosphorus oxides, phosphorus oxyacids, carbon dioxide, water, and mixtures thereof, said method comprising: (a) providing an activated gamma alumina material selected from the group consisting of organic aluminas and modified organic aluminas, and modified inorganic aluminas, said material comprising an alumina material that was activated by heating to a temperature greater than about 50째 C. in an inert or non-reactive atmosphere or in a vacuum and maintaining said activated alumina material in said inert or non-reactive atmosphere or in said vacuum prior to contact with said contaminated gas; and (b) flowing said contaminated gas through said activated alumina material at a temperature below 100째 C., wherein after the flowing is completed the impurities are removed from the contaminated gas to a level below about 10 parts per billion; wherein the activated alumina material is at least partially produced by decomposing an alkyl-aluminum or alkoxy-aluminum compound or mixtures thereof to form pseudoboehmite and subjecting the pseudoboehmite to a calcination process. 15. The material of claim 9, wherein the alumina material comprises a gamma alumina. 16. The material of claim 11, wherein the alumina material comprises a gamma alumina. 17. The material of claim 1, wherein the activated alumina material is at least partially produced by decomposing an alkyl-aluminum or alkoxy-aluminum compound or mixtures thereof to form pseudoboehmite and subjecting the pseudoboehmite to a calcination process. 18. The material of claim 9, wherein the activated alumina material is at least partially produced by decomposing an alkyl-aluminum or alkoxy-aluminum compound or mixtures thereof to form pseudoboehmite and subjecting the pseudoboehmite to a calcination process. 19. The material of claim 10, wherein the activated alumina material is at least partially produced by decomposing an alkyl-aluminum or alkoxy-aluminum compound or mixtures thereof to form pseudoboehmite and subjecting the pseudoboehmite to a calcination process. 20. The material of claim 11, wherein the activated alumina material is at least partially produced by decomposing an alkyl-aluminum or alkoxy-aluminum compound or mixtures thereof to form pseudoboehmite and subjecting the pseudoboehmite to a calcination process.
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