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Semiconductor manufacturing method and semiconductor manufacturing apparatus

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01R-031/26
출원번호 US-0696702 (2003-10-30)
우선권정보 JP-2000-052519(2000-02-28); JP-2000-108563(2000-04-10)
발명자 / 주소
  • Hasegawa,Hiroyuki
  • Yamaoka,Tomonori
  • Ishihara,Yoshio
  • Masusaki,Hiroshi
출원인 / 주소
  • Taiyo Nippon Sanso Corporation
대리인 / 주소
    Pillsbury Winthrop Shaw Pittman LLP
인용정보 피인용 횟수 : 14  인용 특허 : 18

초록

A semiconductor manufacturing method whereby reactive gas processing such as selective epitaxial growth can be carried out with high precision by correctly adjusting conditions during processing is performed by a semiconductor manufacturing apparatus which can restrict increases in the moisture cont

대표청구항

What is claimed is: 1. A semiconductor manufacturing method which performs reactive gas processing, wherein, when a substrate carrying system inserts a substrate from an airtight space in the substrate carrying system into a reaction chamber, and when the substrate is ejected from the reaction cham

이 특허에 인용된 특허 (18)

  1. Kashiwagi Akihide,JPX ; Kataoka Toyotaka,JPX ; Suzuki Toshihiko,JPX, Apparatus for forming silicon oxide film and method of forming silicon oxide film.
  2. McAndrew James ; Wang Hwa-Chi ; Jurcik ; Jr. Benjamin J., Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement s.
  3. McAndrew James ; Wang Hwa-Chi ; Jurcik ; Jr. Benjamin J., Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use.
  4. Butterbaugh Jeffery W. ; Gray David C., Cleaning method.
  5. Ohmi Tadahiro (Sendai JPX) Sugiyama Kazuhiko (Sendai JPX) Nakahara Fumio (Sendai JPX) Umeda Masaru (Tokyo JPX), Cylinder cabinet piping system.
  6. Ohmi Tadahiro (Sendai JPX) Miki Masahiro (Osaka JPX) Kikuyama Hirohisa (Nara JPX) Maeno Matagoro (Izumi JPX), Dry etching apparatus with diluted anhydrous hydrogen fluoride gas generator.
  7. Boschung Marcel (Schmitten CHX), Early ice-warning device.
  8. Pillion John E., Method and apparatus for measuring moisture content in a gas.
  9. Lowry Robert K. (Melbourne Beach FL) Miller Larry A. (Palm Bay FL), Method and means for measuring moisture content of hermetic semiconductor devices.
  10. Tapp Frederick (Hillsborough NC) Berger Henry (Durham NC), Method of performing an instantaneous moisture concentration measurement and for determining the drydown characteristics.
  11. Walker Charles W. E. (591 W. 57th Ave. #301 Vancouver ; British Columbia CAX), Microwave moisture measurement of moving particulate layer after thickness leveling.
  12. Bright Nick ; Mooring Ben, Modular architecture for semiconductor wafer fabrication equipment.
  13. Lattery Jerome E., Moisture sensing electronic irrigation control.
  14. Hockersmith Dan T. (Garland TX) Gilbert Joe W. (Leonard TX), Plasma etch movable substrate.
  15. Ohmi Tadahiro (Sendai JPX) Nakahara Yoshiyuki (Osaka JPX) Sakanaka Takashi (Tsurugashima JPX) Ohta Eiji (Amagasaki JPX) Mizokami Satoshi (Chiba JPX), Process for forming passivated film.
  16. Ishihara Yoshio,JPX ; Toda Masayuki,JPX ; Ohmi Tadahiro,JPX, Process for laser detection of gas and contaminants in a wafer transport gas tunnel.
  17. Komino Mitsuaki (Tokyo JPX), Treatment apparatus control method.
  18. Ishihara Yoshio,JPX ; Toda Masayuki,JPX ; Ohmi Tadahiro,JPX, Wafer and transport system.

이 특허를 인용한 특허 (14)

  1. Akiyama, Osamu; Akimoto, Masashi; Moriya, Tsuyoshi; Yamawaku, Jun, Absorption spectrometric apparatus for semiconductor production process.
  2. DiPerna, Paul M, Flow regulating stopcocks and related methods.
  3. DiPerna, Paul M.; Brown, David; Rosinko, Mike; Kincade, Dan; Michaud, Michael; Nadworny, John; Kruse, Geoffrey A.; Ulrich, Thomas R., Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
  4. DiPerna, Paul M.; Brown, David; Rosinko, Mike; Kincade, Dan; Michaud, Michael; Nadworny, John; Kruse, Geoffrey A.; Ulrich, Thomas R., Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
  5. Kruse, Geoffrey A., Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
  6. Michaud, Michael; Kruse, Geoffrey A., Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
  7. Michaud, Michael; Kruse, Geoffrey A., Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
  8. Verhoef, Erik T.; DiPerna, Paul M.; Rosinko, Mike; Williamson, Mark; Kruse, Geoffrey A.; Ulrich, Thomas R.; Lamb, Phil; Saint, Sean; Michaud, Michael; Trevaskis, William, Infusion pump system with disposable cartridge having pressure venting and pressure feedback.
  9. Biese, Gernot; Clement, Ulrich, Method of processing semiconductor wafers.
  10. DiPerna, Paul M., Slideable flow metering devices and related methods.
  11. Brown, David, Solute concentration measurement device and related methods.
  12. Rosinko, Michael J.; Kruse, Geoffrey A.; Harris, Paul, System and method for detecting occlusions in an infusion pump.
  13. Metzmaker, Thomas; Saint, Sean; Michaud, Michael; Rosinko, Michael J.; Swanson, Vance, Systems including vial adapter for fluid transfer.
  14. DiPerna, Paul M., Two chamber pumps and related methods.
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