초록

The invention provides niobium-titanium films, coatings (e. g., low-emissivity coatings) comprising one or more niobium-titanium films, and substrates bearings such coatings. Methods of depositing niobium-titanium films are also provided.

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What is claimed is: 1. A substrate having a first index of refraction bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly: a) a first film layer comprising a transparent dielectric material; b) a second film layer comprising an infrared-reflective material; c)

What is claimed is: 1. A substrate having a first index of refraction bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly: a) a first film layer comprising a transparent dielectric material; b) a second film layer comprising an infrared-reflective material; c) a third, protective film layer comprising niobium and titanium wherein the protective film layer is formed directly upon the second film layer; and d) a fourth film layer comprising a transparent dielectric material, wherein the low-emissivity coating includes a transparent base layer positioned between the substrate and the first film layer, the transparent base layer comprising silicon dioxide having a thickness of less than 100 angstroms formed directly on the substrate and having a second index of refraction that is substantially equal to the first index of refraction of the substrate. 2. The substrate of claim 1 wherein the protective film layer contains a greater percentage of titanium than niobium, such that the protective film layer imparts abrasion resistance in the low-emissivity coating. 3. The substrate of claim 1 wherein the protective film layer contains a greater percentage of niobium than titanium, such that the protective film layer imparts in the low-emissivity coating resistance to color shifting during exposure to elevated temperatures on the order of about 700째C. 4. The substrate of claim 1 wherein the infrared-reflective material of the second film layer is silver. 5. The substrate of claim 1 wherein the protective film layer has a thickness of between about 10 angstroms and about 30 angstroms. 6. The substrate of claim 1 wherein the first film layer comprises zinc oxide. 7. The substrate of claim 6 wherein the second film layer is formed directly upon the first film layer and the infrared-reflective material of the second film layer is silver. 8. The substrate of claim 1 wherein the fourth film layer comprises zinc oxide. 9. The substrate of claim 1 further comprising a titanium nitride layer further from the substrate than the fourth film layer. 10. The substrate of claim 1 further comprising a chemically-durable film further from the substrate than the fourth film layer, the chemically-durable film comprising silicon nitride. 11. The substrate of claim 1 further comprising a titanium nitride layer and a chemically-durable film, both being further from the substrate than the fourth film layer, wherein the chemically-durable film comprises silicon nitride. 12. The substrate of claim 1 further comprising: a) a fifth film layer comprising an infrared-reflective material; and b) a sixth film layer comprising a transparent dielectric material. 13. The substrate of claim 12 further comprising a protective film layer positioned between the fifth and sixth film layers, the protective film layer comprising niobium and titanium. 14. The substrate of claim 12 further comprising a titanium nitride layer further from the substrate than the sixth film layer. 15. The substrate of claim 12 further comprising a chemically-durable film further from the substrate than the sixth film layer, the chemically-durable film comprising silicon nitride. 16. The substrate of claim 12 further comprising a titanium nitride layer and a chemically-durable film, both being further from the substrate than the sixth film layer, wherein the chemically-durable film comprises silicon nitride. 17. A substrate bearing a low-emissivity coating that includes one or more infrared-reflective films, the low-emissivity coating including a transparent base layer comprising silicon dioxide having a thickness of less than 100 angstroms formed directly upon the substrate and having an index of refraction that is substantially equal to the index of refraction of the substrate, and a protective niobium-titanium layer that is formed directly upon an infrared-reflective film of the coating. 18. The substrate of claim 17 wherein the protective niobium-titanium layer contains a greater percentage of titanium than niobium, such that the protective niobium-titanium layer imparts abrasion resistance in the low-emissivity coating. 19. The substrate of claim 17 wherein the protective niobium-titanium layer contains a greater percentage of niobium than titanium, such that the protective niobium-titanium layer imparts in the low-emissivity coating resistance to color shifting during exposure to elevated temperatures on the order of about 700째C. 20. The substrate of claim 17 wherein said protected infrared-reflective film comprises silver. 21. The substrate of claim 17 wherein a transparent dielectric film is formed between the substrate and said protected infrared-reflective film. 22. The substrate of claim 21 wherein a transparent dielectric film is formed over the protective niobium-titanium layer. 23. The substrate of claim 17 wherein the low-emissivity coating includes a contiguous sequence of films, said contiguous sequence comprising, moving outwardly, a zinc oxide film, a silver or silver-containing film, and the protective niobium-titanium layer. 24. The substrate of claim 17 wherein the low-emissivity coating includes a sequence of films, said sequence comprising, moving outwardly, the protective niobium-titanium layer, a zinc oxide film, a silicon nitride film, a zinc oxide film, an infrared-reflective film, and a transparent dielectric film. 25. The substrate of claim 17 wherein the low-emissivity coating includes a sequence of films, said sequence comprising, moving outwardly, the protective niobium-titanium layer, a zinc oxide film, a silicon nitride film, a zinc oxide film, a silicon nitride film, a zinc oxide film, an infrared-reflective film, and a transparent dielectric film. 26. A transparent glass substrate having a first index of refraction, the substrate bearing a low-emissivity coating comprising, moving outwardly: a) a transparent base layer comprising silicon dioxide having a thickness of less than 100 angstroms and having a second index of refraction that is substantially equal to the first index of refraction of the substrate; b) a second film layer comprising a transparent dielectric material; c) a third film layer comprising an infrared-reflective material; d) a fourth, protective film layer comprising niobium and titanium; and e) a fifth film layer comprising a transparent dielectric material. 27. The substrate of claim 26 wherein the protective film layer contains a greater percentage of titanium than niobium, such that the protective film layer imparts abrasion resistance in the low-emissivity coating. 28. The substrate of claim 26 wherein the protective film layer contains a greater percentage of niobium than titanium, such that the protective film layer imparts in the low-emissivity coating resistance to color shifting during exposure to elevated temperatures on the order of about 700째C. 29. The substrate of claim 26 wherein the transparent base layer is formed directly upon the substrate. 30. The substrate of claim 26 wherein the transparent base layer has a thickness of between about 50 angstroms and about 90 angstroms. 31. The substrate of claim 30 wherein said first index of refraction of the substrate is between about 1.4 and about 1.5. 32. The substrate of claim 26 wherein said second index of refraction of the amorphous film of the transparent base layer is less than about 1.7. 33. The substrate of claim 26 wherein the infrared-reflective material of the third film layer is silver. 34. The substrate of claim 26 wherein the protective film layer has a thickness of between about 10 angstroms and about 30 angstroms. 35. The substrate of claim 26 further comprising a titanium nitride layer further from the substrate than the fifth film layer. 36. The substrate of claim 26 further comprising a chemically-durable film layer further from the substrate than the fifth film layer, the chemically-durable film layer comprising silicon nitride. 37. The substrate of claim 26 further comprising a titanium nitride layer and a chemically-durable film, both being further from the substrate than the fifth film layer, wherein the chemically-durable film layer comprises silicon nitride. 38. A substrate bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly: a) a first film layer comprising a transparent dielectric material; b) a second film layer comprising an infrared-reflective material; d) an intermediate film region comprising at least three film layers; f) a sixth film layer comprising an infrared-reflective material; g) a seventh film layer comprising a transparent dielectric material; wherein the low-emissivity coating includes a transparent base layer positioned between the substrate and the first film layer, the transparent base layer comprising silicon dioxide having a thickness of less than 100 angstroms formed directly on the substrate and having an index of refraction that is substantially equal to the index of refraction of the substrate, and a protective niobium-titanium layer that is contiguous either to said second film layer or to said sixth film layer. 39. The substrate of claim 38 wherein the protective niobium-titanium layer contains a greater percentage of titanium than niobium, such that the protective niobium-titanium layer imparts abrasion resistance in the low-emissivity coating. 40. The substrate of claim 38 wherein the protective niobium-titanium layer contains a greater percentage of niobium than titanium, such that the protective niobium-titanium layer imparts in the low-emissivity coating resistance to color shifting during exposure to elevated temperatures on the order of about 700째C. 41. The substrate of claim 38 wherein the protective niobium-titanium layer is formed directly over either said second film layer or said sixth film layer. 42. The substrate of claim 38 wherein the low-emissivity coating includes two protective niobium-titanium layers formed respectively directly over said second film layer and said sixth film layer. 43. The substrate of claim 38 wherein the protective niobium-titanium layer has a thickness of between about 10 angstroms and about 30 angstroms. 44. The substrate of claim 38 wherein each of said three film layers in the intermediate film region has a physical thickness of no more than about 250Å. 45. The substrate of claim 38 wherein each of said three film layers in the intermediate film region is formed of a different material than each film layer contiguous thereto. 46. The substrate of claim 38 wherein the intermediate film region comprises three film layers respectively comprising zinc oxide, silicon nitride, and zinc oxide. 47. The substrate of claim 46 wherein said silicon nitride film layer is positioned between said zinc oxide film layers. 48. The substrate of claim 38 wherein the intermediate film region comprises at least five film layers. 49. The substrate of claim 48 wherein the intermediate film region comprises alternating film layers of zinc oxide and silicon nitride. 50. The substrate of claim 49 wherein the intermediate film region comprises three zinc oxide film layers and two silicon nitride film layers. 51. The substrate of claim 38 further comprising a titanium nitride layer further from the substrate than the seventh film layer. 52. The substrate of claim 38 further comprising a titanium nitride layer and a chemically-durable film, both being further from the substrate than the seventh film layer, wherein the chemically-durable film layer comprises silicon nitride. 53. A substrate having a first index of refraction bearing a low-emissivity coating, the coating comprising, moving outwardly: a) a first film layer comprising an oxide of zinc and tin; b) a second film layer comprising an oxide of zinc alone; c) a third film layer comprising an infrared-reflective material; d) a fourth film layer comprising niobium and titanium formed directly upon the third film layer; e) a fifth film layer comprising an oxide of zinc alone; f) a sixth film layer comprising an oxide of zinc and tin; g) a seventh film layer comprising an oxide of zinc alone; h) an eighth film layer comprising an infrared-reflective material; i) a ninth film layer comprising niobium and titanium formed directly upon the eighth film layer; j) a tenth film layer comprising an oxide of zinc alone; k) an eleventh film layer comprising an oxide of zinc and tin; and l) a twelfth film layer comprising a transparent dielectric materials wherein the low-emissivity coating includes a transparent base layer positioned between the substrate and the first film layer, the transparent base layer comprising silicon dioxide having a thickness of less than 100 angstroms and having a second index of refraction that is substantially equal to the first index of refraction of the substrate. 54. A substrate having a first index of reflection bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly from the substrate: a) a first film layer comprising an oxide of titanium; b) a second film layer comprising an oxide of zinc alone; c) a third film layer comprising an infrared-reflective material; d) a fourth film layer comprising niobium and titanium formed directly upon the third film layer; e) a fifth film layer comprising silicon nitride; f) a sixth film layer comprising an oxide of zinc alone; g) a seventh film layer comprising an infrared-reflective material; h) an eighth film layer comprising niobium and titanium formed directly upon the seventh film layer; and i) a ninth film layer comprising a transparent dielectric materials, wherein the low-emissivity coating includes a transparent base layer positioned between the substrate and the first film layer, the transparent base layer comprising silicon dioxide having a thickness of less than 100 angstroms and having a second index of refraction that is substantially equal to the first index of refraction of the substrate. 55. A substrate having a first index of refraction bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly: a) a first film layer comprising a transparent dielectric material; b) a second film layer comprising an infrared-reflective material; d) an intermediate film region comprising a plurality of intermediate films each having a physical thickness of less than 200 Angstroms, wherein at least one of the intermediate films is silicone nitride or another film that is amorphous or substantially amorphous; f) a sixth film layer comprising an infrared-reflective material; g) a seventh film layer comprising a transparent dielectric material; wherein the low-emissivity coating includes a transparent base layer positioned between the substrate and the first film layer, the transparent base layer comprising silicon dioxide having a thickness of less than 100 Angstroms formed directly on the substrate and having a second index of refraction that is substantially equal to the first index of refraction of the substrate, and a protective niobium-titanium layer that is contiguous either to said second film layer or to said sixth film layer. 56. The glass sheet substrate of claim 55 wherein the intermediate film region includes five separate layers. 57. The substrate of claim 55 wherein the composition and thickness of each infrared-reflective film, each transparent dielectric film, and each protective film is selected so that the coating achieves an illuminant C transmissivity of at least about 78%. 58. The substrate of claim 56 wherein the intermediate film region has a combined thickness of about 400 to about 1200 Angstroms. 59. The substrate of claim 55 wherein the substrate is glass. 60. The substrate of claim 58 wherein the substrate is glass. 61. The substrate of claim 57 wherein the substrate is glass. 62. A substrate having a first index of refraction bearing a low-emissivity coating, the low-emissivity coating comprising, moving outwardly: a) a first film layer comprising a transparent dielectric material; b) a second film layer comprising an infrared-reflective material; d) an intermediate film region comprising at least three film layers; f) a sixth film layer comprising an infrared-reflective material; g) a seventh film layer comprising a transparent dielectric material; h) an outermost film comprising silicone nitride SI3 N4. wherein the low-emissivity coating includes a transparent base layer positioned between the substrate and the first film layer, the transparent base layer comprising silicon dioxide having a thickness of less than 100 Angstroms formed directly on the substrate and having a second index of refraction that is substantially equal to the first index of refraction of the substrate, and a protective niobium-titanium layer that is contiguous either to said second film layer or to said sixth film layer. 63. The substrate of claim 62 wherein the intermediate film region has a combined thickness of about 400 to about 1200 Angstroms. 64. The substrate of claim 62 wherein the substrate is glass. 65. The substrate of claim 63 wherein the substrate is glass. 66. The substrate of claim 62 wherein the composition and thickness of each infrared-reflection film, each transparent dielectric film, and each protective film is selected so that the coating achieves illuminant C transmissivity of at least about 78%. 67. The substrate of claim 66 wherein the substrate is glass.