초록 ▼

A process for preparing a multimetal oxide material which contains the elements Mo, V and Te and/or Sb and at least one of the elements Nb, Ti, W, Ta and Ce and if desired promoters and has a specific X-ray diffraction pattern, in which process the last process step comprises washing with acidic liq

A process for preparing a multimetal oxide material which contains the elements Mo, V and Te and/or Sb and at least one of the elements Nb, Ti, W, Ta and Ce and if desired promoters and has a specific X-ray diffraction pattern, in which process the last process step comprises washing with acidic liquids. In addition, a multimetal oxide material obtainable in such a way is used as a catalyst for heterogeneously catalyzed gas-phase partial oxidations and/or ammoxidation of hydrocarbons.

대표청구항 ▼

We claim: 1. A process for preparing a multimetal oxide material M of the stoichiometry I: description="In-line Formulae" end="lead"Mo1 VaM1bM2cM3d On (I),description="In-line Formulae" end="tail" wherein M1 is at least one of the elements selected from the group consisting of Te and Sb; M2 is

We claim: 1. A process for preparing a multimetal oxide material M of the stoichiometry I: description="In-line Formulae" end="lead"Mo1 VaM1bM2cM3d On (I),description="In-line Formulae" end="tail" wherein M1 is at least one of the elements selected from the group consisting of Te and Sb; M2 is at least one of the elements selected from the group consisting of Nb, Ti, W, Ta and Ce; M3 is at least one of the elements selected from the group consisting of Pb, Ni, Co, Bi, Pd, Ag, Pt, Cu, Au, Ga, Zn, Sn, In, Re, Ir, Sm, Sc, Y, Pr, Nd and Tb; a is from 0.01 to 1, b is from>0 to 1, c is from>0 to 1, d is from>0 to 0.5 and n is a number which is determined by the valency and frequency of the elements other than oxygen in (I), whose X-ray diffraction pattern has reflections h, i and k, whose peaks are at the diffraction angles (2θ) 22.2짹0.5째(h), 27.3짹0. 5째(i) and 28.2짹0.5째(k), the reflection h being the one with the strongest intensity within the X-ray diffraction pattern and having a full width at half height (FWHH) of not more than 0.5째, the intensity Pi of the reflection i and the intensity Pk of the reflection k satisfying the relationship 0. 65≦R≦0.85, wherein R is the intensity ratio defined by the formula description="In-line Formulae" end="lead"R=P i/(Pi+Pk)description="In-line Formulae" end="tail" and the FWHH of the reflection i and that of the reflection k being each짹1째, but has no reflection having the peak position 2θ=50. 0짹0.3째; the process comprising washing the multimetal oxide material M with a liquid selected from the group consisting of organic acids, inorganic acids, solutions of organic acids, solutions of inorganic acids and mixtures thereof, wherein the multimetal oxide material M is prepared with the proviso that, in the course of the preparation of the multimetal oxide material M, no precursor multimetal oxide material of the multimetal oxide material M is washed with a liquid selected from the group consisting of organic acids, inorganic acids, solutions of organic acids, solutions of inorganic acids, solutions of inorganic acids and mixtures thereof. 2. The process as claimed in claim 1, wherein the liquid with which washing is effected is an aqueous nitric acid solution. 3. The process as claimed in claim 1, wherein the X-ray diffraction pattern of the multimetal oxide material M to be washed contains, in addition to the reflections h, i and k, also further reflections whose peaks are at the following diffraction angles 2θ: 9.0짹0.4째(1) 6.7짹0.4째(o) and 7.9짹0.4째(p). 4. The process as claimed in claim 3, wherein the X-ray diffraction pattern of the multimetal oxide material M to be washed contains, in addition to the reflections h, i, k, l, o and p, also further reflections whose peaks are at the following diffraction angles 2θ: 45.2짹0.4째(q), 29.2짹0.4째(m) and 35.4≅0.4째(n). 5. The process as claimed in claim 4, wherein the X-ray diffraction pattern of the multimetal oxide material M to be washed has the reflections h, k, l, m, n, o, p and q on the same intensity scale with the following intensities: h=100, i=5to 95, l=1 to 30, m=1 to 40, n=1 to 40, o=1 to 30, p=1 to 30and q=5 to 60. 6. The process as claimed in any of claims 1 to 5, wherein the stoichiometric coefficients a, b, c and d of the multimetal oxide material M to be washed are simultaneously in the following ranges: a=from 0.05 to 6; b=from 0.01 to 1; c=from 0.01 to 1; and d=from 0.00005 to 0.5. 7. The process as claimed in claim 1, wherein M1=Te. 8. The process as claimed in claim 1, wherein at least 50 mol % of the total amount of M2 is Nb. 9. The process as claimed in claim 1, wherein M3 is at least one element from the group consisting of Ni, Co, Pd and Bi. 10. The process as claimed in claim 1, wherein the preparation of the multimetal oxide material M to be washed is effected by a hydrothermal method. 11. A process for the heterogeneously catalyzed gas-phase partial oxidation and/or animoxidation of a saturated and/or unsaturated hydrocarbon, wherein the catalytically active material used is the direct product of a process as claimed in claim 1.