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Methods of forming a solder structure may include providing a wafer including a plurality of die therein, and a solder wettable pad may be formed on one of the die adjacent an edge of the die. The solder wettable pad may have a length parallel to the edge of the die and a width perpendicular to the

Methods of forming a solder structure may include providing a wafer including a plurality of die therein, and a solder wettable pad may be formed on one of the die adjacent an edge of the die. The solder wettable pad may have a length parallel to the edge of the die and a width perpendicular to the edge of the die wherein the length parallel to the edge of the die is greater than the width perpendicular to the edge of the die. A solder bump may be plated on the solder wettable pad, and the die may be separated from the wafer along the edge of the die after plating the solder bump on the solder wettable pad. Moreover, the solder bump may be reflowed on the solder wettable pad so that the solder structure extends laterally from the solder wettable pad beyond the edge of the die after separating the die from the wafer. Related structures are also discussed.

대표청구항 ▼

That which is claimed is: 1. A method of forming a solder structure, the method comprising: providing a wafer including a plurality of die therein; forming a solder wettable pad on at least one of the die adjacent an edge of the die, the solder wettable pad having a length parallel to the edge of

That which is claimed is: 1. A method of forming a solder structure, the method comprising: providing a wafer including a plurality of die therein; forming a solder wettable pad on at least one of the die adjacent an edge of the die, the solder wettable pad having a length parallel to the edge of the die and a width perpendicular to the edge of the die wherein the length parallel to the edge of the die is greater than the width perpendicular to the edge of the die; forming a solder bump on the solder wettable pad; after forming the solder bump on the solder wettable pad, separating the die from the wafer along the edge of the die; and after separating the die from the wafer, reflowing the solder bump on the solder wettable pad so that the solder bump extends laterally from the solder wettable pad toward the edge of the die. 2. A method according to claim 1 wherein the solder structure extends laterally from the solder wettable pad beyond the edge of the die. 3. A method according to claim 1 wherein the solder structure extends laterally from the solder wettable pad to the edge of the die. 4. A method according to claim 1 wherein forming the solder bump comprises at least one of plating solder, evaporating solder, jetting solder, and/or applying solder paste. 5. A method according to claim 1 wherein before reflowing the solder bump, the solder bump is set back from the edge of the die by at least about 20 microns, and wherein after reflowing the solder bump, the solder bump extends at least to within about 10 microns of the edge of the die. 6. A method according to claim 1 further comprising: after reflowing the solder bump, bonding the solder bump with a substrate adjacent the edge of the die. 7. A method according to claim 6 wherein the die and the substrate are non-parallel. 8. A method according to claim 6 wherein the die and the substrate are substantially orthogonal. 9. A method according to claim 1 further comprising: forming at least one solder wettable reservoir connected to the solder wettable pad, the solder wettable reservoir having a width at a connection with the solder wettable pad that is less than the width of the solder wettable pad; wherein forming the solder bump further comprises forming solder on the at least one solder wettable reservoir. 10. A method according to claim 9 wherein reflowing the solder bump includes causing solder to flow from the solder wettable reservoir to the solder wettable pad. 11. A method according to claim 9 wherein the width of the solder wettable pad is at least 10% greater that a greatest width of the solder wettable reservoir. 12. A method according to claim 9 wherein an angle of a junction between the solder wettable pad and the solder wettable reservoir comprises an acute angle. 13. A method according to claim 9 wherein the solder wettable reservoir includes a flared narrowing therein. 14. A method according to claim 9 wherein the solder wettable reservoir includes a two branches that join at a junction with the junction being between the two branches and the connection with the solder wettable pad, wherein each branch narrows by at least 20% at the junction therebetween. 15. A method according to claim 9 wherein the solder wettable reservoir includes a bight therein wherein the bight includes an opening at least 2.5 times a radius of curvature of the bight. 16. A method according to claim 1 further comprising: forming first and second solder wettable reservoirs connected to opposing ends of the solder wettable pad. 17. A method according to claim 16 wherein the connections of the solder wettable reservoirs to the solder wettable pad are separated by the length of the solder wettable pad parallel to the edge of the substrate. 18. A method according to claim 16 wherein portions of the first and second solder wettable reservoirs connected to the solder wettable pad have respective widths that are less than the width of the solder wettable pad. 19. A method according to claim 1 wherein the die comprises a microelectronic die. 20. A method according to claim 1 wherein the solder wettable pad and the solder bump comprise different materials. 21. A method according to claim 1 wherein the solder wettable pad has an oval shape. 22. A method according to claim 1 wherein the solder wettable pad has a flat side adjacent the edge of the die. 23. A method of forming a solder structure, the method comprising: forming a solder wettable pad on a substrate adjacent an edge of the substrate, the solder wettable pad having a length parallel to the edge of the substrate and a width perpendicular to the edge of the substrate wherein the length parallel to the edge of the substrate is greater than the width perpendicular to the edge of the substrate; and forming a solder bump on the solder wettable pad wherein the solder bump extends laterally from the solder wettable pad at least to within about 10 microns of the edge of the substrate. 24. A method according to claim 23 wherein the solder bump extends laterally from the solder wettable pad to the edge of the substrate. 25. A method according to claim 23 wherein the solder bump extends laterally from the solder wettable pad beyond the edge of the substrate. 26. A method according to claim 23 further comprising: forming at least one solder wettable reservoir connected to the solder wettable pad, the solder wettable reservoir having a width at a connection with the solder wettable pad that is less than the width of the solder wettable pad. 27. A method according to claim 23 further comprising: forming first and second solder wettable reservoirs connected to opposing ends of the solder wettable pad. 28. A method according to claim 27 wherein the connections of the solder wettable reservoirs to the solder wettable pad are separated by the length of the solder wettable pad parallel to the edge of the substrate. 29. A method according to claim 27 wherein portions of the first and second solder wettable reservoirs connected to the solder wettable pad have respective widths that are less than the width of the solder wettable pad. 30. A method according to claim 23 further comprising: bonding the solder bump to a second substrate adjacent the edge of the first electronic substrate, wherein the first and second substrates are not parallel. 31. A method according to claim 30 wherein the first and second substrates are substantially orthogonal with respect to each other. 32. A method according to claim 23 wherein the substrate comprises a microelectronic die. 33. A method according to claim 23 wherein the solder wettable pad and the solder bump comprise different materials. 34. A method according to claim 23 wherein the solder wettable pad is set back from the edge of the substrate by at least about 20 microns. 35. A method of forming a solder structure, the method comprising: forming a solder wettable pad on a substrate adjacent an edge of the substrate, wherein the solder wettable pad has a pad surface opposite the substrate and pad sidewalls between the pad surface and the substrate; and forming a solder bump on the solder wettable pad wherein the solder bump extends on portions of the pad sidewalls adjacent the edge of the substrate and wherein portions of the pad sidewalls opposite the edge of the substrate are free of the solder bump. 36. A method according to claim 35 wherein portions of the solder bump extend laterally to the edge of the substrate. 37. A method according to claim 36 wherein portions of the solder bump extend laterally beyond the edge of the substrate. 38. A method according to claim 35 wherein portions of the solder bump extend laterally at least to within about 10 microns of the edge of the substrate. 39. A method according to claim 35 further comprising: forming a solder non-wettable material on portions of the pad sidewalls opposite the edge of the substrate. 40. A method according to claim 39 wherein the solder non-wettable material comprises an oxide. 41. A method of forming a solder structure, the method comprising: providing a wafer including a plurality of die therein; forming a solder wettable pad on at least one of the die adjacent an edge of the die, wherein the solder wettable pad has a pad surface opposite the substrate and pad sidewalls between the pad surface and the substrate; forming a solder bump on the solder wettable pad; after forming the solder bump on the solder wettable pad, separating the die from the wafer along the edge of the die; and after separating the die from the wafer, reflowing the solder bump on the solder wettable pad so that the solder bump extends on portions of the pad sidewalls adjacent the edge of the die and so that portions of the pad sidewalls opposite the edge of the die are free of the solder bump. 42. A method according to claim 41 wherein the solder bump is maintained within the edge of the die before reflowing the solder bump and wherein portions of the solder bump extend laterally beyond the edge of the substrate after reflowing the solder bump. 43. A method according to claim 41 wherein the solder bump is maintained within the edge of the die before reflowing the solder bump and wherein portions of the solder bump extend laterally to the edge of the substrate after reflowing the solder bump. 44. A method according to claim 41 wherein before reflowing the solder bump, the solder bump is set back from the edge of the die by at least about 20 microns, and wherein after reflowing the solder bump, the solder bump extends at least to within about 10 microns of the edge of the die. 45. A method according to claim 41 wherein the solder bump is maintained within the edge of the die before reflowing the solder bump and wherein portions of the solder bump extend laterally to the edge of the substrate after reflowing the solder bump. 46. A method according to claim 41 further comprising: before reflowing the solder bump, forming a solder non-wettable material on portions of the pad sidewalls opposite the edge of the substrate. 47. A method according to claim 46 wherein the solder non-wettable material comprises an oxide. 48. A method of forming A solder structure, the method comprising: providing a wafer including a plurality of die therein; forming a solder wettable pad on at least one of the die adjacent an edge of the die, the solder wettable pad having a length parallel to the edge of the die and a width perpendicular to the edge of the die wherein the length parallel to the edge of the die is greater than the width perpendicular to the edge of the die; plating a solder structure on the solder wettable pad; after plating the solder structure on the solder wettable pad, separating the die from the wafer along the edge of the die; and after separating the die from the wafer, reflowing the solder structure on the solder wettable pad so that the solder structure extends laterally from the solder wettable pad beyond the edge of the die. 49. A method according to claim 48 further comprising: after reflowing the solder structure, bonding the solder structure with a substrate adjacent the edge of the die.