Microelectromechanical safing and arming apparatus
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
F42C-015/24
F42C-015/00
출원번호
US-0641980
(2003-08-14)
발명자
/ 주소
Koehler,David R.
Hoke,Darren A.
Weichman,Louis S.
Vernon,George E.
Shul,Randy J.
Beggans,Michael H.
출원인 / 주소
Sandia Corporation
인용정보
피인용 횟수 :
16인용 특허 :
18
초록▼
A two-stage acceleration sensing apparatus is disclosed which has applications for use in a fuze assembly for a projected munition. The apparatus, which can be formed by bulk micromachining or LIGA, can sense acceleration components along two orthogonal directions to enable movement of a shuttle fro
A two-stage acceleration sensing apparatus is disclosed which has applications for use in a fuze assembly for a projected munition. The apparatus, which can be formed by bulk micromachining or LIGA, can sense acceleration components along two orthogonal directions to enable movement of a shuttle from an "as-fabricated" position to a final position and locking of the shuttle in the final position. With the shuttle moved to the final position, the apparatus can perform one or more functions including completing an explosive train or an electrical switch closure, or allowing a light beam to be transmitted through the device.
대표청구항▼
What is claimed is: 1. An apparatus for sensing acceleration along two orthogonal axes, comprising: (a) a substrate; (b) a shuttle formed within a well in the substrate, with the shuttle being suspended by a plurality of springs for movement in the plane of the substrate; (c) a first latch located
What is claimed is: 1. An apparatus for sensing acceleration along two orthogonal axes, comprising: (a) a substrate; (b) a shuttle formed within a well in the substrate, with the shuttle being suspended by a plurality of springs for movement in the plane of the substrate; (c) a first latch located on one side of the shuttle and attached to the substrate for locking the shuttle in a first position until a first acceleration component substantially normal to the plane of the substrate is sensed by the first latch whereupon the first latch is disengaged by the first acceleration component and moves in a direction substantially normal to the plane of the substrate to enable the shuttle to move in an orthogonal direction substantially in-plane with the substrate in response to a second acceleration component which is substantially in-plane with the substrate; and (d) a second latch located on another side of the shuttle for locking the shuttle after the in-plane movement of the shuttle to a second position located away from the first position. 2. The apparatus of claim 1 wherein the substrate comprises silicon. 3. The apparatus of claim 1 wherein the first latch comprises a cantilevered beam having a thickness less than the thickness of the shuttle. 4. The apparatus of claim 3 wherein the first latch further comprises a clasp located at a free end of the cantilevered beam. 5. The apparatus of claim 4 wherein the shuttle comprises at least one tab for engaging the clasp to lock the shuttle in the first position. 6. The apparatus of claim 1 wherein the second latch comprises at least one cantilevered beam having a catch formed at a free end thereof for engaging a tang projecting from the shuttle to hold the shuttle in the second position. 7. The apparatus of claim 6 further comprising a stop to prevent movement of the shuttle beyond the second position. 8. The apparatus of claim 6 wherein both the shuttle and the second latch are electrically conductive and provide a completed current path for an electrical current when the shuttle is located in the second position. 9. The apparatus of claim 1 wherein the shuttle includes a window formed therethrough. 10. The apparatus of claim 9 further comprising a subbase attached to an underside of the substrate and a lid attached to a top side of the substrate, with the subbase and lid each having an opening therethrough which, with each opening being aligned with the window in the shuttle when the shuttle is in the second position. 11. The apparatus of claim 10 wherein the shuttle allows the transmission of a light beam through the shuttle and subbase when the shuttle is in the second position and blocks the transmission of the light beam through the shuttle and subbase when the shuttle is in the first position. 12. The apparatus of claim 9 further comprising a primary explosive located within the window in the shuttle. 13. The apparatus of claim 12 further comprising a secondary explosive located in an opening through a subbase attached to the substrate. 14. The apparatus of claim 13 wherein the primary explosive upon ignition thereof is blocked from igniting the secondary explosive when the shuttle is in the first position, and is enabled to ignite the secondary explosive when the shuttle is in the second position. 15. The apparatus of claim 14 further including a lid attached to a top side of the substrate with the lid including an initiator or detonator for igniting the primary explosive located within the window of the shuttle. 16. The apparatus of claim 10 wherein the subbase is attached to the substrate by fusion bonding. 17. The apparatus of claim 10 wherein the subbase and the lid each comprise silicon. 18. An apparatus for sensing acceleration along two orthogonal axes, comprising: (a) a substrate; (b) a shuttle formed within a well in the substrate, with the shuttle being suspended by a plurality of springs for movement in the plane of the substrate, and with the shuttle having a window formed therethrough; (c) a first latch located on one side of the shuttle and attached to the substrate for locking the shuttle in a first position, wherein the window in the shuttle is misaligned with an opening through a subbase below the substrate until a first acceleration component substantially normal to the substrate acts to disengage the first latch and to move the first latch in a direction substantially normal to the plane of the substrate, thereby releasing the shuttle to move in response to a second acceleration component which is substantially in-plane with the substrate; and (d) a second latch located on another side of the shuttle for locking the shuttle after an in-plane movement of the shuttle to a second position located away from the first position, with the window in the shuttle in the second position being aligned with the opening through the substrate. 19. The apparatus of claim 18 wherein the first latch comprises a cantilevered beam with a clasp located at a free end thereof for engaging at least one tab located on the shuttle. 20. The apparatus of claim 18 wherein the second latch comprises at least one catch for engaging a tang projecting from the shuttle to lock the shuttle in the second position. 21. The apparatus of claim 20 further comprising a stop to prevent an in-plane movement of the shuttle beyond the second position. 22. The apparatus of claim 18 wherein both the shuttle and the second latch are electrically conductive and provide a completed current path for an electrical current when the shuttle is located in the second position. 23. The apparatus of claim 18 further comprising a primary explosive located in the window in the shuttle. 24. The apparatus of claim 23 further comprising a secondary explosive located in the opening through the subbase. 25. The apparatus of claim 24 wherein the primary explosive upon ignition thereof is blocked from igniting the secondary explosive when the shuttle is in the first position, and is enabled to ignite the secondary explosive when the shuttle is in the second position. 26. The apparatus of claim 23 further comprising a lid formed over the substrate and the shuttle, with the lid being attached to the substrate. 27. The apparatus of claim 26 wherein the lid includes an initiator or detonator for igniting the primary explosive located within the window of the shuttle. 28. The apparatus of claim 18 wherein the substrate comprises silicon. 29. A two-stage acceleration sensing apparatus, comprising: (a) a substrate; (b) a shuttle formed, at least in part, from the substrate and suspended on a plurality of springs for movement, with the shuttle being initially located at a first position; (c) a first latch formed from the substrate to lock the shuttle at the first position until the first latch is disengaged in response to a first acceleration component which moves the first latch in a direction substantially normal to the plane of the substrate, thereby releasing the shuttle for movement; and (d) a second latch formed, at least in part, from the substrate to capture the shuttle upon moving from the first position to a second position in response to a second acceleration component which is directed substantially orthogonally to the first acceleration component. 30. The apparatus of claim 29 wherein the second acceleration component is directed substantially parallel to the plane of the substrate. 31. The apparatus of claim 29 wherein the substrate comprises a semiconductor substrate. 32. The apparatus of claim 29 wherein both the shuttle and second latch are electrically conductive and provide a completed current path for an electrical current when the shuttle is located in the second position. 33. The apparatus of claim 29 wherein further including a subbase attached to the substrate with a window through the shuttle being aligned with an opening through the subbase when the shuttle is in the second position. 34. The apparatus of claim 33 wherein the window holds a primary explosive, and the opening in the subbase holds a secondary explosive. 35. The apparatus of claim 34 further including a lid attached to the substrate opposite the subbase, with the lid holding an initiator or detonator for igniting the primary explosive when the shuttle is in the second position. 36. A microelectromechanical safing and arming apparatus, comprising: (a) a subbase having an opening therethrough for holding a first explosive; (b) a shuttle suspended from a plurality of springs above the subbase, with the shuttle holding a second explosive initially misaligned from the first explosive; (c) a first latch for locking the shuttle in a first position wherein the second explosive is misaligned with respect to the first explosive, with the first latch being disengageable in response to a first acceleration component directed substantially normal to the subbase to allow movement of the shuttle to a second position wherein the first and second explosives are aligned in response to a second acceleration component directed substantially in-plane with the subbase; and (d) a second latch for locking the shuttle in the second position. 37. The apparatus of claim 36 further comprising a lid formed over the shuttle and subbase, with the lid including an initiator or detonator for igniting the second explosive when the shuttle is in the second position.
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