IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0305827
(2002-11-26)
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발명자
/ 주소 |
- Sivaramakrishnan,Visweswaren
- White,John
- Ishikawa,Koichi
- Miyamoto,Hideaki
- Kawano,Takeshi
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
3 인용 특허 :
13 |
초록
▼
The disclosure relates to a vaporizer valve which accepts a carrier gas and a pressurized liquid and forms a mixture of the carrier gas and vaporized liquid. An internal cavity receives the carrier gas through a carrier aperture and the liquid through a liquid aperture, and the mixed gas and vapor a
The disclosure relates to a vaporizer valve which accepts a carrier gas and a pressurized liquid and forms a mixture of the carrier gas and vaporized liquid. An internal cavity receives the carrier gas through a carrier aperture and the liquid through a liquid aperture, and the mixed gas and vapor are exhausted out of the cavity via a third aperture. A moveable diaphragm disposed adjacent to the liquid aperture forms a vaporization region having a pressure gradient. The liquid passing through this pressure gradient vaporizes due to expansion. By controlling the diaphragm position with a feedback control circuit responsive to a liquid flow rate monitor, the liquid flow rate may be controlled independently of the carrier gas flow rate.
대표청구항
▼
The invention claimed is: 1. A vaporizer for vaporizing a liquid and mixing the vaporized liquid with a carrier gas, said vaporizer comprising: a valve body defining a control valve cavity having a first aperture and a third aperture; a valve seat in which a second aperture is formed through which
The invention claimed is: 1. A vaporizer for vaporizing a liquid and mixing the vaporized liquid with a carrier gas, said vaporizer comprising: a valve body defining a control valve cavity having a first aperture and a third aperture; a valve seat in which a second aperture is formed through which the liquid flows at a flow rate, said second aperture having a central axis; a gas inlet port for receiving said carrier gas, said gas inlet port connected to said first aperture through a first fluid channel; a liquid inlet port for receiving the liquid, said liquid inlet port connected to said second aperture through a second fluid channel; a valve mechanism including a valve element disposed adjacent to and opposite said valve seat and forming a valve region circumscribing said second aperture, said valve region having a larger width than said second aperture as measured in a radial direction from said central axis, said valve element being continuously adjustable by said valve mechanism over a continuous range of settings between and including a fully closed position and a fully open position so as to variably control the flow rate of the liquid out of said second aperture into said valve cavity; and an outlet port connected to said third aperture through a third fluid channel, wherein during operation the liquid supplied through said liquid inlet port is injected through said second aperture, flows radially away from the central axis of the second aperture, vaporizes in said valve cavity, mixes with said carrier gas, and is carried out of said vaporizer through said outlet port. 2. The vaporizer of claim 1 wherein in its fully closed position, the valve element abuts said valve seat and during operation prevents flow of liquid through said second aperture. 3. The vaporizer of claim 1 wherein said valve seat has a seat face that is opposed to said valve element and in which said second aperture is formed. 4. The vaporizer of claim 3 wherein said seat face is planar. 5. The vaporizer of claim 4 wherein said seat face is circular and has a diameter of about 0.5 cm. 6. The vaporizer of claim 3 wherein said valve element has a valve face that is opposed to said valve seat. 7. The vaporizer of claim 6 wherein said valve face is planar. 8. The vaporizer of claim 1 wherein said valve seat has a seat face that is planar and opposed to said valve element and in which said second aperture is formed, said valve element has a valve face that is planar and opposed to said valve seat, and said seat face and valve face are parallel to each other. 9. The vaporizer of claim 1 wherein said valve seat has a seat face that is circular with a first diameter and said valve element has a valve face that is circular with a second diameter, and wherein the second diameter is larger than the first diameter. 10. The vaporizer of claim 9 wherein the second diameter is about 1.5 times the first diameter. 11. The vaporizer of claim 1 wherein said valve element is in an open position when said valve mechanism is in an inactivated state. 12. The vaporizer of claim 11 wherein said valve element is in its fully open position when said valve mechanism is in an inactivated state. 13. The vaporizer of claim 1 wherein said valve element comprises a diaphragm movable relative to said valve seat to control the flow rate, and wherein said valve mechanism further comprises an actuator which during operation moves said diaphragm toward and away from said valve seat in response to a control signal. 14. The vaporizer of claim 13 further comprising: a liquid flow meter connected to measure the flow rate of the liquid out of said second aperture; a feedback control system generating said control signal in response to the flow rate measured by said liquid flow meter. 15. The vaporizer of claim 14 wherein said actuator comprises a piezoelectric member responsive to said control signal. 16. The vaporizer of claim 1 further comprising a heater to heat at least a portion of said valve body near to said control valve cavity so as to inhibit said liquid from condensing after it has vaporized. 17. The vaporizer of claim 13 further comprising a heater to heat at least a portion of said valve body near to said control valve cavity so as to inhibit said liquid from condensing after it has vaporized. 18. The vaporizer of claim 1 wherein said valve region has an outer perimeter circumscribing said second aperture and wherein during use the liquid flowing out of the second aperture exhibits a drop in pressure from said second aperture to said outer perimeter in all radial directions about said central axis. 19. The vaporizer of claim 1 wherein the valve element is controllably movable relative to the valve seat and within a range of between 0 to 30 μm from the valve seat. 20. A chemical vapor deposition system using a liquid reactant and a carrier gas, comprising: a chemical vapor deposition chamber having a gas inlet port, and a liquid reactant vaporizer having an outlet port connected to said chamber inlet port, said vaporizer comprising: a valve body defining a control valve cavity having a first aperture, a second aperture through which the liquid flows at a flow rate, and a third aperture, said second aperture having a central axis; a valve seat in which said second aperture is formed; a gas inlet port for receiving said carrier gas, said gas inlet port connected to said first aperture through a first fluid channel; a liquid inlet port for receiving the liquid reactant, said liquid inlet port connected to said second aperture through a second fluid channel; a valve mechanism including a valve element disposed adjacent to said valve seat and forming a valve region circumscribing said second aperture, said valve region having a larger width than said second aperture as measured in a radial direction from said central axis, said valve seat being continuously adjustable by said valve mechanism over a continuous range of settings between and including a fully closed position and a fully open position so as to variably control the flow rate of the liquid reactant out of said second aperture into said valve cavity; and an outlet port connected to said third aperture through a third fluid channel, wherein during operation the liquid supplied through said liquid inlet port is injected through said second aperture, flows radially away from the central axis of the second aperture, vaporizes in said valve cavity, mixes with said carrier gas, and is carried out of said vaporizer through said outlet port. 21. The chemical vapor deposition system of claim 20 wherein said valve element comprises a diaphragm movable relative to said valve seat to control the flow rate, and wherein said valve mechanism further comprises an actuator which during operation moves said diaphragm toward and away from said valve seat in response to a control signal. 22. The chemical vapor deposition system of claim 21 further comprising a liquid flow meter coupling said liquid reactant to said liquid inlet port and for measuring a mass flow rate of said liquid reactant and generating an electrical mass flow signal indicating said mass flow rate. 23. The chemical vapor deposition system of claim 22 further comprising a controller which during operation compares said mass flow signal to a set point, and signals said actuator to move said diaphragm toward said second aperture when said mass flow signal indicates a flow rate above said set point, and signals said actuator to move said diaphragm away from said second aperture when said mass flow signal indicates a flow rate below said set point. 24. A method of vaporizing a liquid and mixing the vaporized liquid with a carrier gas, comprising the steps of: providing a valve body defining a control valve cavity having first and third apertures; providing a valve seat in which a second aperture is formed said second aperture having a central axis; providing a valve mechanism including a valve element disposed adjacent to and opposite said valve seat to form a valve region circumscribing said second aperture, said valve region having a larger width than said second aperture as measured in a radial direction from said central axis; supplying a carrier gas through a first fluid channel to the first aperture; supplying the liquid through a second channel to said second aperture; injecting the liquid through the second aperture into the valve region at an adjustable flow rate; controlling the adjustable flow rate of the liquid out of said second aperture and into the valve region in a continuously variable manner by adjusting a separation between the valve seat and the valve element; vaporizing the liquid that is supplied through the second aperture to the valve region; mixing the vaporized liquid from said valve region with the carrier gas to form a mixture; and passing the mixture out through said third aperture for delivery through a third channel to an outlet port. 25. A vaporizer for vaporizing a liquid and mixing the vaporized liquid with a carrier gas, the vaporizer comprising: a valve body having a first aperture and a third aperture formed therein, the valve body having a valve seat with a second aperture formed therein; a gas inlet port formed in the valve body and connected to the first aperture through a first fluid channel; a liquid inlet port formed in the valve body and connected to the second aperture through a second fluid channel; a piezo valve comprising a piezoelectric member and a diaphragm disposed adjacent to and opposite the second aperture and the valve seat to define a volume therebetween, the position of the proportional control valve being continuously adjustable over a continuous range of settings from a fully closed position to a fully open position; and an outlet port of the valve body connected to the third aperture through a third fluid channel; wherein the position of the proportional control valve can be adjusted such that the pressure gradient in the vaporization region is sufficient to cause the vaporization by expansion of liquid entering the volume from the second aperture; wherein the diameter of the diaphragm is larger than the diameter of the valve seat. 26. A chemical vapor deposition system using a liquid reactant and a carrier gas, comprising: a chemical vapor deposition chamber having a chamber inlet port; a liquid reactant vaporizer having an outlet port connected to the chamber inlet port, the vaporizer comprising: a valve body having a first, and third apertures formed therein, the valve body further having a valve seat incorporated as a part thereof, the valve seat having a second aperture formed therein; a gas inlet port for receiving the carrier gas, the gas inlet port connected to the first aperture through a first fluid channel; a liquid inlet port formed in the valve body and connected to the second aperture through a second fluid channel; a valve mechanism including a piezo valve disposed adjacent to the valve seat to define a volume therebetween, the piezo valve comprising a piezoelectric member and a diaphragm, the position of the piezo valve being continuously adjustable by the valve mechanism over a continuous range of settings from a fully closed position to a fully open position; and wherein the outlet port is connected to the third aperture through a third fluid channel; wherein the diameter of the diaphragm is larger than the diameter of the valve seat.
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