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Apparatus and method for delivery of dilute active fluid, e. g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at

Apparatus and method for delivery of dilute active fluid, e. g., to a downstream active fluid-consuming process unit of a semiconductor manufacturing plant. The delivery system includes an active fluid source, a diluent fluid source, a fluid flow metering device for dispensing of the active fluid at a predetermined flow rate, a mixer arranged to mix active gas from the active fluid source that is dispensed at such predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture, and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture.

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What is claimed is: 1. A system for delivery of dilute gases, comprising: an active gas source; a diluent gas source; a gas flow metering device for dispensing of the active gas at a predetermined flow rate; a mixing device arranged to mix active gas from the active gas source that is dispensed at

What is claimed is: 1. A system for delivery of dilute gases, comprising: an active gas source; a diluent gas source; a gas flow metering device for dispensing of the active gas at a predetermined flow rate; a mixing device arranged to mix active gas from the active gas source that is dispensed at said predetermined flow rate by the gas flow metering device, with diluent gas to form a diluted active gas mixture; and a monitor arranged to measure concentration of active gas in the diluted active gas mixture, and responsively adjust the gas flow metering device, to control the dispensing rate of the active gas, and maintain a predetermined concentration of active gas in the diluted active gas mixture, wherein the diluent gas is flowed to said mixing device without passage through a mass flow controller or flow restriction element. 2. The system of claim 1, wherein the gas flow metering device comprises a mass flow controller. 3. The system of claim 2, further comprising a gas flow line interconnecting the active gas source and the mixing device, and wherein the mass flow controller is disposed in the gas flow line. 4. The system of claim 1, wherein the monitor comprises an in-line gas analyzer. 5. The system of claim 1, wherein the monitor comprises a gas analyzer in a bypass gas flow loop. 6. The system of claim 1, wherein the gas flow metering device comprises a device selected from she group consisting of mass flow controllers, micro-valves actuatable for dispensing low flow rates of active gas from the active gas source, and flowmeters coupled with flow control valves. 7. The system of claim 1, wherein the active gas source comprises active gas in neat condition. 8. The system of claim 1, wherein the active gas source comprises a gas storage and dispensing vessel holding the active gas. 9. The system of claim 8, wherein the gas storage and dispensing vessel contains a physical adsorbent medium sorptively retaining active gas, and from which active gas is desorbed for dispensing of active gas from the vessel. 10. The system of claim 8, wherein the gas storage and dispensing vessel contains an interiorly disposed regulator for dispensing of active gas from the vessel at a pressure determined by set point of the regulator. 11. The system of claim 1, wherein the mixing device comprises a device selected from the group consisting of venturis, static mixers, pumps, compressors, rotary mixers, ejectors, eductors, and opposed jet-equipped mixing chambers. 12. The system of claim 1, wherein the mixing device comprises a venturi. 13. The system of claim 1, wherein the monitor comprises a gas monitoring device selected from the group consisting of spectrometric, chromatographic, colorimetric, surface acoustic wave (SAW), photonic and flame ionizer gas monitors. 14. The system of claim 1, wherein the monitor comprises a Fourier Transform-Infrared (FT-IR) gas analyzer. 15. The system of claim 1, wherein the monitor comprises an IR photometer. 16. The system of claim 1, wherein the monitor comprises a Fourier Transform-Infrared (FT-IR) gas analyzer and an IR photometer. 17. The system of claim 1, wherein the monitor comprises multiple gas monitoring devices. 18. The system of claim 17, wherein said multiple gas monitoring devices comprise gas monitoring devices having a differing gas concentration sensing modality. 19. The system of claim 17, wherein said multiple gas monitoring devices comprise gas monitoring devices having a same gas concentration sensing modality. 20. The system of claim 1, further comprising a dilute active gas mixture discharge line connected with a dilute active gas mixture-using facility. 21. The system of claim 20, wherein the dilute active gas mixture-using facility comprises a semiconductor manufacturing plant. 22. The system of claim 21, wherein the semiconductor manufacturing plant comprises an ion implantation unit. 23. The system of claim 1, coupled in diluted active gas mixture-feeding relationship to a semiconductor manufacturing facility. 24. The system of claim 23, wherein the semiconductor manufacturing facility comprises an ion implantation process unit. 25. The system of claim 24, wherein the active gas comprises a source material for forming a dopant species. 26. The system of claim 25, wherein the source material comprises a hydride selected from the group consisting of arsine, phosphine and germane. 27. The system of claim 1, wherein the diluent gas source comprises a diluent gas selected from the group consisting of nitrogen, argon, helium, air, krypton, xenon, xenon halides, hydrogen, oxygen, ammonia, and gaseous organometallic compounds. 28. The system of claim 1, wherein the active gas source comprises an active gas selected from the group consisting of hydrides, acid gases and boranes. 29. The system of claim 28, wherein the active gas is selected from the group consisting of arsine, phosphine, germane, SiHCl3, SiF4, SiH2Cl2, and mixtures of two or more of the foregoing. 30. The system of claim 1, wherein the diluent gas source comprises a diluent gas selected from the group consisting of H2, N2, O2, argon, helium, and mixtures of two or more of the foregoing. 31. The system of claim 1, wherein the active gas source comprises an active gas including carbon tetrafluoride. 32. The system of claim 1, wherein the gas flow metering device comprises a micro-valve. 33. The system of claim 1, wherein the mixing device comprises a venturi and the gas flow metering device comprises a valve and a restricted flow orifice between the valve and the venturi. 34. A system for delivery of dilute gases, comprising: an active gas source; a diluent gas source; a gas flow metering device for dispensing of the active gas at a predetermined flow rate; a mixing device arranged to mix active gas from the active gas source that is dispensed at said predetermined flow rate by the gas flow metering device, with diluent gas to form a diluted active gas mixture without subsequent further dilution of the diluted active gas mixture by additional diluent gas; and a monitor arranged to measure concentration of active gas in the diluted active gas mixture, and responsively adjust the gas flow metering device, to control the dispensing rate of the active gas, and maintain a predetermined concentration of active gas in the diluted active gas mixture, wherein the gas flow metering device comprises a mass flow controller, and the monitor being arranged to produce an output control signal correlative to sensed active gas concentration in the diluted active gas mixture, with the control signal being transmitted to the mass flow controller to modulate the set point thereof to achieve a predetermined constant active gas concentration in the diluted active gas mixture, and wherein diluent gas is flowed to said mixing device without passage through a mass flow controller or flow restriction element. 35. A system for delivery of dilute fluid, comprising: an active fluid source; a diluent fluid source; a fluid flow metering device for dispensing of the active gas at a predetermined flow rate; a mixing device arranged to mix active fluid from the active fluid source that is dispensed at said predetermined flow rate by the fluid flow metering device, with diluent fluid to form a diluted active fluid mixture; and a monitor arranged to measure concentration of active fluid in the diluted active fluid mixture, and responsively adjust the fluid flow metering device, to control the dispensing rate of the active fluid, and maintain a predetermined concentration of active fluid in the diluted active fluid mixture, wherein the diluent fluid is flowed to said mixing device without passage through a mass flow controller or flow restriction element. 36. The system of claim 35, wherein the active fluid source comprises liquid as the active fluid. 37. The system of claim 36, wherein the active fluid source comprises a semiconductor process gas as the active fluid. 38. A method for delivery of dilute gas, comprising: providing an active gas source and a diluent gas source; controllable dispensing active gas from the active gas source at a predetermined flow rate; mixing active gas from the active gas source that is dispensed at said predetermined flow rate, with diluent gas from the diluent gas source, in a mixing device, to form a diluted active gas mixture; and monitoring concentration of active gas in the diluted active gas mixture, and responsively adjusting the dispensing rate of the active gas, to maintain a predetermined concentration of active gas in the diluted active gas mixture, wherein the diluent gas is flowed to said mixing device without passage through a mass flow controller or flow restriction element. 39. The method of claim 38, wherein the step of controllably dispensing active gas comprises modulating flow of the active gas with a mass flow controller. 40. The method of claim 38, wherein the monitoring step comprises flowing the dilute active gas mixture through an in-line gas analyzer. 41. The method of claim 38, wherein the step of controllably dispensing active gas comprises modulating flow of the active gas with a mass flow controller, and the monitoring step comprises flowing the dilute active gas mixture through an in-line gas analyzer to produce an output control signal correlative to sensed active gas concentration in the diluted active gas mixture, and transmitting the control signal to the mass flow controller to modulate set point thereof to achieve a predetermined constant active gas concentration in the diluted active gas mixture. 42. The method of claim 38, wherein the step of controllably dispensing active gas comprises modulating flow of the active gas with a device selected from the group consisting of mass flow controllers, micro-valves actuatable for dispensing low flow rates of active gas from the active gas source, and flowmeters coupled with flow control valves. 43. The method of claim 38, wherein the active gas source comprises active gas in neat condition. 44. The method of claim 38, wherein the active gas source comprises a gas storage and dispensing vessel holding the active gas. 45. The method of claim 44, wherein the gas storage and dispensing vessel contains a physical adsorbent medium sorptively retaining active gas, and from which active gas is desorbed for dispensing of active gas from the vessel. 46. The method of claim 44, wherein the gas storage and dispensing vessel contains an interiorly disposed regulator for dispensing of active gas from the vessel at a pressure determined by set point of the regulator. 47. The method of claim 38, wherein the mixing step comprises mixing active gas from the active gas source and diluent gas from the diluent gas source, using a mixing device selected from the group consisting of venturis, static mixers, pumps, compressors, rotary mixers, ejectors, eductors, and opposed jet-equipped mixing chambers. 48. The method of claim 38, wherein the mixing step comprises mixing active gas from the active gas source and diluent gas from the diluent gas source, using a venturi receiving the active gas and the diluent gas. 49. The method of claim 38, wherein the monitoring step utilizes a gas monitoring device selected from the group consisting of spectrometer, chromatographic, colorimetric, surface acoustic wave (SAW), photonic and flame ionizer gas monitors. 50. The method of claim 38, wherein the monitoring step utilizes a Fourier Transform-Infrared (FT-IR) gas analyzer. 51. The method of claim 38, wherein the monitoring step utilizes an IR photometer. 52. The method of claim 38, wherein the monitoring step utilizes a Fourier Transform-Infrared (FT-IR) gas analyzer and an IR photometer. 53. The method of claim 38, wherein the monitoring step utilizes multiple gas monitoring devices. 54. The method of claim 53, wherein said multiple gas monitoring devices comprise gas monitoring devices having a differing gas concentration sensing modality. 55. The method of claim 53, wherein said multiple gas monitoring devices comprise gas monitoring devices having a same gas concentration sensing modality. 56. The method of claim 38, further comprising flowing the dilute active gas mixture to a dilute active gas mixture-using facility. 57. The method of claim 56, wherein the dilute active gas mixture-using facility comprises a semiconductor manufacturing plant. 58. The method of claim 57, wherein the semiconductor manufacturing plant comprises an ion implantation unit. 59. The method of claim 38, comprising flowing diluted active gas mixture to a semiconductor manufacturing facility. 60. The method of claim 59, wherein the semiconductor manufacturing facility comprises an ion implantation process unit. 61. The method of claim 60, wherein the active gas comprises a source material for forming a dopant species. 62. The method of claim 61, wherein the source material comprises a hydride selected from the group consisting of arsine, phosphine and germane. 63. The method of claim 38, wherein the diluent gas source comprises a diluent gas selected from the group consisting of nitrogen, argon, helium, air, krypton, xenon, xenon halides, hydrogen, oxygen, ammonia, and gaseous organometallic compounds. 64. The method of claim 38, wherein the active gas source comprises an active gas selected from the group consisting of hydrides, acid gases and boranes. 65. The method of claim 38, wherein the active gas is selected from the group consisting of arsine, phosphine, germane, SiHCl3, SiF4, SiH2Cl2, and mixtures of two or more of the foregoing. 66. The method of claim 38, wherein the diluent gas source comprises a diluent gas selected from the group consisting of H2, N2, O2, argon, helium, and mixtures of two or more of the foregoing. 67. The method of claim 38, wherein the active gas source comprises an active gas including carbon tetrafluoride. 68. The method of claim 38, wherein the step of controllably dispensing active gas from the active gas source at a predetermined flow rate comprises flow of active gas through a gas flow metering device comprising a micro-valve. 69. The method of claim 38, wherein the mixing step comprises flowing active gas from the active gas source and diluent gas from the diluent gas source to a venturi, and the step of controllably dispensing active gas from the active gas source at a predetermined flow rate comprises flow of active gas through a gas flow metering device comprising a valve and a restricted flow orifice between the valve and the venturi. 70. A method for delivery of dilute gas, comprising: providing an active gas source and a diluent gas source; controllably dispensing active gas from the active gas source at a predetermined flow rate; mixing active gas from the active gas source that is dispensed at said predetermined flow rate, with diluent gas from the diluent gas source, to form a diluted active gas mixture; and monitoring concentration of active gas in the diluted active gas mixture, and responsively adjusting the dispensing rate of the neat active gas, to maintain a predetermined concentration of active gas in the diluted active gas mixture, wherein the monitoring step utilizes multiple gas monitoring devices and a signal processor unit, each of the multiple gas monitoring devices generates an output correlative of concentration of active gas in the diluted active gas mixture, and each such output is transmitted to the signal processor unit for processing, and the signal processor unit is arranged to transmit a control signal derivative of the outputs of the multiple gas monitoring devices to responsively adjust the gas flow metering device, to control the dispensing rate of the active gas, and maintain the predetermined concentration of active gas in the diluted active gas mixture. 71. The method of claim 70, wherein the signal processor unit includes a processing device selected from the group consisting of comparator circuits, bridge circuits, microprocessors, and programmable general purpose computers. 72. A method for delivery of dilute fluid, comprising: providing an active fluid source and a diluent fluid source; controllably dispensing active fluid from the active fluid source at a predetermined flow rate; mixing active fluid from the active fluid source that is dispensed at said predetermined flow rate, with diluent fluid from the diluent fluid source, in a mixing device, to form a diluted active fluid mixture; and monitoring concentration of active fluid in the diluted active fluid mixture, and responsively adjusting the dispensing rate of the active fluid, to maintain a predetermined concentration of active fluid in the diluted active fluid mixture, wherein the diluent fluid is flowed to said mixing device without passage through a mass flow controller or flaw restriction element. 73. A system for delivery of dilute gases, comprising: an active gas source; a diluent gas source; a gas flow metering device for dispensing of the active gas at a predetermined flow rate; a dynamic mixing device arranged to mix active gas from the active gas source that is dispensed at said predetermined flow rate by the gas flow metering device, with diluent gas to form a diluted active gas mixture; and a monitor arranged to measure concentration of active gas in the diluted active gas mixture, and responsively adjust the gas flow metering device, to control the dispensing rate of the active gas, and maintain a predetermined concentration of active gas in the diluted active gas mixture; wherein the dilient gas is flowed to the dynamic mixing device without passage through a mass flow controller or flow restriction element. 74. The system of claim 73, wherein the dynamic mixing device comprises a pump. 75. The system of claim 73, wherein the dynamic mixing device comprises a compressor. 76. The system of claim 73, wherein the dynamic mixing device comprises a rotary mixer. 77. A system for delivery of dilute gases, comprising: an active gas source; a diluent gas source; a gas flow metering device for dispensing of the active gas at a predetermined flow rate; a mixing device arranged to mix active gas from the active gas source that is dispensed at said predetermined flow rate by the gas flow metering device, with diluent gas to form a diluted active gas mixture; and a monitor arranged to measure concentration of active gas in the diluted active gas mixture, and responsively adjust the gas flow metering device, to control the dispensing rate of the active gas, and maintain a predetermined concentration of active gas in the diluted active gas mixture, wherein the monitor comprises multiple gas monitoring devices and a signal processor unit, each of the multiple gas monitoring devices generates an output correlative of concentration of active gas in the diluted active gas mixture, and each such output is transmitted to the signal processor unit for processing, and the signal processor unit is arranged to transmit a control signal derivative of the outputs of the multiple gas monitoring devices to responsively adjust the gas flow metering device, to control the dispensing rate of the neat active gas, and maintain the predetermined concentration of active gas in the diluted active gas mixture. 78. The system of claim 77, wherein the signal processor unit includes a processing device selected front the group consisting of comparator circuits, bridge circuits, microprocessors, and programmable general purpose computers.