A method of manufacturing an electron beam apparatus having an airtight container with electron-emitting devices contained therein and spacers provided in the airtight container comprising the coating step of providing a film on a spacer substrate to be the spacers, and characterized in that the coa
A method of manufacturing an electron beam apparatus having an airtight container with electron-emitting devices contained therein and spacers provided in the airtight container comprising the coating step of providing a film on a spacer substrate to be the spacers, and characterized in that the coating step includes the applying step of applying liquid film material by emitting from an emitting portion in a predetermined direction to a part of a surface of the spacer substrate facing the emitting portion.
대표청구항▼
What is claimed is: 1. A method of manufacturing a spacer for use in an electron beam apparatus having an airtight container with electron-emitting devices contained therein and spacers provided in the airtight container, the method comprising: preparing a spacer substrate having a portion, which i
What is claimed is: 1. A method of manufacturing a spacer for use in an electron beam apparatus having an airtight container with electron-emitting devices contained therein and spacers provided in the airtight container, the method comprising: preparing a spacer substrate having a portion, which is treated so that substantially no acute angle in a cross-section is provided at a corner portion between a first surface, which is flat, and a second surface, wherein the first surface faces a substrate of the container and the second surface is a side surface to the first surface when the spacer is arranged in the container; and applying a liquid material for a film to at least a part of the corner portion of the spacer substrate from a nozzle by a bubble generated using thermal energy, or by a piezoelectric element, wherein the spacer substrate is such that the following relationship is satisfied: description="In-line Formulae" end="lead"(t 2+4h2)<s2<(t+2 h)2,description="In-line Formulae" end="tail" wherein t is a maximum value of a thickness of the spacer substrate when the film is formed from the liquid material, h is a height of the film, and s is an inner peripheral length of a section of the film. 2. The method according to claim 1, further comprising a moving step of changing a relative poison of the nozzle and the spacer substrate. 3. The method according to claim 1, wherein the applying step includes a step of emitting a droplet of the liquid material from a single nozzle. 4. The method according to claim 1, wherein the liquid material is emitted from the nozzle by generating the bubble in the liquid material before the emission. 5. The method according to claim 1, wherein in the liquid material is emitted by a piezoelectric element. 6. The method according to claim 1, wherein the liquid material comprises a metal element. 7. The method according to claim 1, wherein the film is an electrode. 8. The method according to claim 1, wherein the liquid material is applied from a plurality of nozzles. 9. The method according to claim 1, wherein the liquid material is applied simultaneously to the first surface and the second surface of the spacer substrate. 10. The method according to claim 1, wherein the spacer substrate is processed using hot-draw, which is carried out with relationship S2>S1 being satisfied, where S1 is a cross-section of a desired spacer substrate and S2 is a cross-section of a spacer base material, with both ends of a spacer base material being fixed, a cross-section of the spacer base material being similar in shape to that of the spacer substrate, a part of the spacer base material in a longitudinal direction being heated to a temperature at or above a softening point while one end portion is fed in a direction of the heated portion at a velocity of V1 and the other end portion is drawn in the same direction as that of V1 at a velocity of V2, and a relationship S1/S2 =V1/V2 being satisfied, and wherein the spacer base material is cooled after the hot-drawn spacer base material is cut to have a desired length. 11. The method according to claim 1, wherein the spacer substrate is formed of glass or ceramic. 12. A method of manufacturing an electron beam apparatus having an airtight container with electron-emitting devices contained therein and the spacers provided in said airtight container, wherein the spacer is manufactured according to claim 1. 13. The method according to claim 1, wherein the liquid material is sprayed. 14. The method according to claim 13, wherein a part of the sprayed liquid material does not reach the treated portion of the spacer substrate. 15. The method according to claim 1, wherein the spacer substrate is treated by rounding or tapering the corner portion between the first surface and the second surface of the spacer substrate. 16. The method according to claim 15, wherein the rounding of the spacer substrate is carried out such that a radius r of a curvature is 1% or more of a maximum value t of a thickness of the spacer substrate where the film is formed. 17. The method according to claim 1, wherein a high resistance film having a surface resistance of at least 105 Ω/square is formed on the spacer having the film formed thereon. 18. The method according to claim 17, wherein the liquid material is applied to a part of a treated area. 19. The method according to claim 17, wherein the high resistance film has a surface resistance value of 105-1012 Ω/square. 20. The method according to claim 19, wherein the film has a surface resistance value of 1/10 or less of that of the high resistance film, and less than 107 Ω/square. 21. The method according to claim 1, wherein the liquid material is applied drop by drop. 22. The method according to claim 21, wherein the liquid material is applied from a plurality of nozzles each emitting the liquid material drop by drop.
Morikawa Yuko (Kawasaki JPX) Yanagisawa Yoshihiro (Atsugi JPX) Takimoto Kiyoshi (Kawasaki JPX), Electron-emitting device and electron beam lithograph machine and image display apparatus making use of it.
Spindt Christopher J. (Menlo Park CA) Field John E. (Redwood City CA) Morris David L. (San Jose CA) Curtin Christopher J. (Los Altos Hills CA), Field forming electrodes on high voltage spacers.
Ito, Nobuhiro; Sakai, Kunihiro; Fushimi, Masahiro, Method of manufacturing spacer, method of manufacturing image forming apparatus using spacer, and apparatus for manufacturing spacer.
Spindt Christopher J. (Menlo Park CA) Morris David L. (San Jose CA) Fahlen Theodore S. (San Jose CA) Schmid Anthony P. (Solana Beanch CA) Lovoi Paul A. (Saratoga CA), Structure and operation of high voltage supports.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.