[특허]Apparatus and method for mat protection of non-thermal plasma reactor

Apparatus and method for mat protection of non-thermal plasma reactor 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B01J-019/08 F01N-003/01 F01N-003/00 F01N-007/00
출원번호	US-0881641 (2001-06-14)
발명자 / 주소	Foster,Michael R. Li,Robert X. Nelson,David E.
출원인 / 주소	Delphi Technologies, Inc.
인용정보	피인용 횟수 : 0 인용 특허 : 45

초록 ▼

A non-thermal plasma reactor is provided. The non-thermal plasma reactor includes a plasma-generating substrate, a housing and a mat. The plasma-generating substrate has one or more flow paths for an exhaust gas. The housing has an inlet and an outlet. The mat retains the plasma-generating substrate in the housing such that the one or more flow paths are in fluid communication with the inlet and the outlet. A voltage is supplied to the plasma-generating substrate to generate a plasma field. An electrically insulating layer is disposed between the plasma-generating substrate and the housing for preventing an arc of electricity from the plasma-generating substrate and/or the voltage to the housing.

대표청구항 ▼

The invention claimed is: 1. A non-thermal plasma reactor, comprising: a plasma-generating substrate having one or more flow paths for an exhaust gas; a housing having an inlet and an outlet such that said one or more flow paths are in fluid communication with said inlet and said outlet; a mat disposed about said plasma-generating substrate for retaining said plasma-generating substrate in said housing; a voltage supplied to said plasma-generating substrate for generating a plasma field; and an electrically insulating layer disposed between said mat and said housing for preventing an arc of electricity from said plasma-generating substrate and/or said voltage to said housing. 2. The non-thermal plasma reactor of claim 1, further comprising a diffusion header for diffusing said exhaust gas to said plasma-generating substrate and away from said mat. 3. The non-thermal plasma reactor of claim 1, wherein said insulating layer is a mica layer. 4. The non-thermal plasma reactor of claim 2, wherein said diffusion header comprises an end spaced apart from the plasma-generating substrate. 5. The non-thermal plasma reactor of claim 4, wherein said end is spaced apart from said plasma-generating substrate by between about 0.5 mm to 1.5 mm. 6. The non-thermal plasma reactor of claim 1, wherein said plasma-generating substrate includes peripheral extensions in close proximity to said inlet and said outlet. 7. The non-thermal plasma reactor of claim 2, further comprising a sealant on said mat at an interface of said diffusion header said plasma-generating substrate. 8. A non-thermal plasma reactor, comprising: a plasma-generating substrate having one or more flow paths for an exhaust gas; a housing having an inlet and an outlet, said housing comprising an end plate; a mat retaining said plasma-generating substrate in said housing; a voltage supplied to said plasma-generating substrate for generating a plasma field; and a compression stop disposed about said plasma-generating substrate apart from housing, whereby said mat is compressed to a density greater than 0.3 grams/cc between said end plate and said compression stop and a density less than 0.3 grams/cc laterally about said plasma-generating substrate. 9. The non-thermal plasma reactor of claim 8, further comprising an enhanced diffusion header spaced apart from said compression stop. 10. The non-thermal plasma reactor of claim 9, wherein said diffusion header comprises an end spaced apart from said compression stop by about 0.5 and 1.5 mm.

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