|국가/구분||United States(US) Patent 등록|
|미국특허분류(USC)||029/450; 029/888.3; 277/910; 277/913|
|발명자 / 주소|
|출원인 / 주소|
|대리인 / 주소||
|인용정보||피인용 횟수 : 2 인용 특허 : 3|
Very low moisture o-rings are prepared by placing standard o-rings under vacuum in an inert atmosphere for a period of time sufficient to achieve a desired outgassing rate. Heat is not applied. While the o-rings are under vacuum, moisture is removed from the o-rings via diffusion transport.
The invention claimed is: 1. A method for preparing a moisture-depleted o-ring comprising: a) calculating an amount of time required for an o-ring of known dimensions to be placed under vacuum to achieve a desired outgassing rate; b) placing the o-ring under vacuum for the calculated amount of time, wherein moisture in the o-ring is depleted while it is under vacuum and the o-ring is not heated while it is under vacuum; and c) removing the o-ring from the vacuum when the calculated amount of time has expired. 2. The method of claim 1 further comprisi...