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Planographic printing plate precursor

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-007/038
  • G03F-007/095
  • G03F-007/033
출원번호 US-0671776 (2003-09-29)
우선권정보 JP-2002-287819(2002-09-30)
발명자 / 주소
  • Sugasaki,Atsushi
  • Kunita,Kazuto
출원인 / 주소
  • Fuji Photo Film Co., Ltd.
대리인 / 주소
    Sughrue Mion, PLLC
인용정보 피인용 횟수 : 0  인용 특허 : 32

초록

A planographic printing plate precursor including: a support; and an image recording layer which is disposed on the support and contains a binder polymer, a polymerization initiator, a polymerizable compound, and an IR absorber. Upon exposure with a laser beam, an exposed portion of the image record

대표청구항

What is claimed is: 1. A planographic printing plate precursor comprising: a support; and an image recording layer which has a two-layer structure including a first layer containing a binder polymer and a second layer containing a binder polymer, a polymerization initiator, a polymerizable compound

이 특허에 인용된 특허 (32)

  1. Terry Lane Scarlette, Abrasion resistant coatings.
  2. Yamasita Yukio (Yokohama JPX) Nakamura Toru (Yokohama JPX) Otsuki Yutaka (Yokohama JPX), Cationic electrodeposition negative type resist composition.
  3. Grunwald John J. (Ramat Gan ILX) Hirsh Shulamit (Tel Aviv ILX) Gal Chava (Ramat Hasharim ILX), Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates.
  4. Hauck Gerhard,DEX ; Savariar-Hauck Celin,DEX ; Timpe Hans-Joachim,DEX ; West Paul R. ; Munnelly Heidi M., IR-sensitive composition and use thereof for the preparation of printing plate precursors.
  5. Kazuto Kunita JP, Image forming material.
  6. Mohr Dieter (Wiesbaden DEX) Riess Kurt (Wiesbaden DEX), Light-sensitive aqueous developable copying material and product by coating process thereof utilizing polysiloxane and a.
  7. Shinozaki Fumiaki (Shizuoka) Fujimori Junichi (Shizuoka JPX), Light-sensitive composition consisting essentially of, in admixture a nonionic aromatic diazo compound and a cationic dy.
  8. Imai Masanori (Shizuoka JPX) Koike Mitsuru (Shizuoka JPX) Watanabe Noriaki (Shizuoka JPX) Kita Nobuyuki (Shizuoka JPX) Higashi Tatsuji (Shizuoka JPX), Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide.
  9. Toyama Tadao (Shizuoka JPX) Kobayashi Kesanao (Shizuoka JPX) Koike Mitsuru (Shizuoka JPX) Tamoto Koji (Kanagawa JPX), Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition.
  10. Yanaka, Hiromitsu, Lithographic printing plate precursor.
  11. Vermeersch Joan,BEX ; Van Damme Marc,BEX, Method for making a lithographic printing plate involving on press development.
  12. Zee, Oscar, Method for measuring system clock signal frequency variations in digital processing systems.
  13. West Paul Richard ; Sheriff Eugene Lynn ; Gurney Jeffery Allen ; Schneebeli Ralph Scott ; Jordan Thomas Robert ; Miller Gary Roger, Method of providing an image using a negative-working infrared photosensitive element.
  14. Nakamura, Ippei; Sorori, Tadahiro, Negative image-recording material.
  15. Oshima, Yasuhito, Negative photosensitive lithograhic printing plate.
  16. Aoshima Keitaro,JPX, Negative type image recording material.
  17. Kobayashi Fumikazu,JPX, Negative type image recording material.
  18. Kausch William L. (Cottage Grove MN), Negative-acting photoresist composition.
  19. Aoshima, Keitaro, Negative-type image recording material and precursor for negative-type lithographic printing plate.
  20. Teng, Gary Ganghui, On-press developable thermosensitive lithographic plates utilizing an onium or borate salt initiator.
  21. Gary Ganghui Teng, On-press development of thermosensitive lithographic plates.
  22. Barr Robert ; Lundy Daniel ; Wheeler Stephen, Photoimageable composition having improved flexibility.
  23. Koike Mitsuru (Shizuoka JPX) Kita Nobuyuki (Shizuoka JPX), Photopolymerizable composition.
  24. Faust Raimund Josef (Wiesbaden-Biebrich DT) Klupfel Kurt Walter (Wiesbaden-Sonnenberg DT), Photopolymerizable copying composition.
  25. Faust Raimund Josef (Wiesbaden-Biebrich DT), Photopolymerizable copying compositions containing biuret-based polyfunctional monomers.
  26. Ide, Hiroshi, Photopolymerizable photosensitive composition.
  27. Lipson Melvin A. (Fullerton CA) Zador Eugene (Fullerton CA), Polymers for aqueous processed photoresists.
  28. Haley Neil F. (Wellington CO) Corbiere Steven L. (Windsor CO), Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing p.
  29. Nguyen My T. ; Saraiya Shashikant ; Mikell Frederic E. ; Shimazu Ken-ichi ; Pappas S. Peter ; Hallman Robert W. ; Shah Ajay ; Timpe Hans-Joachim,DEX ; Savariar-Hauck Celin,DEX, Radiation-sensitive compositions and printing plates.
  30. Ishimaru Toshiaki (Hitachi JPX) Tsukada Katsushige (Hitachi JPX) Hayashi Nobuyuki (Hitachi JPX) Koibuchi Shigeru (Hitachi JPX) Isobe Asao (Hitachi JPX), Soldering mask formed from a photosensitive resin composition and a photosensitive element.
  31. Miyagawa Masashi (Kawasaki JPX) Takenouchi Masanori (Atsugi JPX) Ohkuma Norio (Machida JPX), Transfer recording medium comprising a layer changing its transferability when provided with light and heat.
  32. Walls John E. (Hampton NJ) Pagano Frank C. (Avenel NJ), Water developable lithographic composition.
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