초록

The invention relates to various advantageous embodiments of a plasma-accelerator configuration, especially for the configuration and design of electron sources used for ionizing the working gas and/or neutralizing the discharged plasma jet.

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The invention claimed is: 1. Plasma accelerator configuration for emission of an accelerated plasma beam in a longitudinal direction, having a plasma chamber delimited laterally by a chamber wall, between an anode and an acceleration electrode arranged at the plasma beam exit from the plasma chambe

The invention claimed is: 1. Plasma accelerator configuration for emission of an accelerated plasma beam in a longitudinal direction, having a plasma chamber delimited laterally by a chamber wall, between an anode and an acceleration electrode arranged at the plasma beam exit from the plasma chamber, and an electron source formed by a partial surface of the acceleration electrode, which source provides electrons to the plasma chamber from the side of the plasma beam exit, which electrons are exposed to an electrical and a magnetic field in the plasma chamber, for ionizing the working gas in the plasma chamber, whereby the electron source is formed by a passive electron surface within the plasma chamber, which surface is impacted by part of the plasma beam and releases electrons when the ions impact. 2. Configuration according to claim 1, wherein the passive electrode surface is laterally spaced apart from a center longitudinal axis of the plasma chamber. 3. Configuration according to claim 1, wherein the passive electrode surface is arranged on the chamber wall. 4. Configuration according to claim 1, wherein the passive electrode surface is structured as a ring surface or as individual surfaces arranged about the center longitudinal axis in ring shape. 5. Configuration according to claim 1, wherein the electron source is metallic. 6. Configuration according to claim 1, wherein the electron source additionally delivers electrons for neutralizing the exiting plasma beam. 7. Plasma accelerator configuration for emission of a directed accelerated plasma beam, having a plasma chamber between an anode and an acceleration electrode arranged at the plasma beam exit from the plasma chamber, as well as a magnetic field configuration and an electron source, which source provides electrons to the plasma chamber from the side of the plasma beam exit, which electrons are exposed to an electrical and a magnetic field in the plasma chamber, for ionizing the working gas in the plasma chamber, wherein the plasma chamber is structured with rotation symmetry about and contains a longitudinal axis, and wherein the magnetic field configuration in the longitudinal direction has at least one first magnetic pole that surrounds the plasma chamber, the counter-pole of which is spaced apart from the first magnetic pole in the longitudinal direction, and the electron source comprises an electrode arranged on the side of the plasma beam exit, arranged outside the plasma chamber, and wherein the magnetic field configuration has more than two alternating consecutive roles in the longitudinal direction. 8. Configuration according to claim 7, wherein one or more additional electrodes are provided between the anode and the acceleration electrode, which lie at intermediate potentials between the potentials of the acceleration electrode and the anode. 9. Configuration according to claim 7, wherein the external electron source additionally delivers a neutralizing stream for a non-neutral plasma beam that exits from the plasma chamber. 10. Configuration according to claim 7, wherein the plasma chamber is closed on the anode side and that no electron beam is passed into the plasma chamber from the anode side that lies opposite the plasma beam exit in the longitudinal direction. 11. Plasma accelerator configuration for emission of an accelerated plasma beam in a longitudinal direction, having a plasma chamber delimited laterally by a chamber wall, between an anode and an acceleration electrode arranged at the plasma beam exit from the plasma chamber, and an electron source, which source provides electrons to the plasma chamber from the side of the plasma beam exit, which electrons are exposed to an electrical and a magnetic field in the plasma chamber, for ionizing the working gas in the plasma chamber, whereby the electron source is formed by a passive electron surface within the plasma chamber, which surface is impacted by part of the plasma beam and releases electrons when the ions impact, wherein one or more intermediate electrodes are arranged in the longitudinal direction, between the anode and the acceleration electrode, which lie at electrical intermediate potentials, and a multistage magnet configuration in the longitudinal direction generates a magnetic field having a concentration of radial magnetic field components between consecutive electrodes.