IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0725430
(2003-12-03)
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우선권정보 |
CL-CL 2002-2790(2002-12-04) |
발명자
/ 주소 |
- Yakasovic Saavedra,Tom찼s Ivan
- Tomasello Rayo,Gonzalo Leonardo
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출원인 / 주소 |
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대리인 / 주소 |
Finnegan, Henderson, Farabow, Garrett &
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인용정보 |
피인용 횟수 :
6 인용 특허 :
4 |
초록
▼
An apparatus and method of dosing pre-set quantities of gas, wherein the addition of known quantities of gas is required. The apparatus is designed to dosify gases in variable quantities, with temperature correction. The apparatus and the method is mainly applied to the gasification of containers u
An apparatus and method of dosing pre-set quantities of gas, wherein the addition of known quantities of gas is required. The apparatus is designed to dosify gases in variable quantities, with temperature correction. The apparatus and the method is mainly applied to the gasification of containers used to transport foodstuffs, which must be kept at a controlled environment in order to better preserve them.
대표청구항
▼
The invention claimed is: 1. A gas dosing apparatus comprising a metering chamber of known volume for containing a gas to be injected, a supply of compressed gas connected to the metering chamber by an inlet duct, and a dosing injector connected to the metering chamber by an outlet duct, wherein sa
The invention claimed is: 1. A gas dosing apparatus comprising a metering chamber of known volume for containing a gas to be injected, a supply of compressed gas connected to the metering chamber by an inlet duct, and a dosing injector connected to the metering chamber by an outlet duct, wherein said metering chamber has at least one sensor for measuring the pressure inside the metering chamber, at least one sensor for measuring the temperature inside the metering chamber, at least one temperature sensor exposed to the environment located on an external part of the gas dosing apparatus for measuring the temperature outside the metering chamber, and at least one pressure sensor exposed to the environment located on an external part of the gas dosing apparatus for measuring the pressure outside the metering chamber. 2. The gas dosing apparatus according to claim 1, wherein between the compressed gas supply and the metering chamber there is located an intake valve. 3. The gas dosing apparatus according to claim 2, wherein the intake valve is an electrovalve that regulates the flow of gas from the compressed gas supply to the metering chamber. 4. The gas dosing apparatus according to claim 2, wherein between the compressed gas supply and the intake valve there is a gas shut-off valve. 5. The gas dosing apparatus according to claim 1, wherein between the metering chamber and the dosing injector there is located an outlet valve. 6. The gas dosing apparatus according to claim 5, wherein the outlet valve is an electrovalve that regulates the flow of gas from the metering chamber to the dosing injector. 7. The gas dosing apparatus according to claim 1, wherein the pressure sensor in the metering chamber continuously measures the pressure inside the metering chamber, or each time a pressure record is required. 8. The gas dosing apparatus according to claim 1, wherein the temperature sensor in the metering chamber continuously measures the temperature of the gas inside the metering chamber at regular intervals or each time a pressure record is required. 9. The gas dosing apparatus according to claim 1, wherein the temperature sensor located on the external part of the gas dosing apparatus, measures room temperature in the location where the dosing injector is located, said temperature sensor measuring the external temperature on a continuous basis, at regular intervals, or each time a temperature record is required. 10. The gas dosing apparatus according to claim 1, wherein the temperature sensor located on the external part of the gas dosing apparatus is an array of temperature sensors. 11. The gas dosing apparatus according to claim 1, wherein the compressed gas supply contains a compressed gas or is a pressurized line from which the gas to be dosified may be obtained. 12. The gas dosing apparatus according to claim 1, wherein the temperature and pressure sensors are connected to an electronic control system. 13. The gas dosing apparatus according to claim 12, wherein the electronic control system includes a digital microprocessor circuit and a control panel. 14. The gas dosing apparatus according to claim 13, wherein the microprocessor processes information provided by the temperature and pressure sensors, and performs calculations from data entered by the control panel to determine the correct amount of gas to be injected. 15. A method of gas dosing comprising the steps of: allowing a predetermined amount of gas to flow to a metering chamber of known volume; measuring the pressure and temperature of the gas inside the metering chamber with internal pressure and temperature sensors; measuring the temperature outside the metering chamber with an external temperature sensor; measuring the pressure outside the metering chamber with an external pressure sensor; and allowing the discharge of a pre-set amount of gas from the metering chamber based on the measurements of the temperature and pressure sensors. 16. The method of gas dosing according to claim 15, wherein an intake valve controls entry of gas from a compressed gas supply to the metering chamber while an outlet valve allowing discharge of gas from the metering chamber is closed. 17. The method of gas dosing according to claim 16, wherein the measurement of pressure by the internal pressure sensor records the increase in the pressure inside the metering chamber up to a pre-set value. 18. The method of gas dosing according to claim 17, wherein once the pre-set value of the pressure has been reached the intake value is closed. 19. The method of gas dosing according to claim 18, wherein once the intake valve has been closed, the temperature of the gas stored in the metering chamber is measured by the internal temperature sensor. 20. The method of gas dosing according to claim 17, wherein the gas is discharged from the metering chamber with a dosing gun, which gun transmits a signal to a microprocessor, the microprocessor, once it has received the signal, opening the outlet valve to start the discharge of the gas from the metering chamber. 21. The method of gas dosing according to claim 20, wherein once the microprocessor has detected the pre-set pressure within the metering chamber, it closes the gas outlet valve. 22. The method of gas dosing according to claim 15, wherein the cycle is repeated to refill the metering chamber for a new dosing operation.
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