국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0272751
(2002-10-17)
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발명자
/ 주소 |
- Pinnavaia,Thomas J.
- Kim,Seong Su
- Zhang,Wenzhong
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출원인 / 주소 |
- Board of Trustees operating Michigan State University
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인용정보 |
피인용 횟수 :
13 인용 특허 :
9 |
초록
▼
Novel lamellar mesoporous silica compositions which can contain functional inorganic elements and organic functional groups as part of the lamellar silica framework structure are described. The compositions are prepared using gemini amine surfactants as templates or structure directing agents. The c
Novel lamellar mesoporous silica compositions which can contain functional inorganic elements and organic functional groups as part of the lamellar silica framework structure are described. The compositions are prepared using gemini amine surfactants as templates or structure directing agents. The compositions have novel high temperature and hydrothermal stability and unique fundamental particle structures.
대표청구항
▼
We claim: 1. A lamellar mesoporous inorganic oxide and silica composition, wherein the inorganic oxide is other than silica, wherein the composition was derived from a mesoporous silica composition without the inorganic oxide composition containing an electrically neutral amine surfactant, wherein
We claim: 1. A lamellar mesoporous inorganic oxide and silica composition, wherein the inorganic oxide is other than silica, wherein the composition was derived from a mesoporous silica composition without the inorganic oxide composition containing an electrically neutral amine surfactant, wherein the surfactant is of the formula: description="In-line Formulae" end="lead"RNH(CH 2)yNHR1description="In-line Formulae" end="tail" wherein y is 1 to 4, R is an alkyl moiety containing 10 to 20 carbon atoms and R1 is selected from the group consisting of hydrogen, methyl, ethyl and (CH2)mNH2 wherein m is 1, 2, 3 or 4 in mesopores, which surfactant has been removed from the silica composition which silica composition without the inorganic oxide was then treated post-synthesis of the mesoporous silica composition with one or more of an inorganic oxide forming compound of an inorganic element and the surfactant and then the treated silica composition was heated to form the inorganic oxide over and on silica composition so that the inorganic oxide and silica composition is lamellar and mesoporous, wherein the inorganic element is selected from the group consisting of B, Al, Ga, Fe, Co, Mn, Cr, Ge, Ti, V, Ni, Sn, Sb, Zr, W, Mo, Ca, Cu, Pb, In, Nb, Sr, and Zn. 2. The composition of claim 1 wherein cross-linking of SiO 4 tetrahedra in the silica to four adjacent silicon sites (Q 4) and to three adjacent silicon sites (Q3) corresponds to a Q4/Q3 ratio of at least 5. 3. The composition of claim 1 with at least one x-ray diffraction line corresponding to a basal spacing of 4 to 10 nm. 4. The composition of claim 1 wherein the surfactant has the formula: description="In-line Formulae" end="lead"Cn H2n+1NH(CH2)2NH2description="In-line Formulae" end="tail" where n is an integer between 8 and 20. 5. The composition of claim 1 wherein a particle morphology of the silica composition without the inorganic oxide forming compound is vesicular, bowlshaped, tube-shaped, of an onion layer morphology, or folded ribbon-shaped with a diameter between about 10 and 1400 nm and with a shell thickness between about 2.0 nm and 200 nm, and wherein the shell thickness is comprised of between about 1 and about 50 nanolayers. 6. The composition of claim wherein the inorganic oxide and silica composition is functionalized by reaction with an organosilane selected from the group consisting of X3SiR, X2SiR 2, XSiR3 and mixtures thereof where X is a hydrolyzable moiety and R is an organic moiety which contains an organic functional group. 7. A lamellar mesoporous inorganic oxide and silica composition derived from a mixed mesoporous silica composition and an inorganic element oxide forming compound applied with a surfactant post-synthesis of the mesoporous silica composition over the mesoporous silica composition wherein the surfactant is of the formula: description="In-line Formulae" end="lead"RNH(CH 2)yNHR1description="In-line Formulae" end="tail" wherein y is 1 to 4, R is an alkyl moiety containing 10 to 20 carbon atoms and R1 is selected from the group consisting of hydrogen, methyl, ethyl and (CH2)mNH2 wherein m is 1, 2, 3 or 4 and heated so as to be over the silica composition and so that the inorganic oxide and silica composition is lamellar and mesoporous, wherein the inorganic element is selected from the group consisting of B, Al, Ga, Fe, Co, Mn, Cr, Ge, Ti, V, Ni, Sn, Sb, Zr, W, Mo, Ca, Cu, Pb, In, Nb, Sr, and Zn. 8. The composition of claim 7 with at least one x-ray diffraction line corresponding to a basal spacing of 4 to 10 nm.
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