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Diamond like carbon silicon on insulator substrates and methods of fabrication thereof are disclosed. In one form, a process for creating a composite structure for fabricating an electronic device is disclosed. The process includes forming a first diamond-like carbon layer on a substrate and couplin

Diamond like carbon silicon on insulator substrates and methods of fabrication thereof are disclosed. In one form, a process for creating a composite structure for fabricating an electronic device is disclosed. The process includes forming a first diamond-like carbon layer on a substrate and coupling a support layer to the diamond-like carbon layer. The substrate is reduced to provide a device layer for fabricating a microelectronic device.

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What is claimed is: 1. A process for forming a silicon on insulator substrate for use in fabricating an electronic device, the process comprising: forming a diamond like carbon layer over a semiconductor substrate comprising a device side and a non-device side, wherein the diamond-like carbon layer

What is claimed is: 1. A process for forming a silicon on insulator substrate for use in fabricating an electronic device, the process comprising: forming a diamond like carbon layer over a semiconductor substrate comprising a device side and a non-device side, wherein the diamond-like carbon layer is formed on the non-device side of the semiconductor substrate within a deposition chamber hosting the substrate; and coupling a support layer to the diamond like carbon layer to provide structural support. 2. The process as described in claim 1 further comprising forming the diamond-like carbon layer using a low temperature deposition process. 3. The process as described in claim 2 further comprising forming the diamond-like carbon layer using a PVD process. 4. The process as described in claim 1 further comprising forming the diamond-like carbon layer using a high temperature deposition process. 5. The process as described in claim 4 further comprising forming the diamond-like carbon layer using a CVD process. 6. The process of claim 1, wherein coupling the support layer includes coupling a support layer comprising a semiconductor material. 7. The process as described in claim 1 further comprising: reducing a thickness of the semiconductor substrate by reducing the device side of the semiconductor substrate. 8. The process as described in claim 7 further comprising: determining a thickness of the diamond-like carbon layer prior to reducing the thickness, wherein reducing the thickness is based upon the thickness of the diamond-like carbon layer. 9. The process as described in claim 7 wherein the reducing comprises grinding the device side of the substrate to thin the substrate to a thickness operable to fabricate electronic devices. 10. A process for fabricating an electronic device comprising: providing a substrate within a deposition chamber; forming a diamond-like carbon layer on a first side of the substrate; reducing a second side of the substrate to a thickness operable to allow fabrication of an electronic device at the second side of the substrate; and coupling a support layer to the diamond-like layer, the support layer opposing the second side of the substrate. 11. The process of claim 10 further comprising: fabricating the electronic device over the diamond like carbon layer and at least partially on the second side of the substrate. 12. The process as described in claim 10 further comprising forming the diamond-like carbon layer using a low temperature deposition process. 13. The process as described in claim 12 further comprising forming the diamond-like carbon layer using a PVD process. 14. The process as described in claim 10 further comprising forming the diamond-like carbon layer using a high temperature deposition process. 15. The process as described in claim 14 leer comprising forming the diamond-like carbon layer using a CVD process. 16. The process of claim 10, wherein coupling the support layer includes coupling a support layer comprising a semiconductor material. 17. A process comprising: forming a diamond like carbon layer over a semiconductor substrate, the semiconductor substrate suitable for formation of integrated circuit devices; and coupling a support layer to the diamond like carbon layer to provide structural support for the carbon layer and the semiconductor substrate. 18. The process of claim 17, further comprising: reducing a thickness of the semiconductor substrate after formation of the diamond like carbon layer. 19. The process of claim 17, further comprising: reducing a thickness of the semiconductor substrate after coupling the support layer. 20. The process of claim 17 comprising: determining a thickness of the diamond-like carbon layer; reducing the thickness of the substrate; and measuring a resulting thickness of the substrate. 21. The process as described in claim 17 further comprising forming the diamond-like carbon layer using a low temperature deposition process. 22. The process as described in claim 21 further comprising forming the diamond-like carbon layer using a PVD process. 23. The process as described in claim 17 further comprising forming the diamond-like carbon layer using a high temperature deposition process. 24. The process as described in claim 23 further comprising forming the diamond-like carbon layer using a CVD process. 25. The process of claim 17, wherein coupling the support layer includes coupling a support layer comprising a semiconductor material.