초록 ▼

A semiconductor device includes a highly reliable multi-level interconnect structure having a low effective dielectric constant and which can be easily manufactured with a relatively inexpensive process, and a method for manufacturing the semiconductor device. The semiconductor device includes a low

A semiconductor device includes a highly reliable multi-level interconnect structure having a low effective dielectric constant and which can be easily manufactured with a relatively inexpensive process, and a method for manufacturing the semiconductor device. The semiconductor device includes a lower-level interconnect and an upper-level interconnect, each surrounded by a barrier layer, and a via plug surrounded by a barrier layer and electrically connecting the lower-level interconnect and the upper-level interconnect.

대표청구항 ▼

What is claimed is: 1. A semiconductor device comprising: a lower-level interconnect embedded in an insulating film and surrounded by a barrier layer; a first liner layer on which is formed said barrier layer surrounding said lower-level interconnect; an upper-level interconnect embedded in an insu

What is claimed is: 1. A semiconductor device comprising: a lower-level interconnect embedded in an insulating film and surrounded by a barrier layer; a first liner layer on which is formed said barrier layer surrounding said lower-level interconnect; an upper-level interconnect embedded in an insulating film and surrounded by a barrier layer; a second liner layer on which is formed said barrier layer surrounding said upper-level interconnect; and a via plug embedded in an insulating film and surrounded by a barrier layer, said via plug electrically connecting said lower-level interconnect and said upper-level interconnect, wherein said upper-level interconnect is separated from said via plug by said barrier layer surrounding said upper-level interconnect. 2. The semiconductor device according to claim 1, wherein said lower-level interconnect is composed of Cu, a Cu alloy, Ag, an Ag alloy, Au or an Au alloy, said upper-level interconnect is composed of Cu, a Cu alloy, Ag, an Ag alloy, Au or an Au alloy, and said via plug is composed of Cu, a Cu alloy, Ag, an Ag alloy, Au or an Au alloy. 3. The semiconductor device according to claim 2, wherein said barrier layer surrounding said lower-level interconnect is composed of Co, a Co alloy, Ni, a Ni alloy, Ti, a Ti alloy, Ta, a Ta alloy, or a nitride thereof, said barrier layer surrounding said upper-level interconnect is composed of Co, a Co alloy, Ni, a Ni alloy, Ti, a Ti alloy, Ta, a Ta alloy, or a nitride thereof, and said barrier layer surrounding said via plug is composed of Co, a Co alloy, Ni, a Ni alloy, Ti, a Ti alloy, Ta, a Ta alloy, or a nitride thereof. 4. The semiconductor device according to claim 3, wherein said first liner layer is composed of at least one of Pd, Ag, Au, Pt, Co, Ni and Sn, or an alloy thereof, and said second liner layer is composed of at least one of Pd, Ag, Au, Pt, Co, Ni and Sn, or an alloy thereof. 5. The semiconductor device according to claims 1, wherein said first liner layer is composed of at least one of Pd, Ag, Au, Pt, Co, Ni and Sn, or an alloy thereof, and said second liner layer is composed of at least one of Pd, Ag, Au, Pt, Co, Ni and Sn, or an alloy thereof. 6. The semiconductor device according to claim 1, wherein said barrier layer surrounding said lower-level interconnect is composed of Co, a Co alloy, Ni, a Ni alloy, Ti, a Ti alloy, Ta, a Ta alloy, or a nitride thereof, said barrier layer surrounding said upper-level interconnect is composed of Co, a Co alloy, Ni, a Ni alloy, Ti, a Ti alloy, Ta, a Ta alloy, or a nitride thereof, and said barrier layer surrounding said via plug is composed of Co, a Co alloy, Ni, a Ni alloy, Ti, a Ti alloy, Ta, a Ta alloy, or a nitride thereof. 7. A method for manufacturing a semiconductor device, comprising: forming a lower-level interconnect, surrounded by a first barrier layer, on an insulating film such that said lower-level interconnect extends beyond a surface of said insulating film, by (i) forming a first liner layer on said surface of said insulating film, (ii) applying to a surface of said first liner layer, material that is to form a portion of said first barrier layer, (iii) using a first resist to form a first interconnect pattern on a surface of said material that is to form said portion of said first barrier layer, (iv) embedding a first interconnect material in said first interconnect pattern to form a first interconnect composed of said first interconnect material, (v) removing said first resist from said material that is to form said portion of said first barrier layer, removing an unnecessary portion of said material that is to form said portion of said first barrier layer, and removing an unnecessary portion of said first liner layer, and (vi) forming a remaining portion of said first barrier layer on all exposed surfaces of said first interconnect; forming a first interlevel dielectric layer on said surface of said insulating film such that a surface of said first barrier layer is exposed; forming a via plug, surrounded by a second barrier layer, on said surface of said first barrier layer such that said via plug extends beyond a surface of said first interlevel dielectric layer and is electrically connected to said lower-level interconnect; forming a second interlevel dielectric layer on said surface of said first interlevel dielectric layer and said surface of said first barrier layer such that a surface of said via plug is exposed; and forming an upper-level interconnect, surrounded by a third barrier layer, on said second interlevel dielectric layer such that said upper-level interconnect extends beyond a surface of said second interlevel dielectric layer and is electrically connected to said via plug, by (i) forming a second liner layer on said surface of said second interlevel dielectric layer, (ii) applying to a surface of said second liner layer, material that is to form a portion of said third barrier layer, (iii) using a second resist to form a second interconnect pattern on a surface of said material that is to form said portion of said third barrier layer, (iv) embedding a second interconnect material in said second interconnect pattern to form a second interconnect composed of said second interconnect material, (v) removing said second resist from said material that is to form said portion of said third barrier layer, removing an unnecessary portion of said material that is to form said portion of said third barrier layer, and removing an unnecessary portion of said second liner layer, and (vi) forming a remaining portion of said third barrier layer on all exposed surfaces of said second interconnect. 8. The method according to claim 7, further comprising: polishing said first interconnect material, after embedding said first interconnect material in said first interconnect pattern, to remove unnecessary first interconnect material and flatten a surface of said first interconnect; and polishing said second interconnect material, after embedding said second interconnect material in said second interconnect pattern, to remove unnecessary second interconnect material and flatten a surface of said second interconnect. 9. The method according to claim 8, wherein polishing said first interconnect material comprises chemical mechanical polishing said first interconnect material, and polishing said second interconnect material comprises chemical mechanical polishing said second interconnect material. 10. The method according to claim 7, further comprising: heat treating said first interconnect after removing said first resist, said unnecessary portion of said material that is to form said portion of said first barrier layer, and said unnecessary portion of said first liner layer; and heat treating said second interconnect after removing said second resist, said unnecessary portion of said material that is to form said portion of said third barrier layer, and said unnecessary portion of said second liner layer. 11. The method according to claim 7, wherein forming a first liner layer comprises forming a liner layer composed of at least one of Pd, Ag, Au, Pt, Co, Ni and Sn, or an alloy thereof, and forming a second liner layer comprises forming a liner layer composed of at least one of Pd, Ag, Au, Pt, Co, Ni and Sn, or an alloy thereof. 12. The method according to claim 7, wherein embedding said first interconnect material in said first interconnect pattern comprises performing electrolytic plating or electroless plating to embed said first interconnect material in a bottom-up manner, and embedding said second interconnect material in said second interconnect pattern comprises performing electrolytic plating or electroless plating to embed said second interconnect material in a bottom-up manner. 13. The method according to claim 7, wherein removing said unnecessary portion of said material that is to form said portion of said first barrier layer comprises removing said unnecessary portion by performing selective etching utilizing said first interconnect as a mask, removing said unnecessary portion of said first liner layer comprises removing said unnecessary portion by performing selective etching utilizing said first interconnect as a mask, removing said unnecessary portion of said material that is to form said portion of said third barrier layer comprises removing said unnecessary portion by performing selective etching utilizing said second interconnect as a mask, and removing said unnecessary portion of said second liner layer comprises removing said unnecessary portion by performing selective etching utilizing said second interconnect as a mask. 14. The method according to claim 7, wherein forming said remaining portion of said first barrier layer on all exposed surfaces of said first interconnect comprises forming said remaining portion by performing electroless plating, and forming said remaining portion of said third barrier layer on all exposed surfaces of said second interconnect comprises forming said remaining portion by performing electroless plating. 15. A method for manufacturing a semiconductor device, comprising: forming a lower-level interconnect, surrounded by a first barrier layer, on an insulating film such that said lower-level interconnect extends beyond a surface of said insulating film; forming a first interlevel dielectric layer on said surface of said insulating film such that a surface of said first barrier layer is exposed; forming a via plug, surrounded by a second barrier layer, on said surface of said first barrier layer such that said via plug extends beyond a surface of said first interlevel dielectric layer and is electrically connected to said lower-level interconnect, by (i) using a resist to form a via pattern on said surface of said first interlevel dielectric layer and said surface of said first barrier layer, (ii) embedding a metal in said via pattern so as to form a metal via plug composed of said metal, (iii) removing said resist from said first interlevel dielectric layer and said first barrier layer, (iv) heat treating said metal via plug, and (v) forming said second barrier layer on an exposed surface of said metal via plug; forming a second interlevel dielectric layer on said surface of said first interlevel dielectric layer and said surface of said first barrier layer such that a surface of said via plug is exposed; and forming an upper-level interconnect, surrounded by a third barrier layer, on a surface of said second interlevel dielectric layer such that said upper-level interconnect extends beyond said surface of said second interlevel dielectric layer and is electrically connected to said via plug. 16. The method according to claim 15, wherein embedding said metal in said via pattern comprises performing electroless plating to embed said metal in a bottom-up manner. 17. The method according to claim 15, wherein forming said second barrier layer on an exposed surface of said metal via plug comprises forming said second barrier layer by performing electroless plating.