초록 ▼

An apparatus for providing different gases to different zones of a processing chamber is provided. A gas supply for providing an etching gas flow is provided. A flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into a plurality of legs is pr

An apparatus for providing different gases to different zones of a processing chamber is provided. A gas supply for providing an etching gas flow is provided. A flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into a plurality of legs is provided. A tuning gas system in fluid connection to at least one of the legs of the plurality of legs is provided.

대표청구항 ▼

What is claimed is: 1. An apparatus for providing different gases to different zones of a processing chamber, comprising: a gas supply for providing an etching gas flow; a first leg; a second leg, wherein the second leg comprises a first parallel flow; a second parallel flow; a third parallel flow;

What is claimed is: 1. An apparatus for providing different gases to different zones of a processing chamber, comprising: a gas supply for providing an etching gas flow; a first leg; a second leg, wherein the second leg comprises a first parallel flow; a second parallel flow; a third parallel flow; a supply line; a manifold which combines output from the first parallel flow, the second parallel flow, and the third parallel flow into the supply line; a first flow valve on the first parallel flow; a first fixed orifice on the first parallel flow; a second flow valve on the second parallel flow, a second fixed orifice on the second parallel flow; a third flow valve on the third parallel flow; and a third fixed orifice on the third parallel flow; flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into the first leg and the second leg connected between the gas supply and the first leg and the second leg a tuning gas system in fluid connection to at least one of the legs of the first and second legs, wherein the gas tuning system comprises: at least one tuning gas source; and at least one mass flow controller; and a controller controllably connected to the first flow valve, the second flow valve, the third flow valve, and the at least one mass flow controller of the tuning system. 2. The apparatus, as recited in claim 1, wherein the first leg is in fluid connection with a first zone of the processing chamber and the second leg is in fluid connection with a second zone of the processing chamber. 3. The apparatus, as recited in claim 2, wherein the flow splitter further comprises a flow resistance device on the first leg for maintaining a flow ratio between the first leg and the second leg. 4. The apparatus, as recited in claim 3, wherein the tuning gas system is in fluid connection with the first leg and the second leg. 5. The apparatus, as recited in claim 4, wherein the tuning gas system provides a component gas provided by the gas supply. 6. The apparatus, as recited in claim 5, wherein the tuning gas system provides tuning gas down stream from the flow resistance device and down stream from the first fixed orifice, the second fixed orifice, and the third fixed orifice. 7. The apparatus, as recited in claim 6, wherein the flow resistance device comprises a fourth fixed orifice. 8. The apparatus, as recited in claim 3, wherein the tuning gas system provides tuning gas down steam from the flow resistance device. 9. A tuning system for tuning a gas feed system for a processing chamber with a controller, wherein the gas feed system comprises a first leg for supplying a processing gas to a first part of the processing chamber, a second leg for supplying the processing gas to a second part of the processing chamber, and a flow ratio device with a feedback control valve and flow measurement device for maintaining a flow ratio between the first leg and the second leg connected to the controller, wherein the flow ratio device is connected to said first and second legs, wherein the tuning system comprises: a first gas line in fluid connection with the first leg; a second gas line in fluid connection with the second leg; a tuning gas source in fluid connection with the first gas line and the second gas line at points between the processing chamber and the connections between flow ratio device and the first and second legs; and a mass flow controller connected between the first gas line and the tuning gas source and connected to the controller, wherein the controller uses data from the flow measurement device and provides a signal to the feedback control valve for maintaining the flow ratio between the first leg and the second leg. 10. The tuning system, as recited in claim 9, wherein the tuning gas source comprises: a first tuning gas supply in fluid connection with the first gas line; and a second tuning gas supply in fluid connection with the second gas line. 11. The tuning system, as recited in claim 10, further comprising a second mass flow controller connected between the second tuning gas supply and the second gas line. 12. An apparatus for providing different gases to different zones of a processing chamber, comprising: a gas supply for providing an etching gas flow; a first leg; a second leg comprising: a feedback control valve; and a flow measurement device; flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into the first leg and the second leg connected between the gas supply the first leg and the second leg; a tuning gas system in fluid connection to at least one of the legs of to first and second legs, wherein the gas tuning system comprises: at least one tuning gas source; and at least one mass flow controller; and a controller controllably connected to the at least one mass flow controller of the tuning system, the flow measurement device, and to feedback control valve, wherein the controller receives input from the flow measurement device arid provides output to the feedback control valve based on flow measured by the flow measurement device to maintain a flow ratio between the first leg and the second leg. 13. The apparatus, as recited in claim 12, wherein the first leg is in fluid connection with a first zone of the processing chamber and the second leg is in fluid connection with a second zone of the processing chamber.