Apparatus and method for sequestering a contaminant by use of an exothermically reactive structure
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01D-050/00
H01J-029/94
H01J-029/00
출원번호
US-0232489
(2002-08-30)
발명자
/ 주소
Simon,Jonathan
출원인 / 주소
Avago Technologies General IP (Singapore) Pte. Ltd.
인용정보
피인용 횟수 :
0인용 특허 :
5
초록▼
A method of contaminant sequestering. Specifically, one embodiment of the present invention discloses an apparatus for sequestering a contaminant comprising an exothermically reactive structure disposed within a hermetic enclosure. A sorbent material coats a surface of the exothermically reactive st
A method of contaminant sequestering. Specifically, one embodiment of the present invention discloses an apparatus for sequestering a contaminant comprising an exothermically reactive structure disposed within a hermetic enclosure. A sorbent material coats a surface of the exothermically reactive structure. The sorbent material reacts with a contaminant contained within an atmosphere of the hermetic enclosure when exposed to heat from an exothermic alloying reaction in the exothermically reactive structure. As such, the contaminant becomes sequestered within the hermetic enclosure.
대표청구항▼
What is claimed is: 1. An apparatus for removing contaminants comprising: an exothermically reactive structure adapted to be disposed within a hermetic enclosure, wherein said exothermically reactive structure comprises alternating layers of submicron films of metals for producing an exothermic all
What is claimed is: 1. An apparatus for removing contaminants comprising: an exothermically reactive structure adapted to be disposed within a hermetic enclosure, wherein said exothermically reactive structure comprises alternating layers of submicron films of metals for producing an exothermic alloying reaction when activated; in which at least one of said alternating layers, a first alternating layer, comprises a sorbent material comprising one reactant in said exothermic alloying reaction and for sequestering a contaminant contained within an atmosphere of said hermetic enclosure when exposed to heat from said exothermic alloying reaction, wherein said first alternating layer exothermically reacts with a second alternating layer that does not exhibit any sorbent characteristics. 2. The apparatus of claim 1, wherein said sorbent material is a getter material for non-catalytically reacting with said contaminant for sequestering said contaminant. 3. The apparatus of claim 2, wherein said getter material is selected from the group consisting of: barium; thorium, and zirconium. 4. The apparatus of claim 1, wherein said sorbent material is a catalyzing agent for sequestering said contaminant. 5. The apparatus of claim 4, wherein said sorbent material is taken from a group consisting of: platinum; and zirconium. 6. The apparatus of claim 1, further comprising: an external energy source for initiating said exothermic alloying reaction. 7. The apparatus of claim 6, wherein said external energy source is a laser for initiating said exothermic alloying reaction in a localized area of said exothermically reactive structure. 8. The apparatus of claim 6, wherein said external energy source thermally heats said hermetic enclosure for initiating said exothermic alloying reaction. 9. The apparatus of claim 1, wherein said sorbent material comprises an absorbing getter material for sequestering said contaminant. 10. The apparatus of claim 1, wherein said sorbent material comprises an adsorbing getter material for sequestering said contaminant. 11. The apparatus of claim 1, wherein said exothermically reactive structure and said sorbent material are patterned into a resistive element. 12. An apparatus for removing contaminants comprising: first and third layers of an alloying metal, wherein said alloying metal does not exhibit any sorbent characteristics; and a second layer of a sorbent material sandwiched between said first and third layers for reacting with each of said first and third layers of said alloying metal in an exothermic alloying reaction, and for sequestering a contaminant contained within an atmosphere of a hermetic enclosure when said sorbent material is exposed to heat from said exothermic alloying reaction, said first, second, and third layers comprising an exothermically reactive structure adapted to be disposed within said hermetic enclosure, wherein said first, second, and third layers comprise alternating layers of submicron thickness. 13. The apparatus as described in claim 12, wherein said sorbent material is a getter material for non-catalytically reacting with said contaminant for sequestering said contaminant. 14. The apparatus of claim 13, wherein said sorbent material, is selected from a group consisting of: barium; thorium; and zirconium. 15. The apparatus as described in claim 12, wherein said sorbent material acts as a catalyzing agent for sequestering said contaminant. 16. The apparatus as described in claim 15, wherein said sorbent material is taken from a group consisting of: platinum; and zirconium. 17. The apparatus as described in claim 12, further comprising: an external energy source for activating said exothermic alloying reaction. 18. The apparatus of claim 17, further comprising a resistive element, said resistive element comprising said exothermically reactive structure; and electrical contacts coupled to said exothermically reactive structure, said electrical contacts extending outside said hermetic enclosure and coupled to said external energy source that heats said exothermically reactive structure with current for activating said exothermic alloying reaction. 19. The apparatus as described in claim 12, further comprising said hermetic enclosure, and wherein said hermetic enclosure is suitably sized to enclose at least one microelectronic device. 20. The apparatus of claim 17, wherein said external energy source is a laser for initiating said exothermic alloying reaction in a localized area of said exothermically reactive structure.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (5)
Fritz William C. ; Maslennikov Igor L. ; Duboc ; Jr. Robert M. ; Fahlen Theodore S. ; Hopple George B., Flat panel display with getter in auxiliary chamber.
Barbee ; Jr. Troy W. (Palo Alto CA) Weihs Timothy (Menlo Park CA), Ignitable heterogeneous stratified structure for the propagation of an internal exothermic chemical reaction along an ex.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.