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Oxime ester photoiniators having a combined structure 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-007/004
출원번호 US-0480146 (2002-06-04)
우선권정보 EP-01810559(2001-06-11)
국제출원번호 PCT/EP02/006107 (2002-06-04)
§371/§102 date 20031208 (20031208)
국제공개번호 WO02/100903 (2002-12-19)
발명자 / 주소
  • Kunimoto,Kazuhiko
  • Tanabe,Junichi
  • Kura,Hisatoshi
  • Oka,Hidetaka
  • Ohwa,Masaki
출원인 / 주소
  • Ciba Specialty Chemicals Corporation
인용정보 피인용 횟수 : 107  인용 특허 : 6

초록

초록이 없습니다.

대표청구항

대표청구항이 없습니다.

이 특허에 인용된 특허 (6)

  1. Asakura, Toshikage; Yamato, Hitoshi; Ohwa, Masaki; Birbaum, Jean-Luc; Dietliker, Kurt; Tanabe, Junichi, Oxime derivatives and the use thereof as latent acids.
  2. Kunimoto, Kazuhiko; Oka, Hidetaka; Ohwa, Masaki; Tanabe, Junichi; Kura, Hisatoshi; Birbaum, Jean-Luc, Oxime ester photoinitiators.
  3. Laridon Urbain L. (Wilrijk BEX) Marin August M. (Oevel BEX) De Winter Walter F. (s\-Gravenwezel BEX) Kokelenberg Hendrik E. (Merksem BEX), Photopolymerizable recording materials.
  4. Itoh Masanori (Himeji JPX) Takenaka Fumio (Himeji JPX) Tohya Kouzi (Himeji JPX), Photopolymerization initiator comprised of thioxanthones and oxime esters.
  5. Ai Hideo (Fuji JPX) Suga Nobuhiko (Fuji JPX) Ogitani Satoshi (Fuji JPX) Takahashi Hideaki (Fuji JPX) Ikeda Akihiko (Fuji JPX), Polymer/oxime ester/coumarin compound photosensitive composition.
  6. Van Goethem Hugo V. (Edegem BEX) Stroobants Marcel (Muizen BEX) De Winter Walter F. (S-Gravenwezel BEX), Production of etch-resist colloid and material suitable therefor.

이 특허를 인용한 특허 (107)

  1. Or-Bach, Zvi; Wurman, Ze'ev, 3D integrated circuit with logic.
  2. Sekar, Deepak C.; Or-Bach, Zvi; Cronquist, Brian, 3D memory semiconductor device and structure.
  3. Or-Bach, Zvi, 3D semiconductor device.
  4. Or-Bach, Zvi, 3D semiconductor device.
  5. Or-Bach, Zvi; Wurman, Ze'ev, 3D semiconductor device.
  6. Or-Bach, Zvi; Wurman, Zeev, 3D semiconductor device.
  7. Or-Bach, Zvi; Cronquist, Brian; Sekar, Deepak, 3D semiconductor device and structure.
  8. Or-Bach, Zvi; Cronquist, Brian; Sekar, Deepak, 3D semiconductor device and structure.
  9. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian, 3D semiconductor device and structure.
  10. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian; Beinglass, Israel; de Jong, Jan Lodewijk, 3D semiconductor device and structure.
  11. Sekar, Deepak; Or-Bach, Zvi; Cronquist, Brian, 3D semiconductor device and structure.
  12. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian; Beinglass, Israel; Wurman, Ze'ev; Lim, Paul, 3D semiconductor device and structure with back-bias.
  13. Or-Bach, Zvi; Wurman, Ze'ev, 3D semiconductor device including field repairable logics.
  14. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian; Wurman, Zeev, 3D semiconductor device, fabrication method and system.
  15. Or-Bach, Zvi; Widjaja, Yuniarto, 3DIC system with a two stable state memory and back-bias region.
  16. You, Xiaorong, Abrasive articles and methods for making same.
  17. Song, Jae Kyu; Kim, Bong Chan; Yoo, Min, Adhesive composition for semiconductor device.
  18. Or-Bach, Zvi; Wurman, Zeev, Automation for monolithic 3D devices.
  19. Kalgutkar, Rajdeep S.; Stark, Peter A.; Brennan, Joan V.; Hill, Jeffrey B., Dental compositions including a thermally labile component, and the use thereof.
  20. Brennan, Joan V.; Kalgutkar, Rajdeep S.; Perez, Mario A.; Mahoney, Wayne S.; Stark, Peter A.; Oxman, Joel D.; James, Darrell S., Dental compositions including radiation-to-heat converters, and the use thereof.
  21. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian, Integrated circuit device and structure.
  22. Or-Bach, Zvi; Wurman, Zeev, Method for design and manufacturing of a 3D semiconductor device.
  23. Or-Bach, Zvi, Method for developing a custom device.
  24. Or-Bach, Zvi; Sekar, Deepak C., Method for fabricating novel semiconductor and optoelectronic devices.
  25. Cronquist, Brian; Beinglass, Isreal; de Jong, Jan Lodewijk; Sekar, Deepak C.; Or-Bach, Zvi, Method for fabrication of a semiconductor device and structure.
  26. Or-Bach, Zvi; Cronquist, Brian; Beinglass, Isreal; de Jong, Jan Lodewijk; Sekar, Deepak C., Method for fabrication of a semiconductor device and structure.
  27. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian, Method for fabrication of a semiconductor device and structure.
  28. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian; Beinglass, Israel; de Jong, Jan Lodewijk, Method for fabrication of a semiconductor device and structure.
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  31. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian; Lim, Paul, Method for fabrication of a semiconductor device and structure.
  32. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian; Wurman, Ze'ev, Method for fabrication of a semiconductor device and structure.
  33. Sekar, Deepak; Or-Bach, Zvi; Cronquist, Brian, Method for fabrication of a semiconductor device and structure.
  34. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian; Beinglass, Israel; de Jong, Jan Lodewijk, Method for fabrication of configurable systems.
  35. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian; Beinglass, Israel; Wurman, Ze'ev; Lim, Paul, Method of constructing a semiconductor device and structure.
  36. Or-Bach, Zvi; Cronquist, Brian; Beinglass, Isreal; de Jong, Jan Lodewijk; Sekar, Deepak C., Method of fabricating a semiconductor device and structure.
  37. Or-Bach, Zvi; Sekar, Deepak; Cronquist, Brian; Wurman, Ze'ev, Method of forming three dimensional integrated circuit devices using layer transfer technique.
  38. Or-Bach, Zvi; Widjaja, Yuniarto, Method of maintaining a memory state.
  39. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian, Method of manufacturing a semiconductor device and structure.
  40. Sekar, Deepak C.; Or-Bach, Zvi, Method of manufacturing a semiconductor device with two monocrystalline layers.
  41. Or-Bach, Zvi; Cronquist, Brian; Beinglass, Israel; de Jong, J. L.; Sekar, Deepak C.; Lim, Paul, Method of manufacturing a three dimensional integrated circuit by transfer of a mono-crystalline layer.
  42. Or-Bach, Zvi; Cronquist, Brian; Sekar, Deepak, Method of processing a semiconductor device.
  43. Or-Bach, Zvi; Wurman, Zeev, Method to construct a 3D semiconductor device.
  44. Or-Bach, Zvi; Wurman, Ze'ev, Method to construct systems.
  45. Or-Bach, Zvi; Wurman, Ze'ev, Method to form a 3D semiconductor device.
  46. Or-Bach, Zvi; Sekar, Deepak; Cronquist, Brian, Method to form a 3D semiconductor device and structure.
  47. Or-Bach, Zvi; Cronquist, Brian; Beinglass, Israel; de Jong, Jan Lodewijk; Sekar, Deepak C., Monolithic three-dimensional semiconductor device and structure.
  48. Harding, Brett T.; Li, Sheng; Mochizuki, Amane, Optical element for correcting color blindness.
  49. Harding, Brett T.; Li, Sheng; Mochizuki, Amane, Optical element for correcting color blindness.
  50. Harding, Brett T.; Li, Sheng; Mochizuki, Amane, Optical element for correcting color blindness.
  51. Harding, Brett T.; Li, Sheng; Mochizuki, Amane, Optical element for correcting color blindness.
  52. Harding, Brett T.; Li, Sheng; Mochizuki, Amane; Dantsker, Eugene, Optical element for correcting color blindness.
  53. Harding, Brett T.; Li, Sheng; Mochizuki, Amane; Fujii, Hironaka, Optical element for correcting color blindness.
  54. Harding, Brett T.; Li, Sheng; Mochizuki, Amane; Fujii, Hironaka, Optical element for correcting color blindness.
  55. Harding, Brett T.; Li, Sheng; Mochizuki, Amane; Sisk, David T., Optical element for correcting color blindness.
  56. Sasaki, Tomoya, Oxime derivative, photopolymerizable composition, color filter, and process for producing the same.
  57. Akutsu, Mitsuo; Sawamoto, Daisuke; Kozaki, Yasunori; Murai, Toshihiko, Oxime ester compound and photopolymerization initiator containing such compound.
  58. Murata, Kiyoshi; Oishi, Takeo; Kimijima, Koichi, Oxime ester compound and photopolymerization initiator containing the same.
  59. Sawamoto, Daisuke; Kimijima, Koichi, Oxime ester compound and photopolymerization initiator containing the same.
  60. Kunimoto, Kazuhiko; Kura, Hisatoshi; Yamamoto, Hiroshi; Nakagawa, Yumiko; Asakura, Toshikage; Sameshima, Kaori, Oxime ester photoinitiators.
  61. Matsumoto, Akira; Kura, Hisatoshi, Oxime ester photoinitiators.
  62. Matsumoto, Akira; Tanabe, Junichi; Kura, Hisatoshi; Ohwa, Masaki, Oxime ester photoinitiators.
  63. Tanabe, Junichi; Kunimoto, Kazuhiko; Kura, Hisatoshi; Oka, Hidetaka; Ohwa, Masaki, Oxime ester photoinitiators.
  64. Lee, Keon Woo; Kim, Sung Hyun; Kwak, Sang Kyu; Oh, Dong Kung; Lee, Chang Soon; Cho, Chang Ho; Min, Kyoung Hoon, Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition.
  65. Uchikawa, Kiyoshi, Photosensitive resin composition, and light blocking layer and liquid crystal display using the same.
  66. Sekar, Deepak C.; Or-Bach, Zvi, Self aligned semiconductor device and structure.
  67. Or-Bach, Zvi; Lim, Paul; Sekar, Deepak C., Semiconductor and optoelectronic devices.
  68. Or-Bach, Zvi; Sekar, Deepak, Semiconductor and optoelectronic devices.
  69. Or-Bach, Zvi; Sekar, Deepak C., Semiconductor and optoelectronic devices.
  70. Or-Bach, Zvi; Sekar, Deepak C., Semiconductor and optoelectronic devices.
  71. Or-Bach, Zvi; Sekar, Deepak C., Semiconductor and optoelectronic devices.
  72. Or-Bach, Zvi, Semiconductor device and structure.
  73. Or-Bach, Zvi, Semiconductor device and structure.
  74. Or-Bach, Zvi; Cronquist, Brian, Semiconductor device and structure.
  75. Or-Bach, Zvi; Cronquist, Brian, Semiconductor device and structure.
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  91. Or-Bach, Zvi; Wurman, Zeev, Semiconductor device and structure.
  92. Sekar, Deepak C.; Or-Bach, Zvi, Semiconductor device and structure.
  93. Sekar, Deepak C.; Or-Bach, Zvi, Semiconductor device and structure.
  94. Sekar, Deepak C; Or-Bach, Zvi; Lim, Paul, Semiconductor device and structure.
  95. Sekar, Deepak; Or-Bach, Zvi; Cronquist, Brian, Semiconductor device and structure.
  96. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian, Semiconductor device and structure for heat removal.
  97. Sekar, Deepak C.; Or-Bach, Zvi; Cronquist, Brian, Semiconductor device and structure for heat removal.
  98. Sekar, Deepak; Or-Bach, Zvi; Cronquist, Brian, Semiconductor device and structure for heat removal.
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  101. Or-Bach, Zvi; Sekar, Deepak C.; Cronquist, Brian; Wurman, Zeev, Semiconductor system and device.
  102. Or-Bach, Zvi; Sekar, Deepak; Cronquist, Brian; Wurman, Ze'ev, Semiconductor system and device.
  103. Sekar, Deepak; Or-Bach, Zvi; Cronquist, Brian, Semiconductor system, device and structure with heat removal.
  104. Or-Bach, Zvi; Cronquist, Brian; Beinglass, Israel; de Jong, J. L.; Sekar, Deepak C., System comprising a semiconductor device and structure.
  105. Or-Bach, Zvi; Cronquist, Brian; Beinglass, Israel; de Jong, Jan Lodewijk; Sekar, Deepak C.; Wurman, Zeev, System comprising a semiconductor device and structure.
  106. Or-Bach, Zvi; Cronquist, Brian; Beinglass, Israel; de Jong, Jan Lodewijk; Sekar, Deepak C.; Wurman, Zeev, System comprising a semiconductor device and structure.
  107. Or-Bach, Zvi; Cronquist, Brian; Beinglass, Israel; de Jong, Jan Lodewijk; Sekar, Deepak C.; Wurman, Zeev, System comprising a semiconductor device and structure.
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