$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Load lock chamber for large area substrate processing system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/677
  • H01L-021/67
  • B21B-039/22
  • B21B-039/20
  • B65G-047/22
출원번호 US-0832795 (2004-04-26)
발명자 / 주소
  • Kurita,Shinichi
  • Blonigan,Wendell T.
  • Tanase,Yoshiaki
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Patterson & Sheridan LLP
인용정보 피인용 횟수 : 24  인용 특허 : 152

초록

초록이 없습니다.

대표청구항

대표청구항이 없습니다.

이 특허에 인용된 특허 (152)

  1. White John M. (Hayward CA) Berkstresser David E. (Los Gatos CA) Petersen Carl T. (Fremont CA), Alignment of a shadow frame and large flat substrates on a heated support.
    상세보기
  2. White John M. (2811 Colony View Pl. Hayward CA 94541) Berkstresser David E. (19311 Bear Creek Rd. Los Gatos CA 95030) Petersen Carl T. (1185 Gilbert Ct. Fremont CA 94536), Alignment of a shadow frame and large flat substrates on a support.
    상세보기
  3. Prentakis Antonios E. (Cambridge MA), Apparatus and method for loading and unloading wafers.
    상세보기
  4. Hirasawa Shigeki (Ibaraki) Torii Takuji (Ushiku) Watanabe Tomoji (Ibaraki) Komatsu Toshihiro (Ibaraki) Honma Kazuo (Ibaraki) Sakai Akihiko (Ibaraki) Takagaki Tetsuya (Tokorozawa) Uchino Toshiyuki (To, Apparatus and method for performing heat treatment on semiconductor wafers.
    상세보기
  5. Kato Susumu,JPX ; Ozawa Masahito,JPX ; Muraoka Sunao,JPX, Apparatus and method for regulating pressure in two chambers.
    상세보기
  6. Woodward Daniel A. (West Palm Beach FL), Apparatus for locating and supporting ceramic substrates.
    상세보기
  7. Hazano Shigeki (Yokohama CA JPX) Shibagaki Masahiro (San Jose CA) Jyo Hidetaka (Sagamihara JPX) Sensui Reiichiro (Sagamihara JPX) Iwami Munenori (Yokohama JPX) Suzuki Noboru (Chigasaki JPX), Apparatus for producing semiconductor devices.
    상세보기
  8. Harra David J. (Santa Cruz CA), Apparatus for thermal treatment of semiconductor wafers by gas conduction incorporating peripheral gas inlet.
    상세보기
  9. Davis Cecil J. (Greenville TX) Matthews Robert T. (Plano TX), Apparatus for transferring workpieces.
    상세보기
  10. Sugimoto Kenji (Kyoto JPX), Apparatus for treating the surfaces of wafers.
    상세보기
  11. Beer Emanuel ; White John M., Automated substrate processing system.
    상세보기
  12. Hofmeister Christopher A. ; Kiley Christopher C., Batch loader arm.
    상세보기
  13. Beaver ; II Robert I. (Menlo Park CA) Adams Michael J. (San Jose CA) Prodanovich George L. (Campbell CA) Key Paul F. (San Martin CA) Rawlings Don O. (San Jose CA) Santhanam P. (Sunnyvale CA) Hunt Sus, Buffer storage apparatus for semiconductor wafer processing.
    상세보기
  14. MacLeish Joseph H. ; Mailho Robert D., CVD reactor having heated process chamber within isolation chamber.
    상세보기
  15. Perlov Ilya ; Goder Alexey ; Gantvarg Eugene, Carousel wafer transfer system.
    상세보기
  16. Van Mastrigt Max (San Jose CA), Chemical vapor deposition apparatus.
    상세보기
  17. Sinha Ashok (Palo Alto CA) Chang Mei (Cupertino CA) Perlov Ilya (Santa Clara CA) Littau Karl (Sunnyvale CA) Morrison Alan (San Jose CA) Lei Lawrence Chung-Lai (Milpitas CA), Chemical vapor deposition chamber.
    상세보기
  18. Crabb Richard (Mesa AZ) Robinson McDonald (Paradise Valley AZ) Hawkins Mark R. (Mesa AZ) Goodwin Dennis L. (Tempe AZ) Ferro Armand P. (Scottsdale AZ) Ozias Albert E. (Aumsville OR) deBoer Wiebe B. (E, Chemical vapor deposition system.
    상세보기
  19. Ishii Katsumi (Fujino JPX) Asano Takanobu (Yokohama JPX) Abe Masaharu (Sagamihara JPX) Yamaga Kenichi (Sagamihara JPX) Sakata Kazunari (Sagamihara JPX) Tanahashi Takashi (Machida JPX) Moriya Syuji (Y, Clean air apparatus.
    상세보기
  20. Shiraiwa Hirotsugu (Hino JPX), Conveyor apparatus.
    상세보기
  21. Bonora Anthony C. (Menlo Park CA) Oen Joshua T. (Newark CA), Direct loadlock interface.
    상세보기
  22. Tabrizi, Farzad; Kitazumi, Barry; Barker, David A.; Setton, David A.; Niewmierzycki, Leszek; Kuhlman, Michael J., Door systems for low contamination, high throughput handling of workpieces for vacuum processing.
    상세보기
  23. Kraus, Joseph Arthur; Strassner, James David, Dual wafer load lock.
    상세보기
  24. Nogami Mamoru (Uji JPX), End station for an ion implantation apparatus.
    상세보기
  25. Devilbiss John J. (San Mateo CA) Glaze James A. (Danville CA) Lugosi Steve (Fremont CA) McNaughton Allen D. (Fremont CA) Ozaraki Robert G. (Livermore CA), Enhanced vertical thermal reactor system.
    상세보기
  26. Shidahara Hitoshi (Okayama JPX) Yamamoto Syozi (Ibara JPX), Equipment for heating and cooling substrates for coating photo resist thereto.
    상세보기
  27. Choul-gue Park KR, Etching apparatus for manufacturing semiconductor devices.
    상세보기
  28. Yokoyama Natsuki,JPX ; Kawamoto Yoshifumi,JPX ; Murakami Eiichi,JPX ; Uchida Fumihiko,JPX ; Mizuishi Kenichi,JPX ; Kawamura Yoshio,JPX, Fabrication system and method having inter-apparatus transporter.
    상세보기
  29. Altwood Allen ; Colborne Kelly ; Fairbairn Kevin ; Lane Christopher ; Ponnekanti Hari K. ; Sundar Satish, Front end wafer staging with wafer cassette turntables and on-the-fly wafer center finding.
    상세보기
  30. White John M. ; Blonigan Wendell T. ; Richter Michael W., Gas flow control in a substrate processing system.
    상세보기
  31. Ohsawa Tetsu (Sagamihara JPX), Heat treating apparatus.
    상세보기
  32. Chizinsky George (143 West St. Beverly Farms MA 01915), Heated plate rapid thermal processor.
    상세보기
  33. Chizinsky George (143 West St. Beverly Farms MA 01915), Heated plate rapid thermal processor.
    상세보기
  34. Mishina Haruo,JPX ; Imaisumi Kiyoshi,JPX ; Yamama Shinya,JPX, Heating furnace.
    상세보기
  35. Wytman Joe, High vacuum dual stage load lock and method for loading and unloading wafers using a high vacuum dual stage load lock.
    상세보기
  36. Wytman Joe, High vacuum dual stage load lock and method for loading and unloading wafers using a high vacuum dual stage load lock.
    상세보기
  37. Kurita Shinichi ; White John M., In-situ substrate transfer shuttle.
    상세보기
  38. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Bowling Robert A. (Garland TX), Integrated circuit processing system.
    상세보기
  39. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Bowling Robert A. (Garland TX), Integrated circuit processing system.
    상세보기
  40. Moran J. Christopher, Integrated micro-environment container loader apparatus having a semipermeable barrier.
    상세보기
  41. Rose Peter H. ; Blake Julian G. ; Brailove Adam A. ; Yang Zhongmin ; McRay Richard F. ; Hughey Barbara J., Ion implantation system for implanting workpieces.
    상세보기
  42. Ettinger Gary C. ; White John M., Isolation valves.
    상세보기
  43. Takumi Gotou JP; Masatoshi Yamamoto JP; Shuichi Fujiyoshi JP, Light conducting plate for a back lighting device and back lighting device.
    상세보기
  44. Hiroaki Saeki JP, Load-lock mechanism and processing apparatus.
    상세보기
  45. Kevin Fairbairn ; Howard E. Grunes ; Christopher Lane ; Kelly A. Colborne, Load-lock with external staging area.
    상세보기
  46. Rose Peter H. ; Brailove Adam A., Loadlock assembly for an ion implantation system.
    상세보기
  47. Marohl Dan A., Magnetically coupled wafer extraction platform.
    상세보기
  48. Shimoyashiro Sadao (Fujisawa JPX) Iwasaki Takemasa (Yokohama JPX) Kawaji Hiroyuki (Yokohama JPX) Hamada Toyohide (Yokohama JPX) Ikeda Minoru (Yokohama JPX) Kikuchi Hiroshi (Hiratsuka JPX) Nagatomo Hi, Method and apparatus for carrying a variety of products.
    상세보기
  49. Bahng Kenneth J. (Sunnyvale CA), Method and apparatus for cooling wafers.
    상세보기
  50. Pollock John D. (Rowley MA) Barriss Louise S. (North Reading MA), Method and apparatus for inverting samples in a process.
    상세보기
  51. White John M. ; Blonigan Wendell T. ; Tiner Robin L. ; Kurita Shinichi, Method and apparatus for substrate transfer and processing.
    상세보기
  52. Hugues Jean B. (Tempe AZ) Weber Lynn (Saratoga CA) Herlinger James E. (Palo Alto CA) Nishikawa Katsuhito (San Jose CA) Schuman Donald L. (Saratoga CA) Yee Gary W. (Santa Clara CA), Method and apparatus for transferring wafers between cassettes and a boat.
    상세보기
  53. Mueller Jean-Pierre (Hauterive CHX) Raemy Marius (Schmitten CHX), Method for manufacturing a strip-shaped composite body.
    상세보기
  54. White John M. ; Blonigan Wendell T. ; Richter Michael W., Method of controlling gas flow in a substrate processing system.
    상세보기
  55. Coleman John H. (Locust Valley NY), Method of forming semiconducting materials and barriers using a dual enclosure apparatus.
    상세보기
  56. Coleman John H. (Locust Valley NY), Method of forming semiconducting materials and barriers using a multiple chamber arrangement.
    상세보기
  57. Turner Norman L. (Mountain View CA) White John MacNeill (Los Gatos CA) Berkstresser David (Los Gatos CA), Method of heating and cooling large area glass substrates.
    상세보기
  58. Turner Norman L. (Mountain View CA) White John M. (Los Gatos CA) Berkstresser David (Los Gatos CA), Method of heating and cooling large area substrates and apparatus therefor.
    상세보기
  59. Lamont ; Jr. Lawrence T. (Mountain View CA), Method of thermal treatment of a wafer in an evacuated environment.
    상세보기
  60. Yamabe Kikuo (Yokohama JPX) Okumura Katsuya (Yokohama JPX), Method of thermally processing semiconductor wafers and an apparatus therefor.
    상세보기
  61. Ghanayem Steve G. ; Chandrachood Madhavi, Methods and apparatus for reducing particle contamination during wafer transport.
    상세보기
  62. Zajac John (San Jose CA) Mirkovich Ninko T. (Novato CA) Rathmann Thomas M. (Rohnert Park CA) Lachenbruch Roger B. (Petaluma CA), Modular article processing machine and method of article handling therein.
    상세보기
  63. White John M. ; Conner Robert B. ; Law Kam S. ; Turner Norman L. ; Lee William T. ; Kurita Shinichi, Modular substrate processing system.
    상세보기
  64. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.
    상세보기
  65. Namiki Minoru (Fuchu JPX) Takahashi Nobuyuki (Fuchu JPX), Multi-chamber integrated process system.
    상세보기
  66. Kim, Ki-sang; Jeoung, Gyu-chan; Kwag, Gyu-hwan, Multi-chamber system having compact installation set-up for an etching facility for semiconductor device manufacturing.
    상세보기
  67. Ozawa Masahito (Yamanashi JPX) Mizukami Masami (Yamanashi JPX) Kanazashi Masanobu (Kofu JPX) Takasoe Toshihiko (Yamanashi JPX) Narushima Masaki (Yamanashi JPX) Kubodera Masao (Yamanashi JPX), Multi-chamber system provided with carrier units.
    상세보기
  68. Asakawa Teruo,JPX ; Saeki Hiroaki,JPX, Multi-chamber treatment system.
    상세보기
  69. John M. White ; Wendell T. Blonigan ; Michael W. Richter, Multi-function chamber for a substrate processing system.
    상세보기
  70. White John M. ; Blonigan Wendell T. ; Richter Michael W., Multi-function chamber for a substrate processing system.
    상세보기
  71. White John M. ; Blonigan Wendell T. ; Richter Michael W., Multi-function chamber for a substrate processing system.
    상세보기
  72. Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multichamber integrated process system.
    상세보기
  73. Fairbairn Kevin ; Sinha Ashok, Multideck wafer processing system.
    상세보기
  74. Maydan Dan ; Somekh Sasson ; Wang David Nin-Kou ; Cheng David ; Toshima Masato ; Harari Isaac ; Hoppe Peter D., Multiple chamber integrated process system.
    상세보기
  75. Heyder Roger V. ; Brezocsky Thomas B. ; Davenport Robert E., Multiple loadlock system.
    상세보기
  76. Roger V. Heyder ; Thomas B. Brezocsky ; Robert E. Davenport, Multiple loadlock system.
    상세보기
  77. Edwards Richard C. ; Zielinski Marian, Multiple single-wafer loadlock wafer processing apparatus and loading and unloading method therefor.
    상세보기
  78. Muka Richard S. (Topsfield MA), Passive gas substrate thermal conditioning apparatus and method.
    상세보기
  79. Yano Kensaku (Kanagawa JPX) Furukawa Akihiko (Tokyo JPX) Miyagawa Ryohei (Kanagawa JPX) Iida Yoshinori (Tokyo JPX), Photo chemical reaction apparatus.
    상세보기
  80. Schmitt Jacques (La Ville Du Bois FRX), Process and means for producing films for use in electronics and/or optoelectronics using plasma.
    상세보기
  81. Davis Cecil J. (Greenville TX) Freeman Dean W. (Garland TX) Matthews Robert T. (Plano TX) Tomlin Joel T. (Garland TX) Jucha Rhett B. (Celeste TX), Processing apparatus and method.
    상세보기
  82. Lee Chunghsin (Lynnfield MA), Rapid thermal furnace for semiconductor processing.
    상세보기
  83. Ozias Albert E. (Aumsville OR), Reaction chambers for CVD systems.
    상세보기
  84. Saiki Kazuyoshi (Yamanashi JPX), Reduced-pressure processing apparatus.
    상세보기
  85. Krueger Gordon P. (San Jose CA), Reducing particulates during semiconductor fabrication.
    상세보기
  86. Tateyama Kiyohisa (Kumamoto) Akimoto Masami (Kumamoto) Ushijima Mitsuru (Tama JPX), Resist process system.
    상세보기
  87. Grunes Howard (Santa Cruz CA) Tepman Avi (Cupertino CA) Lowrance Robert (Los Gatos CA), Robot assembly.
    상세보기
  88. Bramhall ; Jr. Robert B. (Gloucester MA) Cloutier Richard M. (Salisbury MA) Laber Albert P. (Revere MA) Muka Richard S. (Topsfield MA), Sealing apparatus for a vacuum processing system.
    상세보기
  89. Seo Hirofumi,JPX ; Hiramatsu Shinichi,JPX, Semiconductor device manufacturing machine and method for manufacturing a semiconductor device by using the same manufacturing machine.
    상세보기
  90. Yang Yun-sik,KRX ; Cha Hun,KRX ; Chae Seung-ki,KRX, Semiconductor device manufacturing system having means for reducing a pressure difference between loadlock and processing chambers.
    상세보기
  91. Hiroki Tsutomu,JPX, Semiconductor processing apparatus.
    상세보기
  92. Maydan Dan (Los Altos CA) Somekh Sasson R. (Redwood City CA) Ryan-Harris Charles (La Honda CA) Seilheimer Richard A. (Pleasanton CA) Cheng David (San Jose CA) Abolnikov Edward M. (San Francisco CA) R, Semiconductor processing system with robotic autoloader and load lock.
    상세보기
  93. Savage, Richard N.; Menagh, Frank S.; Carvalheira, Helder R.; Troiani, Philip A.; Cossentine, Dan L.; Vaughan, Eric R.; Mayer, Bruce E., Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system.
    상세보기
  94. Fairbairn Kevin ; Lane Christopher ; Colborne Kelly, Single loadlock chamber with wafer cooling function.
    상세보기
  95. Rivkin Michael ; Kaczorowski Ed, Single wafer load lock chamber for pre-processing and post-processing wafers in a vacuum processing system.
    상세보기
  96. Tepman Avi (Cupertino CA) Grunes Howard (Santa Cruz CA) Somekh Sasson (Los Altos Hills CA) Maydan Dan (Los Altos Hills CA), Staged-vacuum wafer processing system and method.
    상세보기
  97. Coad George L. ; Lawson Eric C. ; Hughes John Lester, Substrate handling and processing system for flat panel displays.
    상세보기
  98. Crabb Richard (Mesa AZ) Robinson McDonald (Paradise Valley AZ) Hawkins Mark R. (Mesa AZ) Goodwin Dennis L. (Tempe AZ) Ferro Armand P. (Scottsdale AZ), Substrate handling and transporting apparatus.
    상세보기
  99. Akio Konishi JP; Nobuyuki Takahashi JP, Substrate processing apparatus.
    상세보기
  100. Sawada Atsushi,JPX ; Okuda Yasuhiko,JPX ; Komatsubara Shouji,JPX, Substrate processing apparatus.
    상세보기
  101. Adams Douglas R., Substrate processing apparatus with small batch load lock.
    상세보기
  102. Hofmeister Christopher A., Substrate processing apparatus with vertically stacked load lock and substrate transport robot.
    상세보기
  103. Harada Junji (Kumamoto JPX) Harada Ichiro (Kumamoto JPX) Nakamura Koji (Kumamoto JPX), Substrate processing method and substrate processing apparatus.
    상세보기
  104. Akimoto Masami,JPX, Substrate processing system.
    상세보기
  105. White, John M.; Turner, Norman L.; Tiner, Robin L.; Keller, Ernst; Kurita, Shinichi; Blonigan, Wendell T.; Berkstresser, David E., Substrate transfer shuttle.
    상세보기
  106. Blonigan Wendell T. ; White John M., Substrate transfer shuttle having a magnetic drive.
    상세보기
  107. Yonemitsu Shuji,JPX ; Karino Toshikazu,JPX ; Yoshida Hisashi,JPX ; Watahiki Shinichiro,JPX ; Yoshida Yuji,JPX ; Shimura Hideo,JPX ; Sugimoto Takeshi,JPX ; Aburatani Yukinori,JPX ; Ikeda Kazuhito,JPX, Substrate transferring mechanism.
    상세보기
  108. Okase Wataru,JPX, Substrate treatment system.
    상세보기
  109. Hofmeister Christopher A., Swap out plate and assembly.
    상세보기
  110. Tabrizi, Farzad; Kitazumi, Barry; Barker, David A.; Setton, David A.; Niewmierzycki, Leszek; Kuhlman, Michael J., Systems and methods for low contamination, high throughput handling of workpieces for vacuum processing.
    상세보기
  111. Tabrizi Farzad ; Kitazumi Barry ; Barker David A. ; Setton David A. ; Niewmierzycki Leszek ; Kuhlman Michael J., Systems and methods for robotic transfer of workpieces between a storage area and a processing chamber.
    상세보기
  112. Moslehi Mehrdad M. (Palo Alto CA) Saraswat Krishna C. (Santa Clara County CA), Thermal/microwave remote plasma multiprocessing reactor and method of use.
    상세보기
  113. Kroeker Tony R., Three chamber load lock apparatus.
    상세보기
  114. Aggarwal, Ravinder; Kusbel, James F., Transfer chamber with integral loadlock and staging station.
    상세보기
  115. Hiroki Tsutomu (Yamanashi JPX) Asakawa Teruo (Yamanashi JPX), Transfer device for transferring a substrate.
    상세보기
  116. Babinski John Paul (Essex Junction VT) Bertelsen Bruce Irving (Essex Junction VT) Raacke Karl Heinz (Essex Junction VT) Sirgo Valdeko Harry (Colchester VT) Townsend Clarence Jay (Essex Junction VT), Transport system for semiconductor wafer multiprocessing station system.
    상세보기
  117. Iwai Hiroyuki (Sagamihara JPX) Tanifuji Tamotsu (Yamato JPX) Asano Takanobu (Yokohama JPX) Okura Ryoichi (Kanagawa-ken JPX), Treatment apparatus.
    상세보기
  118. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.
    상세보기
  119. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.
    상세보기
  120. Lowrance Robert B. (Los Gatos CA), Two-axis magnetically coupled robot.
    상세보기
  121. Edwards Richard C., Two-wafer loadlock wafer processing apparatus and loading and unloading method therefor.
    상세보기
  122. Maydan Dan ; Somekh Sasson ; Sinha Ashok ; Fairbairn Kevin ; Lane Christopher ; Colborne Kelly ; Ponnekanti Hari K. ; Taylor W. N.(Nick), Ultra high throughput wafer vacuum processing system.
    상세보기
  123. Wagner Rudolf (Fontnas CHX) Martin Bader (Balzers LIX) Eberhard Moll (Schellenberg LIX) Zanardo Renzo (Balzers LIX) Van Agtmaal J. G. (Hilversum NLX), Vacuum apparatus.
    상세보기
  124. Galdos Aitor (Vaduz LIX) Wagner Rudolf (Weite CHX) Bruderer Markus (Widnau CHX), Vacuum apparatus for the surface treatment of workpieces.
    상세보기
  125. Toshima Masato (Campbell CA), Vacuum chamber slit valve.
    상세보기
  126. Fukasawa Yoshio (Kofu JPX) Hosoda Shozo (Yamanashi-ken JPX) Nakagome Tatsuya (Yamanashi-ken JPX) Tozawa Takashi (Yamanashi-ken JPX) Suzuki Koji (Yamanashi-ken JPX) Ishihara Yasumasa (Kofu JPX) Aoyagi, Vacuum process apparatus and vacuum processing method.
    상세보기
  127. Kato Susumu (Isawa-Cho JPX) Yamaguchi Hirofumi (Sudama-Cho JPX), Vacuum process apparaus.
    상세보기
  128. Soraoka Minoru,JPX ; Yoshioka Ken,JPX ; Kawasaki Yoshinao,JPX, Vacuum processing apparatus and semiconductor manufacturing line using the same.
    상세보기
  129. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing apparatus for substate wafers.
    상세보기
  130. Turner Norman L. (Mountain View CA) White John M. (Hayward CA), Vacuum processing apparatus having improved throughput.
    상세보기
  131. Lee Hideki (Nirasaki JPX), Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus.
    상세보기
  132. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Hildenbrand Randall C. (Richardson TX), Vacuum processing system.
    상세보기
  133. Kato Shigekazu (Kudamatsu JPX) Tamura Naoyuki (Kudamatsu JPX) Nishihata Kouji (Tokuyama JPX) Tsubone Tsunehiko (Hikari JPX) Itou Atsushi (Kudamatsu JPX), Vacuum processing system.
    상세보기
  134. Kato Shigekazu (Kudamatsu JPX) Tamura Naoyuki (Kudamatsu JPX) Nishihata Kouji (Tokuyama JPX) Tsubone Tsunehiko (Hikari JPX) Itou Atsushi (Kudamatsu JPX) Nakata Kenji (Hikari JPX) Ogawa Yoshifumi (Hik, Vacuum processing system.
    상세보기
  135. Blum Rick ; Fairbairn Kevin ; Lane Christopher, Vertical dual loadlock chamber.
    상세보기
  136. Murata Masanao (Ise JPX) Yamashita Teppei (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Hoshiko Takahide (Ise JPX) Karita Mitsuji (Ise JPX) Kawano Hitoshi (Ise JPX) Shinya Tutomu (Ise JPX), Wafer conveying system in a clean room.
    상세보기
  137. Chrisos John M. (Beverly MA) Fowler ; Jr. Bertram F. (Danvers MA) Muka Richard S. (Topsfield MA), Wafer handling apparatus.
    상세보기
  138. Iwabuchi Katsuhiko (Sagamihara JPX) Takanabe Eiichirou (Kanagawa-Ken JPX), Wafer processing apparatus.
    상세보기
  139. Craig Stevens ; Tony Jakubiec, Wafer processing architecture including single-wafer load lock with cooling unit.
    상세보기
  140. Edwards Richard C. (Ringwood NJ) Kolesa Michael S. (Suffern NY) Ishikawa Hiroichi (Mahwah NJ), Wafer processing cluster tool batch preheating and degassing apparatus.
    상세보기
  141. Flegal ; deceased Christopher (late of New City NY by Gisela H. Flegal ; legal representative), Wafer processing machine vacuum front end method and apparatus.
    상세보기
  142. Kuribayashi, Hiromitsu; Yoo, Woo Sik, Wafer processing method.
    상세보기
  143. Hiromitsu Kuribayashi JP; Woo Sik Yoo, Wafer processing system.
    상세보기
  144. Kuribayashi, Hiromitsu; Yoo, Woo Sik, Wafer processing system including a robot.
    상세보기
  145. Burrows Brian H. ; Kraus Joseph A. ; Verdict Gregory S., Wafer transfer cassette.
    상세보기
  146. Hertel Richard J. (Bradford MA) Delforge Adrian C. (Rockport MA) Mears Eric L. (Rockport MA) MacIntosh Edward D. (Gloucester MA) Jennings Robert E. (Nethuen MA) Bhargava Akhil (Reading MA), Wafer transfer system.
    상세보기
  147. Toshima Masato, Wafer transfer system.
    상세보기
  148. Toshima Masato, Wafer transfer system and method of using the same.
    상세보기
  149. Wiesler Mordechai (Lexington MA) Weiss Mitchell (Haverford PA), Wafer transfer system having rotational capability.
    상세보기
  150. Somekh Sasson (Los Altos Hills CA) Fairbairn Kevin (Saratoga CA) Kolstoe Gary M. (Fremont CA) White Gregory W. (San Carlos CA) Faraco ; Jr. W. George (Saratoga CA), Wafer tray and ceramic blade for semiconductor processing apparatus.
    상세보기
  151. Somekh Sasson (Los Altos Hills CA) Fairbairn Kevin (Saratoga CA) Kolstoe Gary M. (Fremont CA) White Gregory W. (San Carlos CA) Faraco ; Jr. W. George (Saratoga CA), Wafer tray and ceramic blade for semiconductor processing apparatus.
    상세보기
  152. Dorenbos Frederick William (El Cerrito CA), Workpiece handling system for vacuum processing.
    상세보기

이 특허를 인용한 특허 (24)

  1. Apte, Raj B., Atmospheric storage and transfer of thermal energy.
    상세보기
  2. van der Meulen, Peter, Bypass thermal adjuster for vacuum semiconductor processing.
    상세보기
  3. Lee, Jae-Chull; Kurita, Shinichi; White, John M.; Anwar, Suhail, Decoupled chamber body.
    상세보기
  4. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
    상세보기
  5. Kurita, Shinichi; Blonigan, Wendell T.; Tanase, Yoshiaki, Large area substrate transferring method for aligning with horizontal actuation of lever arm.
    상세보기
  6. Iwabuchi, Katsuhiko, Load lock apparatus, processing system and substrate processing method.
    상세보기
  7. Iwabuchi, Katsuhiko, Load lock apparatus, processing system and substrate processing method.
    상세보기
  8. Hofmeister, Christopher; Elliot, Martin R.; Krupyshev, Alexander; Hallisey, Joseph; Kraus, Joseph A.; Fosnight, William; Carbone, Craig J.; Blahnik, Jeffrey C.; Fong, Ho Yin Owen, Load lock chamber.
    상세보기
  9. Anwar, Suhail; Lee, Jae-Chull; Kurita, Shinichi, Load lock chamber with heater in tube.
    상세보기
  10. Kurita, Shinichi, Load lock chamber with slit valve doors.
    상세보기
  11. Hofmeister, Christopher; Elliot, Martin R.; Krupyshev, Alexander; Hallisey, Joseph; Kraus, Joseph A.; Fosnight, William; Carbone, Craig J.; Blahnik, Jeffrey C.; Fong, Ho Yin Owen, Load lock fast pump vent.
    상세보기
  12. Hofmeister, Christopher; Elliot, Martin R.; Krupyshev, Alexander; Hallisey, Joseph; Kraus, Joseph A.; Fosnight, William; Carbone, Craig J.; Blahnik, Jeffrey C.; Fong, Ho Yin Owen, Load lock fast pump vent.
    상세보기
  13. Leung, Billy C.; Berkstresser, David E.; Kurita, Shinichi, Methods and apparatus for providing a floating seal for chamber doors.
    상세보기
  14. Leung, Billy C.; Berkstresser, David E.; Kurita, Shinichi, Methods and apparatus for providing a floating seal having an isolated sealing surface for chamber doors.
    상세보기
  15. White, John M.; Kurita, Shinichi; Sterling, William N.; Tanase, Yoshiaki, Methods and apparatus for sealing a chamber.
    상세보기
  16. Sico, Angela Rose; Rice, Michael R.; Strassner, James D., Methods and apparatus for sealing a slit valve door.
    상세보기
  17. Kurita, Shinichi; Anwar, Suhail; Lee, Jae-Chull, Multiple slot load lock chamber and method of operation.
    상세보기
  18. Kurita, Shinichi; Anwar, Suhail; Lee, Jae-Chull, Multiple slot load lock chamber and method of operation.
    상세보기
  19. van der Meulen, Peter, Semiconductor manufacturing systems.
    상세보기
  20. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
    상세보기
  21. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
    상세보기
  22. van der Meulen, Peter; Kiley, Christopher C.; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling transport.
    상세보기
  23. Borden, Peter G., Stacked load-lock apparatus and method for high throughput solar cell manufacturing.
    상세보기
  24. Kim, Sam Hyungsam; Lee, Jae-Chull; Sterling, William N.; Brown, Paul, Valve door with ball coupling.
    상세보기

관련 콘텐츠

섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로