초록 ▼

A hard laminated film wherein a layer A and a layer B having specific compositions are deposited alternately so that the compositions of layer A and layer B are different. The thickness of layer A per layer is twice or more the thickness of layer B per layer, the thickness of layer B per layer is 0.

A hard laminated film wherein a layer A and a layer B having specific compositions are deposited alternately so that the compositions of layer A and layer B are different. The thickness of layer A per layer is twice or more the thickness of layer B per layer, the thickness of layer B per layer is 0.5 nm or more, and the thickness of layer A per layer is 200 nm or less. Layer A has a cubic rock-salt crystal structure such as that of Ti, Cr, Al, V nitride, carbonitride or carbide, and layer B is a hard film having a crystal structure other than cubic such as that of BN, BCN, SiN, SiC, SiCN, B--C, Cu, CuN, CuCN or metallic Cu. Alternatively, layer A has a chemical composition satisfying the following formula (1), and layer B has a chemical composition satisfying the following formula (2). Layer A: Cr(BaCbN1-a-b-cOc) description="In-line Formulae" end="lead"0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, 0.2≦e≦1.1 (1)description="In-line Formulae" end="tail" Layer B: B1-s-tCsNt description="In-line Formulae" end="lead"0≦s 0.25, (1-s-t)/t≦1.5 (2)description="In-line Formulae" end="tail" Alternatively, Layer A has a specific atomic ratio composition of (Ti1-x-yAlxMy)(BaCbN 1-a-b-cOc) and Layer B has one or more specific atomic ratio compositions selected from among the compositions B1-x-yCxNy, Si1-x-yCxNy, C1-xNx, Cu1-y(CxN1-x)y. Alternatively, Layer A has one of the following Compositional Formulae 1 or 2. Formula 1: (Ti1-x-yAlxMy), (BaCbN1-a-b-cOc), Formula 2: (Cr1-αXα)(BaCbN1-a-b-cO c)e (X is one or more metal elements selected from among Ti, Zr, Hf, V, Nb, Ta, Mo, W, Al, Si. Layer B has the following compositional formula 3. Formula 3: M(BaCbN1-a-b-cOc). M is one or more metal elements selected from among W, Mo, V, Nb.

대표청구항 ▼

What is claimed is: 1. A hard laminated film comprising a layer A and a layer B of specific compositions deposited alternately, wherein the crystal structure of layer A differs from the crystal structure of layer B, the thickness of layer A per layer is two or more times that of layer B per layer,

What is claimed is: 1. A hard laminated film comprising a layer A and a layer B of specific compositions deposited alternately, wherein the crystal structure of layer A differs from the crystal structure of layer B, the thickness of layer A per layer is two or more times that of layer B per layer, the thickness of layer B per layer is 0.5 nm or more, and the thickness of layer A per layer is 200 nm or less, wherein said layer A and said layer B have the compositions shown below: Layer A: (Cr1-αXα)(BaCbN1-a-b-c Oc)e wherein, X is one, two or more elements selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Mo, W, Al and Si, and 0≦α≦0.9, 0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, 0.2≦e≦1.1 (α is the atomic ratio of X, and a, b, c are respectively the atomic ratios of B, C, O,). Layer B: B1-s-tCsNt wherein, 0≦s≦0.25, (1-s-t)/t≦1.5 (s, t are respectively the atomic ratios of C and N,). or, Si1-x-yCxNy wherein, 01-uNu wherein 0≦u≦0.6 (u is the atomic ratio of N). 2. The hard laminated film according to claim 1, wherein α is 0. 3. The hard laminated film according to claim 1, wherein α is 0.05 or more. 4. The hard laminated film according to claim 1, wherein at least one of the half-value widths of the diffraction lines from the (111) plane and the (200) plane observed by an X-ray diffraction pattern obtained by the θ-2θ method using the CuKα line, is 0.30째 or more. 5. A hard laminated film comprising a layer A and a layer B of specific compositions deposited alternately, wherein the crystal structure of layer A differs from the crystal structure of layer B, the thickness of layer A per layer is two or more times that of layer B per layer, the thickness of layer B per layer is 0.5 nm or more, and the thickness of layer A per layer is 200 nm or less wherein: said layer A has the composition of Formula 1: (Ti1-x-yAlxMy)(BaCb N1-a-b-cOc) [wherein x, y, a, b, c are respectively atomic ratios, 0.4≦x≦0.8, 0≦y≦0.6, 0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, and M is one or more metal elements selected from the group consisting of 4A, 5A, 6A and Si, and said layer B has a composition selected from the group consisting of: Formula 2: B1-x-yCxNy [wherein x, y are respectively atomic ratios, 0≦x≦0.25 and B/N≦1.5], Formula 3: Si1-x-yCxNy [wherein x, y are respectively atomic ratios 0≦x≦0.25 and 0.5≦Si/N≦2.0], Formula 4: C1-xNx [wherein, x is an atomic ratio and 0≦x≦0.6], Formula 5: Cu1-y(CxN1-x)y [wherein x, y are respectively atomic ratios 0≦x≦0.1 and 0≦y≦0.5]. 6. The hard laminated film according to claim 5, wherein said layer A has the composition (Ti1-x-yAlxMy)(BaCbN 1-a-b-cOc), [wherein, x, y, a, b, c are respectively atomic ratios, 0.5≦x≦0.8, 0.05≦y≦0.6, 0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, and M is one or more metal elements selected from the group consisting of Cr, V, and Si. 7. A hard laminated film comprising a layer A and a layer B of specific compositions deposited alternately, wherein the crystal structure of layer A differs from the crystal structure of layer B, the thickness of layer A per layer is two or more times that of layer B per layer, the thickness of layer B per layer is 0.5 nm or more, and the thickness of layer A per layer is 200 nm or less, wherein the layer A and layer B having specific compositions are deposited alternately so that the compositions of adjacent layers differ, wherein: layer A has a composition corresponding to one of the following formulae: Formula 1: (Ti1-x-yAlxMy)(BaCbN 1-a-b-cOc) [wherein, x, y, a, b, c are respectively atomic ratios, 0.4≦x≦0.8, 0≦y≦0.6, 0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, and M is one or more metal elements selected from the group consisting of 4A, 5A, 6A and Si, Formula 2: Cr1-αXα)(BaCbN1-a-b-c Oc)e [wherein, α, a, b, c, e are respectively atomic ratios 0≦α≦0.9, 0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, 0.2≦e≦1.1, and X is one or more metal elements selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Mo W, Al and Si, and layer B has the composition of the following Formula 3: Formula 3: M1-dM1d(BaCbN1-a-b-cOc ) [wherein, M is one or more metal elements selected from the group consisting of W, Mo, V and Nb; M1 is one or more metal elements selected from the group consisting of 4A, 5A, 6A, and Si excluding W, Mo, V, and Nb; a, b, c, d are respectively atomic ratios, and 0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, 0≦d≦0.3]. 8. The hard laminated film according to claim 7, wherein: said layer A is represented by (Ti1-x-yAlxMy)(BaCbN 1-a-b-cOc) [wherein, x, y, a, b, c are respectively atomic ratios 0.5≦x≦0.8, 0.05≦y≦0.6, 0≦a≦0.15, 0≦b≦0.3, 0≦c≦0.1, and M is one or more metal elements selected from the group consisting of Cr, V, and Si]. 9. The hard laminated film according to claim 7, wherein, in said layer B, d=0. 10. The hard laminated film according to claim 7, wherein, in said layer B, M is V.