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Method and vessel for the delivery of precursor materials 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F17D-001/00
출원번호 US-0902778 (2004-08-02)
등록번호 US-7261118 (2007-08-28)
발명자 / 주소
  • Birtcher,Charles Michael
  • Dunning,Richard J.
  • Clark,Robert Daniel
  • Hochberg,Arthur Kenneth
  • Steidl,Thomas Andrew
출원인 / 주소
  • Air Products and Chemicals, Inc.
인용정보 피인용 횟수 : 15  인용 특허 : 25

초록

Vessel and method for the production and delivery of a precursor-containing fluid stream comprising the gaseous phase of a precursor material are disclosed herein. In one aspect, there is provided an vessel comprising: an interior volume wherein the interior volume is segmented into an upper volume

대표청구항

We claim: 1. A vessel for conveying a precursor-containing fluid stream from a precursor material, the vessel comprising: an interior volume wherein the interior volume is segmented into an upper volume and a lower volume wherein the upper volume and the lower volume are in fluid communication; a l

이 특허에 인용된 특허 (25)

  1. Cooper Patrick R. ; Hallowell William C. ; Tracy Mark S. ; Progl Curtis ; Nguyen Minh H., Apparatus, method and system for thermal management of an electronic system having semiconductor devices.
  2. Grtner Georg (Aachen DEX) Janiel Peter (Wrselen DEX) Rau Hans (Aachen DEX), Arrangement for producing a gas flow which is enriched with the vapor of a low-volatile substance.
  3. Dae-sig Kim KR, Bubbler.
  4. Siegele Stephen H. (Campbell CA) Noah Craig M. (Mountain View CA) Gregg John N. (Marble Falls TX), Bulk containers for high purity chemical delivery systems.
  5. Kaizuka Takeshi,JPX ; Horiuchi Takashi,JPX ; Mizukami Masami,JPX ; Mochizuki Takashi,JPX ; Kawano Yumiko,JPX ; Yamasaki Hideaki,JPX, CVD apparatus and CVD method.
  6. Gregg, John N.; Harris, Gregory W.; Cook, Frank L.; Jackson, Robert M., Container chemical guard.
  7. Wang, Luping; Baum, Thomas H.; Xu, Chongying, Delivery systems for efficient vaporization of precursor source material.
  8. Sri Prakash Rangarajan ; John O'Grady, Dual fritted bubbler.
  9. Hiai Atsuhiko (Takaishi JPX) Wakimura Kazuo (Sennan JPX), Equipment and method for supply of organic metal compound.
  10. Ohsaki Hiromi,JPX ; Ishihara Toshinobu,JPX ; Kaneko Isao,JPX ; Sato Kouhei,JPX, Feeder of a solid organometallic compound.
  11. Smithers Matthew C. (Lewisville TX), Heat sink mounting apparatus.
  12. Budelman Gerald A., Heatsink with integrated blower for improved heat transfer.
  13. Witzman Matthew R. ; Bradley ; Jr. Richard A. ; Lantman Christopher W. ; Cox Eric R., Linear aperture deposition apparatus and coating process.
  14. Krafft Terry (Longmont CO), Method and apparatus for delivering gas.
  15. Sandhu Gurtej S. (Boise ID) Meikle Scott G. (Boise ID) Westmoreland Donald L. (Boise ID), Method and appartus for subliming precursors.
  16. Kajita Akihiro,JPX ; Kaneko Hisashi,JPX, Method of manufacturing semiconductor device.
  17. Yamane Akira (Kudamatsu JPX) Fujisawa Masao (Houfu JPX), Method of producing saturated vapor of solid metal organic compounds in the metal organic chemical vapor deposition meth.
  18. Jursich, Gregory M., Methods and apparatus for delivering high purity liquids with low vapor pressure.
  19. Zorich, Robert Sam; Roberts, David Allen; Voloshin, George Oleg, Multiple contents container assembly for ultrapure solvent purging.
  20. Pintchovski Faivel (Austin TX) Calvert Wilson D. (Round Rock TX), Process for fabricating semiconductor devices using a solid reactant source.
  21. Tom Glenn M. ; McManus James V., Process system with integrated gas storage and delivery unit.
  22. Bouchard Fred, Reagent supply vessel for chemical vapor deposition.
  23. Tom Glenn M. (New Milford CT), Valve block and container for semiconductor source reagent dispensing and/or purification.
  24. Atwell David R. (Boise ID) Westmoreland Donald L. (Boise ID), Vapor delivery system for solid precursors and method regarding same.
  25. Masayoshi Tarutani JP; Tsuyoshi Horikawa JP; Takaaki Kawahara JP; Mikio Yamamuka JP; Shigeru Matsuno JP; Takehiko Sato JP, Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby.

이 특허를 인용한 특허 (15)

  1. Cunning, Hugh; Williams, Graham; Odedra, Rajesh; Kanjolia, Ravi, Bubbler for the transportation of substances by a carrier gas.
  2. Xiao, Manchao; Pearlstein, Ronald Martin; Ho, Richard; Lei, Xinjian; Mayorga, Steven Gerard; Spence, Daniel P., Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process.
  3. Carlson, David K.; Sanchez, Errol Antonio C.; Choi, Kenric; Josephson, Marcel E.; Demars, Dennis, Compact ampoule thermal management system.
  4. Carlson, David K.; Sanchez, Errol Antonio C.; Choi, Kenric; Josephson, Marcel E.; Demars, Dennis; Cuvalci, Emre; Samir, Mehmet Tugrul, Compact ampoule thermal management system.
  5. Pearlstein, Ronald Martin; Spence, Daniel P., Compositions and methods using same for flowable oxide deposition.
  6. Arena, Chantal; Werkhoven, Christiaan, Gallium trichloride injection scheme.
  7. Arena, Chantal; Bertram, Jr., Ronald Thomas; Lindow, Ed; Werkhoven, Christiaan, Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the same.
  8. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  9. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  10. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  11. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  12. Gregg, John N.; Battle, Scott L.; Banton, Jeffrey I.; Naito, Donn K.; Laxman, Ravi K., Method and apparatus to help promote contact of gas with vaporized material.
  13. Kanjolia, Ravi; Platts, Chris; Nguyen, Nam; Wilkinson, Mark, Solid precursor delivery assemblies and related methods.
  14. Cleary, John M.; Arno, Jose I.; Hendrix, Bryan C.; Naito, Donn; Battle, Scott; Gregg, John N.; Wodjenski, Michael J.; Xu, Chongying, Solid precursor-based delivery of fluid utilizing controlled solids morphology.
  15. Birtcher, Charles Michael; Steidl, Thomas Andrew; Lei, Xinjian; Ivanov, Sergei Vladimirovich, Vessel with filter.
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