초록 ▼

A method of polishing an object is disclosed. In one embodiment, the method comprises the steps of creating a polishing zone within a magnetorheological fluid; determining the characteristics of the contact between the object and the polishing zone necessary to polish the object; controlling the con

A method of polishing an object is disclosed. In one embodiment, the method comprises the steps of creating a polishing zone within a magnetorheological fluid; determining the characteristics of the contact between the object and the polishing zone necessary to polish the object; controlling the consistency of the fluid in the polishing zone; bringing the object into contact with the polishing zone of the fluid; and moving at least one of said object and said fluid with respect to the other. Also disclosed is a polishing device. In one embodiment, the device comprises a magnetorheological fluid, a means for inducing a magnetic field, and a means for displacing the object to be polished or the means for inducing a magnetic field relative to one another

대표청구항 ▼

What is claimed is: 1. A method of shaping an object, comprising: positioning the object having a surface at a clearance from a surface adapted to carry a magnetorheological fluid; providing flow of magnetorheological fluid comprising a suspension of abrasive particles and magnetic particles in a

What is claimed is: 1. A method of shaping an object, comprising: positioning the object having a surface at a clearance from a surface adapted to carry a magnetorheological fluid; providing flow of magnetorheological fluid comprising a suspension of abrasive particles and magnetic particles in a liquid through the clearnce to replenish the magnetorheological fluid in the clearance with magnetorheological fluid not in the clearance; contacting the surface of the object with the magnetorheological fluid flowing through the clearance; applying a a magnetic field at the clearance; and shaping the surface of the object to a desired shape. 2. The method according to claim 1, wherein the object includes a semiconductor. 3. The method according to claim 1, wherein the object includes glass. 4. The method according to claim 1, wherein the object includes a ceramic. 5. The method according to claim 1, wherein a gradient of the magnetic field is perpendicular to an equi-intensity field line of the magnetic field in a region adjacent to the object. 6. The method according to claim 1, wherein applying the magnetic field changes a consistency of the magnetorheological fluid in a region of the surface of the object. 7. The method of claim 1, wherein the surface adapted to carry a magnetorheological fluid is the surface of a vessel and the flow of magnetorheological fluid is provided by motion of the vessel. 8. The method of claim 1, wherein only a portion of the surface of the object is shaped. 9. The method of claim 1, wherein the magnetic field is continuously applied at the clearance. 10. A method for shaping a surface of an object, comprising: positioning the object having a surface at a clearance from a surface adapted to carry a magnetorheological fluid; providing flow of magnetorheological fluid comprising a suspension of abrasive particles and magnetic particles in a liquid through the clearnce to replenish the magnetorheological fluid in the clearance with magnetorheological fluid not in the clearance; contacting the surface of the object with the magnetorheological fluid flowing through the clearance; applying a magnetic field at the clearance; and shaping the plurality of opposing surfaces to a desired shape. 11. The method according to claim 10, wherein the object includes a semiconductor. 12. The method according to claim 10, wherein the object includes glass. 13. The method according to claim 10, wherein the object includes a ceramic. 14. The method according to claim 10, wherein a gradient of the magnetic field is perpendicular to an equi-intensity field line of the magnetic field in a region adjacent to the object. 15. The method according to claim 8, wherein applying the magnetic field changes a consistency of the magnetorheological fluid in a region of the plurality of opposing surfaces. 16. The method of claim 10, wherein the surface adapted to carry a magnetorheological fluid is the surface of a vessel and the flow of magnetorheological fluid is provided by motion of the vessel. 17. The method of claim 10, wherein only a portion of the plurality of opposing surfaces are shaped. 18. The method of claim 10, wherein the magnetic field is continuously applied at the clearance. 19. A method for treating an object using an abrasive, comprising: positioning the object at a clearance from a surface adapted to carry a magnetorheological fluid; providing flow of magnetorheological fluid comprising a suspension of abrasive particles and magnetic particles in a liquid through the clearance to replenish the magnetorheological fluid in the clearance with magnetorheological fluid not in the clearance; contacting a surface of the object with a magnetorheological fluid flowing through the clearance; applying a magnetic field at the clearance; and shaping the surface of the object to a desired shape. 20. The method according to claim 19, wherein the object includes a semiconductor. 21. The method according to claim 19, wherein the object includes glass. 22. The method according to claim 19, wherein the object includes a ceramic. 23. The method according to claim 19, wherein a gradient of the magnetic field is perpendicular to an equi-intensity field line of the magnetic field in a region adjacent to the object. 24. The method according to claim 19, wherein applying the magnetic field changes a consistency of the magnetorheological fluid in a region of the surface of the object. 25. The method of claim 19, wherein the surface adapted to carry a magnetorheological fluid is the surface of a vessel and the flow of magnetorheological fluid is provided by motion of the vessel. 26. The method of claim 19, wherein only a portion of the surface of the object is shaped. 27. The method of claim 19, wherein the magnetic field is continuously applied at the clearance. 28. A method of shaping an object, comprising: positioning a surface of the object at a clearance from a surface adapted to carry a magnetorheological fluid; providing flow of magnetorheological fluid comprising a suspension of abrasive particles and magnetic particles in a liquid through the clearance to replenish the magnetorheological fluid in the clearance with magnetorheological fluid not in the clearance; contacting a surface of the object with the magnetorheological fluid flowing through the clearance; applying a magnetic field at the clearance to provide a polishing zone moving at least one of the polishing zone of the polishing zone and the object with respect to the other of the polishing zone and the object; and varying a consistency of the magetorheological fluid in a region being where the fluid contacts the surface of the object. 29. The method according to claim 28, wherein the object includes a semiconductor. 30. The method according to claim 28, wherein the object includes glass. 31. The method according to claim 28, wherein the object includes a ceramic. 32. The method according to claim 28, wherein a gradient of the magnetic field is perpendicular to an equi-intensity field line of the magnetic field in a region adjacent to the object. 33. The method of claim 28, wherein the surface adapted to carry a magnetorheological fluid is the surface of a vessel and the flow of magnetorheological fluid is provided by motion of the vessel. 34. The method of claim 28, wherein the region contacts only a portion of the surface of the object. 35. The method of claim 28, wherein the magnetic field is continuously applied at the clearance. 36. A method of shaping an object, comprising: positioning the object in a mount so that a surface of the object is at a clearance from a surface adapted to carry a magnetorheological fluid; providing flow of magnetorheological fluid comprising a suspension of abrasive particles and magnetic particles in a liquid through the clearance to replenish the magnetorheological fluid in the clearance with magnetorheological fluid not in the clearance; applying a magnetic field at the clearance to provide a polishing zone; contacting the surface of the object with the magnetorheological fluid flowing through the clearance; moving at least one of the object and the polishing zone with respect to the other of the object and the polishing zone; and removing material from the object. 37. The method according to claim 36, wherein the object includes a semiconductor. 38. The method according to claim 36, wherein the object includes glass. 39. The method according to claim 36, wherein the object includes a ceramic. 40. The method according to claim 36, wherein a gradient of the magnetic field is perpendicular to an equi-intensity field line of the magnetic field in a region adjacent to the object. 41. The method according to claim 36, wherein applying the magnetic field changes a consistency of the magnetorheological fluid in a region of the surface of the clearance; contacting the object with the magnetorheological fluid flowing through the clearance; applying a nagmetic field at the clearance; and shaping the plurality of opposing surfaces to a desired shape. 42. The method of claim 36, wherein the surface adapted to carry a magnetorheological fluid is the surface of a vessel and the flow of magnetorheological fluid is provided by motion of the vessel. 43. The method of claim 36, wherein only a portion of the surface of the object is contacted with the polishing zone. 44. The method of claim 36, wherein the magnetic field is continuously applied at the clearance. 45. A shaping device, comprising: an arrangement for positioning an object to be shaped at a clearance from a surface adapted to carry a shaping fluid; a plurality of lines for delivering a flow of the shaping fluid comprising a suspension of abrasive particles and magnetic particles in a liquid through the clearance to replenish the shaping fluid in the clearance with shaping fluid not in the clearance; an arrangement for contacting the object to be shaped with the shaping fluid, the arrangement for contacting adapted to allow the object to move slidably and rotatably; an arrangement for moving at least one of the shaping fluid and the object with respect to the other of the shaping fluid and the object; and an arrangement for varying a consistency of the shaping fluid in a region containing the object. 46. The device according to claim 45, wherein the object includes a semiconductor. 47. The device according to claim 45, wherein the object includes glass. 48. The device according to claim 45, wherein the object includes a ceramic. 49. The device according to claim 45, further comprising: an arrangement for exposing the shaping fluid to a magnetic field; wherein a gradient of the magnetic field is perpendicular to an equi-intensity field line of the magnetic field in a region adjacent to the object. 50. The method of claim 45, wherein the surface adapted to carry a shaping fluid is the surface of a vessel and the flow of shaping fluid is provided by motion of the vessel. 51. The method of claim 45, wherein only a portion of the surface of the object is shaped. 52. The method of claim 45, wherein the magnetic field is continuously applied at the clearance. 53. A shaping device, comprising: a mount for receiving an object to be shaped, the mount adapted to position the object so that a surface of the object is at a clearance from a surface adapted to carry a magnetorheological fluid comprising a suspension of abrasive particles and magnetic particles in a liquid; an arrangement for providing flow of the magnetorheological fluid through the clearance to replenish the magnetorheological fluid in the clearance with magnetorheological fluid not in the clearance so that the surface of the object contacts the magnetorheological fluid flowing through the clearance; and a magnet for applying a magnetic field at the clearance to provide a polishing zone. 54. The device according to claim 53, wherein the object includes a semiconductor. 55. The device according to claim 53, wherein the object includes glass. 56. The device according to claim 53, wherein the object includes a ceramic. 57. The device according to claim 53, wherein a gradient of a magnetic field produced by the magnet is perpendicular to an equi-intensity field line of the magentic field in a region adjacent to the object. 58. The shaping device according to claim 53, further comprising an arrangement for moving at least one of the polishing zone and the mount with respect to the other of the polishing zone and the mount. 59. The shaping device according to claim 53, wherein applying the magnetic field varies a consistency of the magnetorheological fluid in a region, the region being where the fluid contacts the surface of the object. 60. The method of claim 53, wherein the surface adapted to carry a magnetorheological fluid is the surface of a vessel and the flow of magnetorheological fluid is provided by motion of the vessel. 61. The method of claim 53, wherein the polishing zone contacts only a portion of the surface of the object. 62. The method of claim 53, wherein the magnetic field is continuously applied at the clearance.