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Process and apparatus for treating a workpiece using ozone

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-005/00
출원번호 US-0859668 (2004-06-03)
등록번호 US-7264680 (2007-09-04)
발명자 / 주소
  • Gebhart,Thomas Maximilia
  • Bergman,Eric J.
출원인 / 주소
  • Semitool, Inc.
대리인 / 주소
    Perkins Coie LLP
인용정보 피인용 횟수 : 12  인용 특허 : 75

초록

A method for cleaning a semiconductor workpiece having a metal layer in a processing chamber includes the steps of introducing a liquid solution including dissolved carbon dioxide onto the workpiece, and introducing ozone into the processing chamber. The ozone oxidizes contaminants on the workpiece,

대표청구항

What is claimed is: 1. A method for cleaning a semiconductor workpiece having one or more metal areas, comprising the steps of: placing the semiconductor workpiece into a processing chamber; spinning the semiconductor workpiece; introducing an aqueous liquid solution onto the semiconductor workpiec

이 특허에 인용된 특허 (75)

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  30. Omi Tadahiro (Miyagi JPX) Shimada Makoto (Tokyo JPX) Sawamoto Isao (Kanagawa JPX), Method and apparatus for sterilization of and treatment with ozonized water.
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  47. Tanaka Masato (Shiga JPX), Method of treating surface of rotating wafer using surface treating gas.
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  51. Sawamoto Isao (Kanagawa JPX), Ozone water treatment method and apparatus.
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  61. Berfield Robert C., Pump having sealless shaft.
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  66. Kamikawa Yuji,JPX ; Kitahara Shigenori,JPX ; Ueno Kinya,JPX, Substrate processing apparatus and substrate processing method.
  67. Ueyama Tsutomu,JPX ; Izumi Akira,JPX ; Adachi Hideki,JPX, Substrate spin treating apparatus.
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  69. Dobson Jesse C. (Oakland CA), Sulfuric acid reprocessor.
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  71. Liu Benjamin Y. H. (North Oaks MN) Ahn Kang H. (Minneapolis MN), System for surface and fluid cleaning.
  72. Nelson Steven L. ; Christenson Kurt K., System to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in.
  73. Kurokawa Hideaki (Hitachi JPX) Ebara Katsuya (Mito JPX) Takahashi Sankichi (Hitachi JPX) Matsuzaki Harumi (Hitachi JPX) Yoda Hiroaki (Tsuchiura JPX) Nitta Takahisa (Fuchu JPX) kouchi Isao (Hitachi JP, Vapor washing process and apparatus.
  74. Miyazaki Takeshiro,JPX ; Tsubata Yoshikazu,JPX ; Kawakita Akio,JPX ; Katsumata Noboru,JPX ; Nakayama Akihiro,JPX ; Harada Toyokazu,JPX ; Takaku Mitsuo,JPX ; Yoshida Syunso,JPX, Wafer processing system.
  75. Tuunanen Jukka (Helsinki FIX) Narvanen Ale (Helsinki FIX) Geysen Mario (Clayton AUX), Washing device.

이 특허를 인용한 특허 (12)

  1. Lynn, Daniel W., Aqueous ozone solution for ozone cleaning system.
  2. Burnett, Daniel Rogers; Hall, Gregory; Hermanson, Christopher; Rajguru, Amit, Automated therapy system and method.
  3. Burnett, Daniel Rogers; Hall, Gregory W., Hypothermia devices and methods.
  4. Burnett, Daniel R.; Reynolds, Byron; Neil, Brian M.; Hall, Gregory W.; Guerra, Paul B., Method and apparatus for pressure measurement.
  5. Burnett, Daniel Rogers; Reynolds, Byron; Neil, Brian M.; Hall, Gregory W.; Guerra, Paul B., Method and apparatus for pressure measurement.
  6. Wada, Keiji; Masuda, Takeyoshi; Miyazaki, Tomihito; Hiyoshi, Toru; Itoh, Satomi; Shiomi, Hiromu, Method of cleaning silicon carbide semiconductor.
  7. Lynn, Daniel W., Ozonated liquid dispensing unit.
  8. Lynn, Daniel W., Ozonated liquid dispensing unit.
  9. Lynn, Daniel W., Ozone cleaning system.
  10. Rosko, Michael Scot; Jonte, Patrick B.; DeVries, Adam M.; Thomas, Kurt J.; Sawaski, Joel D., Ozone distribution in a faucet.
  11. Lynn, Daniel W., Reaction vessel for an ozone cleaning system.
  12. Liu, Zhi (Lewis); Kashkoush, Ismail; Lee, Hanjoo, Systems and methods for drying a rotating substrate.
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