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Apparatus for forming a polishing pad having a reduced striations 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01F-013/02
  • B01F-013/00
출원번호 US-0956844 (2004-09-30)
등록번호 US-7275856 (2007-10-02)
발명자 / 주소
  • Koetas,Joseph P.
  • Leviton,Alan E.
  • Norton,Kari Ell
  • November,Samuel J.
  • Robertson,Malcolm W.
  • Saikin,Alan H.
출원인 / 주소
  • Rohm and Haas Electronic Materials CMP Holdings, Inc.
인용정보 피인용 횟수 : 11  인용 특허 : 20

초록

The present invention provides an apparatus 20 for forming a striation-reduced chemical mechanical polishing pad 4. The polishing pad 4 comprises a first delivery line 66 for delivering a polymeric material 52 into a mixer 68 and a second delivery line 44 for delivering microspheres 48 into the mix

대표청구항

What is claimed is: 1. An apparatus for forming a striation-reduced chemical mechanical polishing pad, comprising: a first delivery line for delivering a polymeric material into a mixer; a second delivery line for delivering microspheres having an initial bulk density into the mixer with the polyme

이 특허에 인용된 특허 (20)

  1. Schmidt, Uwe; Stahler, Dirk, Agitator assembly.
  2. Sall, Daniel Jon; Toth, John Eldon; Takeuchi, Kumiko; Kohn, Todd Johnathan; Bastian, Jolie Anne, Antithrombotic agents.
  3. Reh Lothar (Zumikon CHX) Tesch Marc (Forch CHX) Hani Beat (Zuzwil CHX) Ruf Arthur (Schwerzenbach CHX) Meili Thomas (Zurich CHX) Goedicke Frank (Niederhelfenschwil CHX), Apparatus and method for dosing.
  4. Reh Lothar (Zumikon CHX) Tesch Marc (Forch CHX) Hni Beat (Zuzwil CHX) Ruf Arthur (Schwerzenbach CHX), Apparatus and method for dosing a particulate phase present in a gas/particle flow from a fluidized bed.
  5. Paul Kermit D. (Bethlehem PA) Bartholomew Leslie C. (Bethlehem PA) Szazdi ; Jr. John S. (Bethlehem PA) Labelle Gerald J. (Allentown PA), Blender for particulate material.
  6. Paul Kermit D. (Bethlehem PA), Blender with feed rate control.
  7. Lombardo, Brian, Foam semiconductor polishing belts and pads.
  8. Duescher Wayne O., Lapping apparatus and method for high speed lapping with a rotatable abrasive platen.
  9. Hans-Werner Schmidt DE; Martin Rahn DE; Horst Heisswolf DE; Marc Schnell DE; Bernd Erkes DE, Method of adjusting a circulating fluidized bed and use of the method.
  10. Shen James ; Costas Wesley D., Method of polishing.
  11. Kihara, Katushi; Mochizuki, Yoshimi, Methods for making urethane molded products for polishing pads.
  12. Okamoto Yukimichi (Hyogo JPX) Kikuchi Masahiko (Hyogo JPX) Takata Kazutaka (Hyogo JPX) Ito Hisayoshi (Hyogo JPX), Mixing apparatus and bottom ribbon blade used therein.
  13. Morimoto Kiyoshi,JPX ; Watanabe Yasushi,JPX ; Sanada Yoshika,JPX ; Tokuno Sanji,JPX ; Murata Kazue,JPX, Mixing method of powdered or granular material utilizing pulsating vibration air.
  14. Krauss, Werner; Vogt, Heinrich, Mixing silo for pneumatically homogenizing fine-grained or dust-like material.
  15. Shiro, Kuniyasu; Hashisaka, Kazuhiko; Oka, Tetsuo, Polishing pad.
  16. Kuniyasu Shiro JP; Hisashi Minamiguchi JP; Tetsuo Oka JP, Polishing pad and polishing device.
  17. Cook Lee M. (Steelville PA) Roberts John V. H. (Newark DE) Jenkins Charles W. (Newark DE) Pillai Raj R. (Newark DE), Polishing pads and methods for their use.
  18. Roberts John V. H. ; James David B. ; Cook Lee Melbourne, Polishing pads and methods relating thereto.
  19. David B. James ; Arun Vishwanathan ; Lee Melbourne Cook ; Peter A. Burke ; David Shidner, Polishing pads for chemical mechanical planarization.
  20. Reinhardt Heinz F. (Chadds Ford PA) Roberts John V. H. (Newark DE) McClain Harry G. (Middletown DE) Budinger William D. (Newark DE) Jensen Elmer W. (New Castle DE), Polymeric polishing pad containing hollow polymeric microelements.

이 특허를 인용한 특허 (11)

  1. James, David B.; Roberts, John V. H., Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad.
  2. Schwaegerl, Juergen; Sollfrank, Peter, Drill bit and method for manufacturing.
  3. Schwagerl, Jurgen, Drilling tool.
  4. James,David B.; Kulp,Mary Jo; Roberts,John V. H., Method for forming a porous polishing pad.
  5. James,David B.; Roberts,John V. H., Method for forming a porous reaction injection molded chemical mechanical polishing pad.
  6. Saikin, Alan H., Method of forming a chemical mechanical polishing pad utilizing laser sintering.
  7. Koetas,Joseph P.; Leviton,Alan E.; Norton,Kari Ell; November,Samuel J.; Robertson,Malcolm W.; Saikin,Alan H., Method of forming a polishing pad having reduced striations.
  8. Kolesar, David; Sarafinas, Aaron; Saikin, Alan; Post, Robert L., Method of manufacturing chemical mechanical polishing layers.
  9. McClain, George; Saikin, Alan; Kolesar, David; Sarafinas, Aaron; Post, Robert L., Method of manufacturing chemical mechanical polishing layers.
  10. Esbenshade, John; Geiger, Andrew M; Libbers, Paul; November, Samuel J; Sacchetti, Paul J; Tracy, Jonathan; Verbaro, David; Watkins, Michael E, Mix head assembly for forming chemical mechanical polishing pads.
  11. Greller, Gerhard; Reif, Oscar-Werner, Vibrational mixer.
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