IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0514915
(2003-05-16)
|
등록번호 |
US-7285216
(2007-10-23)
|
우선권정보 |
ZA-2002/3970(2002-05-17) |
국제출원번호 |
PCT/IB03/001898
(2003-05-16)
|
§371/§102 date |
20051115
(20051115)
|
국제공개번호 |
WO03/097541
(2003-11-27)
|
발명자
/ 주소 |
- Rose,Peter Dale
- Rein,Neil Berthold
|
출원인 / 주소 |
- Water Research Commission
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
1 인용 특허 :
2 |
초록
▼
A process for treating sulphide-containing water includes maintaining a steep redox potential gradient in an interface zone of the sulphide-containing water. The water is exposed to an oxygen-containing environment, and the interface zone is located immediately below the surface of the water. Sulphi
A process for treating sulphide-containing water includes maintaining a steep redox potential gradient in an interface zone of the sulphide-containing water. The water is exposed to an oxygen-containing environment, and the interface zone is located immediately below the surface of the water. Sulphide in the water is biologically oxidized, in the interface zone, to sulphur. The sulphur may be removed by settling, thereby achieving a final removal of sulphur compounds.
대표청구항
▼
The invention claimed is: 1. A process for treating sulphide-containing water, which process includes maintaining, in the sulphide-containing water, a redox potential gradient across an interface zone between oxidized surface water and substantially non-oxidized water below the interface zone, with
The invention claimed is: 1. A process for treating sulphide-containing water, which process includes maintaining, in the sulphide-containing water, a redox potential gradient across an interface zone between oxidized surface water and substantially non-oxidized water below the interface zone, with the water being exposed to the atmosphere which provides an oxygen-containing environment and with the interface zone being located below the surface of the water; and biologically oxidizing, in the interface zone, sulphides in the water to sulphur. 2. A process according to claim 1, wherein the interface zone is less than 1 cm deep. 3. A process according to claim 1, wherein the redox potential gradient in the interface zone is between +100 mV and-200 mV. 4. A process according to claim 3, wherein the redox potential gradient in the interface zone is about-150 mV. 5. A process according to claim 1, wherein the biological oxidation of the sulphides to sulphur in the interface zone is effected by means of sulphur producing bacteria, with a sulphur biofilm comprising the sulphur producing bacteria and the sulphur forming on the surface of the water. 6. A process according to claim 5, wherein the sulphide-containing water also contains organic material which assists in bacterial growth and in creating redox potential conditions required for bacterial sulphur formation. 7. A process according to claim 6, which includes feeding the sulphide-containing water into a reaction zone that is exposed to the atmosphere which thus provides the oxygen-containing environment; allowing the water to pass along the reaction zone, with the interface zone thus being at and/or near the surface of the water in the reaction zone; withdrawing the sulphur biofilm from the reaction zone; and withdrawing sulphide-depleted water from the reaction zone. 8. A process according to claim 7, wherein the reaction zone is provided by a reactor having a water inlet zone at which the sulphide-containing water is introduced into the reactor and a water outlet zone at which the sulphide-depleted water is withdrawn from the reactor, with the withdrawal of the sulphide-depleting water being effected by allowing it to pass over an upper edge of a water weir provided in the water outlet zone, and thereafter exiting the reactor. 9. A process according to claim 8, wherein the maintenance of the redox potential gradient in the interface zone includes controlling the depth of the reaction zone. 10. A process according to claim 9, wherein the depth of the reaction zone is controlled at between 25 mm and 400 mm. 11. A process according to claim 9, wherein the depth of the reaction zone is controlled by regulating the level of a floor of the reactor and/or by regulating the level of the water weir. 12. A process according to claim 8, wherein the maintenance of the redox potential gradient in the interface zone includes controlling the organic material content of the water and/or controlling the water flow rate into the reactor. 13. A process according to claim 8, wherein the maintenance of the redox potential gradient in the interface zone includes providing an aeration device in an upper region of the reaction zone at or in proximity to the water inlet zone. 14. A process according to claim 13, wherein the aeration device comprises at least one air-fed silicone tube located below the surface of the water. 15. A process according to claim 8, which includes pretreating the water before it is introduced into the reactor, to form polysulphides therein, which includes passing the water through a polysulphide production zone in which is located an aeration device, and thereafter introducing the pretreated water into the reactor. 16. A process according to claim 15, wherein the aeration device comprises at least one air-fed silicone tube located below the water surface in the polysulphide production zone. 17. A process according to claim 8, wherein the withdrawal of the sulphur biofilm is effected in a controlled manner. 18. A process according to claim 17, wherein the sulphur biofilm is withdrawn when it undergoes a texture change from flexible to brittle. 19. A process according to claim 17, wherein the amount of sulphur biofilm that is withdrawn is such that at least 35% of the water surface is still covered by residual sulphur biofilm. 20. A process according to claim 17, wherein the withdrawal of the sulphur biofilm is effected by allowing it to pass over an upper edge of a sulphur biofilm weir into a collection zone, from which it is withdrawn, with the upper edge of the sulphur biofilm weir being located at a higher level than the upper edge of the water weir. 21. A process according to claim 20, which includes providing a baffle between the sulphur biofilm weir and the water weir, to inhibit or prevent passage of the sulphur biofilm over the water weir. 22. A process according to claim 5, which includes feeding the sulphide containing water along a silicone tube, with the oxygen-containing environment being provided by the atmosphere around the outside of the tube and with the redox potential gradient being maintained across the tube wall so that the sulphur biofilm attaches to the inside of the silicone tube wall. 23. A process for treating sulphide-containing water, which process includes maintaining a redox potential gradient in an interface zone of the sulphide-containing water, with the water being exposed to the atmosphere which provides an oxygen-containing environment, and with the interface zone being located below the surface of the water; biologically oxidizing, in the interface zone, sulphides in the water to sulphur; allowing a biofilm containing the sulphur to form on the surface of the water above the interface zone; and withdrawing the sulphur biofilm. 24. A process for treating sulphide-and organic material-containing water, which process includes introducing the sulphide-and organic material-containing water into a water inlet zone of a reactor providing a reaction zone that is exposed to the atmosphere which thus provides an oxygen-containing environment; allowing the water to pass along the reaction zone; controlling the depth of the reaction zone at between 25 mm and 400 mm, thereby maintaining a redox potential gradient in an interface zone at and/or near the surface of the water in the reaction zone; biologically oxidizing, in the interface zone, sulphides in the water to sulphur by means of sulphur producing bacteria, with a sulphur biofilm comprising the sulphur producing bacterial and the sulphur forming on the surface of the water, and with the organic material in the water assisting in bacterial growth and in creating redox potential conditions required for bacterial sulphur formation; withdrawing the sulphur biofilm from the reaction zone; and withdrawing sulphide-depleted water from a water outlet zone of the reactor by allowing it to pass over an upper edge of a water weir provided in the water outlet zone, and thereafter exiting the reactor.
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