Microelectromechanical systems, and devices having thin film encapsulated mechanical structures
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01L-027/14
H01L-029/82
H01L-029/66
H01L-029/84
출원번호
US-0323920
(2005-12-30)
등록번호
US-7288824
(2007-10-30)
발명자
/ 주소
Partridge,Aaron
Lutz,Markus
Kronmueller,Silvia
출원인 / 주소
Robert Bosch GmbH
대리인 / 주소
Kenyon & Kenyon LLP
인용정보
피인용 횟수 :
10인용 특허 :
189
초록▼
There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a MEMS device, and technique of fabricating or manufacturing a MEMS device, having mechanical structures encapsulated in a chamber prior to final packaging. The material that encapsulates
There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a MEMS device, and technique of fabricating or manufacturing a MEMS device, having mechanical structures encapsulated in a chamber prior to final packaging. The material that encapsulates the mechanical structures, when deposited, includes one or more of the following attributes: low tensile stress, good step coverage, maintains its integrity when subjected to subsequent processing, does not significantly and/or adversely impact the performance characteristics of the mechanical structures in the chamber (if coated with the material during deposition), and/or facilitates integration with high-performance integrated circuits. In one embodiment, the material that encapsulates the mechanical structures is, for example, silicon (polycrystalline, amorphous or porous, whether doped or undoped), silicon carbide, silicon-germanium, germanium, or gallium-arsenide.
대표청구항▼
What is claimed is: 1. A microelectromechanical device comprising: a chamber; a first layer; a first encapsulation layer comprising a permeable material, wherein first encapsulation layer forms at least a portion of a wall of the chamber; a micromechanical structure, wherein: (1) at least a portion
What is claimed is: 1. A microelectromechanical device comprising: a chamber; a first layer; a first encapsulation layer comprising a permeable material, wherein first encapsulation layer forms at least a portion of a wall of the chamber; a micromechanical structure, wherein: (1) at least a portion of the micromechanical structure is formed in and/or from the first layer, and (2) at least a portion of the micromechanical structure is disposed in the chamber; a second encapsulation layer, disposed on the first encapsulation layer to seal the chamber, wherein the second encapsulation layer is a semiconductor material and wherein the first and second encapsulation layers are different from the first layer; and a field region disposed outside and above the chamber, wherein: the field region includes monocrystalline silicon; the first encapsulation layer is a semiconductor material; a first portion of the first encapsulation layer includes monocrystalline silicon and a second portion of the first encapsulation layer includes a porous or amorphous silicon; the second portion of the first encapsulation layer is a portion of the wall of the chamber; a portion of the second encapsulation layer that is on the second portion of the first encapsulation layer includes polycrystalline silicon. 2. A microelectromechanical device comprising: a chamber; a first layer; a first encapsulation layer comprising a permeable material, wherein first encapsulation layer forms at least a portion of a wall of the chamber; a micromechanical structure, wherein: (1) at least a portion of the micromechanical structure is formed in and/or from the first layer, and (2) at least a portion of the micromechanical structure is disposed in the chamber; a second encapsulation layer, disposed on the first encapsulation layer to seal the chamber, wherein the second encapsulation layer is a semiconductor material and wherein the first and second encapsulation layers are different from the first layer; a contact which is at least partially disposed outside the chamber; and an insulation layer disposed on at least a portion of the second encapsulation layer, wherein the insulation layer includes an opening over the contact and wherein the microelectromechanical device further includes a highly electrically conductive layer that is disposed in the opening and on the contact and on at least a portion of the insulation layer. 3. A microelectromechanical device comprising: a chamber; a first layer; a first encapsulation layer comprising a permeable material, wherein first encapsulation layer forms at least a portion of a wall of the chamber; a micromechanical structure, wherein: (1) at least a portion of the micromechanical structure is formed in and/or from the first layer, and (2) at least a portion of the micromechanical structure is disposed in the chamber; a second encapsulation layer, disposed on the first encapsulation layer to seal the chamber, wherein the second encapsulation layer is a semiconductor material and wherein the first and second encapsulation layers are different from the first layer; a contact which is at least partially disposed outside the chamber, wherein the contact includes a semiconductor material that is doped with an impurity to increase the electrical conductivity of the contact; an insulation layer disposed on the second encapsulation layer; and a third encapsulation layer disposed on the second encapsulation layer, wherein: the first encapsulation layer includes a plurality of vents formed therein and a porous polycrystalline silicon or amorphous silicon; the second encapsulation layer is disposed in the plurality of vents to seal the chamber and includes polycrystalline silicon, silicon carbide, silicon/germanium, germanium, and/or gallium arsenide; and the third encapsulation layer includes an insulating material. 4. A microelectromechanical device comprising: a chamber; a first layer; a first encapsulation layer comprising a permeable material, wherein first encapsulation layer forms at least a portion of a wall of the chamber and includes at least one vent; a micromechanical structure, wherein: (1) at least a portion of the micromechanical structure is formed in and/or from the first layer, and (2) at least a portion of the micromechanical structure is disposed in the chamber; a second encapsulation layer, disposed on the first encapsulation layer to seal the chamber, wherein the second encapsulation layer is a semiconductor material and wherein the first and second encapsulation layers are different from the first layer; a contact which is at least partially disposed outside the chamber; an insulation layer disposed on at least the second encapsulation layer that is disposed in and/or on the at least one vent, wherein the insulation layer includes an opening over the contact; and a highly electrically conductive layer that is disposed in the opening and on: (i) the contact and (ii) at least a portion of the insulation layer; wherein the second encapsulation layer includes polycrystalline silicon.
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