$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C25F-003/12
  • C25F-003/00
  • C25B-009/12
출원번호 US-0367100 (2003-02-14)
등록번호 US-7294244 (2007-11-13)
발명자 / 주소
  • Oberlitner,Thomas H.
  • Hanson,Kyle M.
출원인 / 주소
  • Semitool, Inc.
대리인 / 주소
    Perkins Coie LLP
인용정보 피인용 횟수 : 10  인용 특허 : 46

초록

An integrated tool is provided including at least one workpiece processing station having a paddle assembly. In accordance with another independent aspect of the present invention, the workpiece processing station is adapted for adjusting the level of the processing fluid relative to a workpiece, wh

대표청구항

What is claimed is: 1. An apparatus for processing a microelectronic workpiece, comprising: a vessel configured to support a processing liquid; a head assembly positioned proximate to the vessel and configured to support a microelectronic workpiece for processing at a process location of the vessel

이 특허에 인용된 특허 (46)

  1. Hurwitt Steven ; Jelinek Vaclav, Apparatus and method for clamping a substrate.
  2. Kaufman Robert ; Downes Gary C. ; Gramarossa Daniel J., Apparatus and method for plating wafers, substrates and other articles.
  3. Datta Madhav ; Edelstein Daniel Charles ; Uzoh Cyprian Emeka, Apparatus and method for the electrochemical etching of a wafer.
  4. Mathieu Gaetan L., Apparatus for controlling plating over a face of a substrate.
  5. Cheung Robin ; Sinha Ashok ; Tepman Avi ; Carl Dan, Apparatus for electro-chemical deposition with thermal anneal chamber.
  6. Katou Mariko (Tokyo JPX), Apparatus for metal plating.
  7. Hillinger Brad O. (3504-½Manhattan Ave. Manhattan Beach CA 90266), Composite structure.
  8. Fishkin Boris ; Sato Seiji ; Lowrance Robert B., Controlled environment enclosure and mechanical interface.
  9. Haydu Juan B. ; Too Elena H. ; Hurtubise Richard W., Copper metallization of silicon wafers using insoluble anodes.
  10. Yasuhiko Sakaki JP, Cup shaped plating apparatus with a disc shaped stirring device having an opening in the center thereof.
  11. Yasuhiko Sakaki JP, Cup type plating apparatus.
  12. May Hans J. (Ulmenweg 17 D-58638 Iserlohn DEX) Schnettler Roland (Schwerter Str. 138 D-58099 Hagen DEX), Device for the electrolytic deposition of metal on metal strips.
  13. Dordi, Yezdi; Olgado, Donald J.; Morad, Ratson; Hey, Peter; Denome, Mark; Sugarman, Michael; Lloyd, Mark; Stevens, Joseph; Marohl, Dan; Shin, Ho Seon; Ravinovich, Eugene; Cheung, Robin; Sinha, Ashok , Electro-chemical deposition system.
  14. Corbin ; Jr. William E. ; Datta Madhav ; Dinan Thomas E. ; Kern Frederick W., Electrochemical etching apparatus and method for spirally etching a workpiece.
  15. Shinogi Masataka (Tokyo JPX) Sakuhara Toshihiko (Tokyo JPX) Suda Masayuki (Tokyo JPX) Iwasaki Fumiharu (Tokyo JPX) Ando Akito (Tokyo JPX), Electrochemical fine processing apparatus.
  16. Datta Madhav (Yorktown Heights NY) O\Toole Terrence R. (Webster NY), Electrochemical metal removal technique for planarization of surfaces.
  17. Datta Madhav (Yorktown Heights NY) Romankiw Lubomyr T. (Briarcliff Manor NY), Electrochemical micromachining tool and process for through-mask patterning of thin metallic films supported by non-cond.
  18. Inoue Satoshi,JPX ; Tanaka Toyoaki,JPX, Electrode assembly, cathode device and plating apparatus including an insulating member covering an internal circumferential edge of a cathode member.
  19. Datta Madhav (Yorktown Heights NY) Shenoy Ravindra V. (Peekskill NY), Electroetching method and apparatus.
  20. Datta Madhav (Yorktown Heights NY) Shenoy Ravindra (Peekskill NY), Electroetching process for seed layer removal in electrochemical fabrication of wafers.
  21. Brophy Denis J. (Staatsburg NY) Datta Madhav (Yorktown Heights NY) Harris Derek B. (Dryden NY) Ryan Frank S. (Boulder CO) Spera Frank A. (Poughkeepsie NY), Electroetching tool using localized application of channelized flow of electrolyte.
  22. Reid Jonathan D. ; Taatjes Steven W. ; Contolini Robert J. ; Patton Evan E., Electroplating process including pre-wetting and rinsing.
  23. Uzoh Cyprian Emeka, Electroplating workpiece fixture having liquid gap spacer.
  24. Wytman Joe, High vacuum dual stage load lock and method for loading and unloading wafers using a high vacuum dual stage load lock.
  25. Dinan Thomas Edward, In-situ contact resistance measurement for electroprocessing.
  26. Dorumsgaard John A. (Arden Hills MN) Amerson Roger H. (Bloomington MN), Load/unload apparatus for disc-like workpieces.
  27. Schuster Virgil E. (Scottsdale) Asher ; Sr. Reginald K. (Scottsdale) Patel Bhagubhai D. (Tempe AZ), Method and apparatus for adjusting plating solution flow characteristics at substrate cathode periphery to minimize edge.
  28. Adams John A. ; Krulik Gerald A. ; Smith Everett D., Method and apparatus for non-contact metal plating of semiconductor wafers using a bipolar electrode assembly.
  29. Talieh Homayoun ; Uzoh Cyprian Emeka, Method and apparatus for plating and polishing a semiconductor substrate.
  30. Etherington Gregory S., Method for forming a semiconductor device.
  31. Thompson Raymon F. (Kalispell MT) Gordon Robert W. (Seattle WA) Durado Daniel (Kalispell MT), Method for single wafer processing in which a semiconductor wafer is contacted with a fluid.
  32. Keigler Arthur, Method of and apparatus for controlling fluid flow and electric fields involved in the electroplating of substantially flat workpieces and the like and more generally controlling fluid flow in the pr.
  33. Andricacos Panayotis (Croton-on-Hudson NY) Branger Moritz (Los Altos CA) Browne Robert M. (San Jose CA) Dukovic John O. (Pleasantville NY) Fu Benjamin W. B. (Cupertino CA) Hitzfeld Robert W. (San Jos, Multi-compartment eletroplating system.
  34. Joseph J. Fatula ; Robert M. Browne, Paddle design for plating bath.
  35. Reynolds H. Vincent (Marcellus NY), Plating cell and plating method with fluid wiper.
  36. Tzanavaras George (2674 Park Wilshire Dr. San Jose CA 95124) Cohen Uri (765 San Antonio Rd. ; #53 Palo Alto CA 94303), Precision high rate electroplating cell and method.
  37. Arken David M. ; Chiu Andrew ; Fatula ; Jr. Joseph John ; Hitzfield Robert William ; Hsiao Wen-Chien David ; Hsiao Yiping, Rotary plater with radially distributed plating solution.
  38. Hanson, Kyle; Dix, Mark; Woodruff, Daniel J.; Schmidt, Wayne J.; Coyle, Kevin W., Semiconductor processing apparatus having linear conveyer system.
  39. Thompson Raymon F. (Lakeside MT) Reardon Timothy J. (Kalispell MT) Owczarz Aleksander (Kalispell MT), Semiconductor processor wafer holder.
  40. Bleck Martin C. ; Reardon Timothy J. ; Bergman Eric J., Semiconductor processor with wafer face protection.
  41. Thompson Raymon F. (Kalispell MT) Owczarz Aleksander (Kalispell MT), Single wafer processor with a frame.
  42. Mease Ronnie C. (2101 B. Ulster Pl. Coram NY 11727) Kolsky Kathryn L. (460 Harrison Ave. Miller Pl. NY 11764) Mausner Leonard F. (16 Seville Ln. Stony Brook NY 11790) Srivastava Suresh C. (8 Penelope, Synthesis of 4-substituted-trans-1,2-diaminocyclohexyl polyaminocarboxylate metal chelating agents for the preparation o.
  43. Wilson, Gregory J.; McHugh, Paul R.; Hanson, Kyle M., System for electrochemically processing a workpiece.
  44. Brophy Denis J. (Staatsburg NY) Datta Madhav (Yorktown Heights NY) Harris Derek B. (Dryden NY) Ryan Frank S. (Boulder CO) Spera Frank A. (Poughkeepsie NY), Tool and method for electroetching.
  45. Dinan Thomas E. (Poughkeepsie NY) Berridge Kirk G. (Fishkill NY) Datta Madhav (Yorktown Heights NY) Kanarsky Thomas S. (Hopewell Junction NY) Pike Michael B. (Hopewell Junction NY) Shenoy Ravindra V., Vertical electroetch tool nozzle and method.
  46. Andricacos Panayotis C. (Croton-on-Hudson NY) Berridge Kirk G. (Fishkill NY) Dukovic John O. (Pleasantville NY) Flotta Matteo (Yorktown Heights NY) Ordonez Jose (Pleasant Valley NY) Poweleit Helmut R, Vertical paddle plating cell.

이 특허를 인용한 특허 (10)

  1. Cohen, Uri, Apparatus for enhanced electrochemical deposition.
  2. Cohen, Uri, Electroplated metallic conductors.
  3. Cohen, Uri, High speed electroplating metallic conductors.
  4. Cohen, Uri, Methods for activating openings for jets electroplating.
  5. Chen, Chao-Peng; Chudasama, Jaswant; Mishra, Pradeep; Lin, Chen-Li; Wagner, David, Paddle for electroplating for selectively depositing greater thickness.
  6. Kuriyama, Fumio; Takemura, Takashi; Saito, Nobutoshi; Kimura, Masaaki; Kiumi, Rei, Plating apparatus.
  7. Kuriyama, Fumio; Takemura, Takashi; Saito, Nobutoshi; Kimura, Masaaki; Kiumi, Rei, Plating apparatus.
  8. Saito, Nobutoshi; Fujikata, Jumpei; Yamamoto, Tadaaki; Kamimura, Kenji, Plating apparatus and plating method.
  9. Saito, Nobutoshi; Fujikata, Jumpei; Yamamoto, Tadaaki; Kamimura, Kenji, Plating apparatus and plating method.
  10. Saito, Nobutoshi; Fujikata, Jumpei; Yamamoto, Tadaaki; Kamimura, Kenji, Plating apparatus and plating method.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로