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A method for producing thin layers of a semiconductor material from a donor wafer, which comprises in succession forming a first weakened region in a donor wafer below a first face and at a depth corresponding substantially to the thickness of a first thin layer to be transferred, detaching the firs

A method for producing thin layers of a semiconductor material from a donor wafer, which comprises in succession forming a first weakened region in a donor wafer below a first face and at a depth corresponding substantially to the thickness of a first thin layer to be transferred, detaching the first thin layer having upper and lower boundaries defined by the first face and the first weakened region, forming a second weakened region in the donor wafer after detachment of the first thin layer and without conducting an intermediate recycling step, with the second weakened region formed below a second face of the donor wafer and at a depth corresponding substantially to the thickness of a second thin layer to be transferred, and detaching the second thin layer having upper and lower boundaries defined by the second face and the second weakened region. Resultant semiconductor-on-insulator structures are also included.

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What is claimed is: 1. A method for producing thin layers of a semiconductor material from a donor wafer in the absence of an intermediate recycling step, which comprises in succession: forming a first weakened region in a donor wafer below a first face and at a depth corresponding substantially to

What is claimed is: 1. A method for producing thin layers of a semiconductor material from a donor wafer in the absence of an intermediate recycling step, which comprises in succession: forming a first weakened region in a donor wafer below a first face and at a depth corresponding substantially to the thickness of a first thin layer to be transferred; detaching from the donor wafer a first thin layer having upper and lower boundaries defined by the first face and the first weakened region; forming a second weakened region in the donor wafer after detachment of the first thin layer and without conducting an intermediate recycling step, with the second weakened region formed below a second face of the donor wafer and at a depth corresponding substantially to the thickness of a second thin layer to be transferred; and detaching from the donor wafer a second thin layer having upper and lower boundaries defined by the second face and the second weakened region. 2. The method of claim 1, wherein the first and second thin layers are located on opposite sides of the donor wafer. 3. The method of claim 2, which further comprises recycling the donor wafer, after detaching the second thin layer, for surface finishing of any remaining portions of the first and second thin layers that were not detached to thus prepare the donor wafer for reuse. 4. The method of claim 3, wherein the recycling comprises simultaneous double-sided polishing of the opposite sides of the donor wafer. 5. The method of claim 1, which further comprises bonding the donor wafer to a target substrate at its first face between forming the first weakened region before detaching the first thin layer, and subsequently bonding the wafer to a second target substrate before detaching the second thin layer. 6. The method of claim 5, which further comprises, prior to forming the second weakened region, inspecting the second face of the donor wafer to confirm that it has a surface roughness that is sufficient to facilitate transfer of the second thin layer. 7. The method of claim 6, wherein the second face of the donor wafer is on an opposite side of the wafer from the first face. 8. The method of claim 6, which further comprises surface finishing the second face of the donor wafer when the inspection shows that the second face does not have a surface roughness that is sufficient to facilitate transfer of the second thin layer. 9. The method of claim 8, wherein the surface finishing comprises at least one of mechanical polishing, chemical-mechanical polishing, sacrificial oxidation, chemical etching, plasma-assisted chemical etching, and annealing in an inert atmosphere. 10. The method of claim 1, which further comprises forming an insulating layer on at least either the first face or second face of the donor wafer, or on both faces, before detaching the first thin layer. 11. The method of claim 10, wherein the insulating layer comprises one of (a) SiO2 formed by thermal oxidation of a silicon surface or by deposition of SiO2 or (b) SiOxNy wherein x is 0 to 3 and y is 0 to 4 but x and y are not both 0. 12. The method of claim 1, wherein the first or second weakened region, or both regions, are formed by implantation of atomic species through the respective face of the donor wafer to define the thickness of the associated thin layer. 13. The method of claim 12, wherein the first or second weakened region, or both regions, are formed by porosification of a respective surface layer of the donor water followed by depositing semiconductor material by chemical vapor deposition on the porosified layer to form the associated thin layer. 14. The method of claim 1, wherein detachment of the first or second thin layer, or both, is carried out by providing a sufficient input of thermal, mechanical, or chemical energy, or a combination thereof. 15. The method of claim 14, wherein the thermal energy comprises a heat treatment at a temperature of about 300째 C. to 500째 C., the mechanical energy comprises forces exerted on the wafer sufficient to cause detachment, or the chemical energy comprises anodizing an initial wafer surface to form a porous semiconductor layer on each surface thereof. 16. The method of claim 1 which further comprises finishing at least one surface of the donor wafer before the forming the first weakened region. 17. The method of claim 16, wherein the surface finishing comprises at least one of mechanical polishing, chemical-mechanical polishing, sacrificial oxidation, chemical etching, plasma-assisted chemical etching, and annealing in an inert atmosphere. 18. The method of claim 16, which further comprises forming an insulating layer on one or all wafer surfaces after the surface finishing. 19. The method of claim 18, wherein the insulating layer comprises one of (a) SiO2 formed by thermal oxidation of a silicon surface or by deposition of SiO2 or (b) SiOxNy wherein x is 0 to 3 and y is 0 to 4 but x and y are not both 0. 20. The method of claim 1, wherein each of the first and second thin layers has a thickness of about 100 nm to 1 micron.