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Apparatus for active temperature control of susceptors

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
  • H01L-021/00
출원번호 US-0103542 (2005-04-12)
등록번호 US-7311782 (2007-12-25)
발명자 / 주소
  • Strang,Eric J.
  • Johnson,Wayne L.
출원인 / 주소
  • Tokyo Electron Limited
대리인 / 주소
    Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
인용정보 피인용 횟수 : 36  인용 특허 : 22

초록

A method and an apparatus utilized for thermal processing of substrates during semiconductor manufacturing. The method includes heating the substrate to a predetermined temperature using a heating assembly, cooling the substrate to the predetermined temperature using a cooling assembly located such

대표청구항

The invention claimed is: 1. A thermal processing apparatus comprising: a heating assembly adapted to support a wafer for processing; a cooling assembly located such that a thermal conductance region is provided between said heating assembly and said cooling assembly; and a device configured to adj

이 특허에 인용된 특허 (22)

  1. Markle, David A.; Hawryluk, Andrew M.; Jeong, Hwan J., Apparatus having line source of radiant energy for exposing a substrate.
  2. James McAndrew ; Hwa-Chi Wang ; Benjamin J. Jurcik, Jr., Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use.
  3. Herchen, Harald, Chamber having improved gas energizer and method.
  4. Eacobacci, Michael J.; Olsen, Donald A., Cryopump with rapid cooldown and increased pressure.
  5. Tseng Jeng-Ding,TWX, Heater assembly with dual temperature control for use in PVD/CVD system.
  6. Christopher Ratliff ; Taiqing Qiu ; Jeff Kowalski ; Morteza Yadollahi ; Saeed Sedehi, Hot wall rapid thermal processor.
  7. Nishi Katsuo (Tokyo JPX) Terada Kazuo (Kumamoto-ken JPX) Ohkase Wataru (Sagamihara JPX) Yamaga Kenichi (Sagamihara JPX), Method and apparatus for controlling temperature in rapid heat treatment system.
  8. Weaver, Robert A.; Wilson, Gregory J.; McHugh, Paul R., Method and apparatus for processing a microelectronic workpiece at an elevated temperature.
  9. Shichida Hiroyuki (Kudamatsu JPX) Tamura Naoyuki (Kudamatsu JPX) Makino Akitaka (Kudamatsu JPX), Method of and apparatus for securing and cooling/heating a wafer.
  10. Kozlov Jury F. (Moscow SUX) Berdnikov Valery M. (Moscow SUX), Method of cooling an object with a thermoelectric battery cascade.
  11. Tepman Avi (Cupertino CA) Grunes Howard (Santa Cruz CA) Andrews Dana (Mountain View CA), Method of heating and cooling a wafer during semiconductor processing.
  12. Johnson, Wayne L.; Strang, Eric J., Multi-zone resistance heater.
  13. Nozawa Toshihisa (Kobe JPX) Arami Junichi (Tokyo JPX) Horioka Keiji (Kawasaki JPX) Hasegawa Isahiro (Zushi JPX), Plasma etching apparatus.
  14. Mahawili, Imad, Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing.
  15. Dhindsa Rajinder, Solid state temperature controlled substrate holder.
  16. Ishikawa Kenji (Sagamihara JPX) Komino Mitsuaki (Tokyo JPX) Mitui Tadashi (Yamanashi JPX) Iwata Teruo (Nirasaki JPX) Arai Izumi (Yokohama JPX) Tahara Yoshifumi (Tokyo JPX), Stage having electrostatic chuck and plasma processing apparatus using same.
  17. Hatta Masataka,JPX, Temperature control apparatus for sample susceptor.
  18. Charles D. Schaper ; Khalid El-Awady ; Thomas Kailath, Temperature processing module.
  19. Gurary Alexander I. ; Armour Eric A. ; Collins Douglas A. ; Stall Richard A., Wafer carriers for epitaxial growth processes.
  20. Kholodenko Arnold, Wafer support with improved temperature control.
  21. Chern Chyi ; Chen Wei,TWX ; Liao Marvin ; Tseng Jennifer Meng Chu ; Chang Mei, Wafer surface temperature control for deposition of thin films.
  22. Jung Jae-hyung,KRX ; Yun Young-hwan,KRX ; Ko Se-jong,KRX ; Yun Min-sang,KRX, Wet station apparatus having quartz heater monitoring system and method of monitoring thereof.

이 특허를 인용한 특허 (36)

  1. Gaff, Keith William; Singh, Harmeet; Comendant, Keith; Vahedi, Vahid, Adjusting substrate temperature to improve CD uniformity.
  2. Gaff, Keith William; Singh, Harmeet; Comendant, Keith; Vahedi, Vahid, Adjusting substrate temperature to improve CD uniformity.
  3. Sharpless, Leonard J.; Comendant, Keith, Apparatus for an optimized plasma chamber top piece.
  4. Nordin, Michael; Gage, Chris; Hamilton, Shawn; Templeton, Sheldon, Closed loop temperature heat up and control utilizing wafer-to-heater pedestal gap modulation.
  5. Pease, John; Benjamin, Neil, Current peak spreading schemes for multiplexed heated array.
  6. Gaff, Keith William; Comendant, Keith, Heating plate with diode planar heater zones for semiconductor processing.
  7. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Heating plate with heating zones for substrate processing and method of use thereof.
  8. Singh, Harmeet, Heating plate with planar heater zones for semiconductor processing.
  9. Singh, Harmeet, Heating plate with planar heater zones for semiconductor processing.
  10. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Heating plate with planar heater zones for semiconductor processing.
  11. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Heating plate with planar heater zones for semiconductor processing.
  12. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Heating plate with planar heating zones for semiconductor processing.
  13. Wallace, Jay R.; Hamelin, Thomas, High throughput processing system for chemical treatment and thermal treatment and method of operating.
  14. Van Cleemput, Patrick A.; Ndiege, Nicholas Muga; Mohn, Jonathan D., Low k dielectric deposition via UV driven photopolymerization.
  15. Draeger, Nerissa Sue; Ashtiani, Kaihan Abidi; Padhi, Deenesh; Wong, Derek B.; van Schravendijk, Bart J.; Antonelli, George Andrew; Kolics, Artur; Zhao, Lie; van Cleemput, Patrick A., Method for selectively sealing ultra low-k porous dielectric layer using flowable dielectric film formed from vapor phase dielectric precursor.
  16. Waldmann, Ole; Pape, Eric A.; Leal-Verdugo, Carlos; Gaff, Keith William, Method of determining thermal stability of a substrate support assembly.
  17. Singh, Harmeet, Methods of fault detection for multiplexed heater array.
  18. Yap, Lipyeow; Nguyen, Tuan Anh; Du Bois, Dale R.; Baluja, Sanjeev; Nowak, Thomas; Rocha-Alvarez, Juan Carlos; Zhou, Jianhua, Multifunctional heater/chiller pedestal for wide range wafer temperature control.
  19. Pease, John; Benjamin, Neil, Multiplexed heater array using AC drive for semiconductor processing.
  20. Pease, John; Benjamin, Nell, Multiplexed heater array using AC drive for semiconductor processing.
  21. Angelov, Ivelin; Severson, Brian; Solomon, Natan, Pedestal covers.
  22. Sharpless, Leonard J.; Comendant, Keith, Plasma chamber top piece assembly.
  23. Sharpless, Leonard J.; Comendant, Keith, Plasma chamber top piece assembly.
  24. Hayami, Toshihiro, Plasma processor.
  25. Gaff, Keith William; Anderson, Tom; Comendant, Keith; Lu, Ralph Jan-Pin; Robertson, Paul; Pape, Eric A.; Benjamin, Neil, Power switching system for ESC with array of thermal control elements.
  26. Brown, Daniel Arthur; Bogart, Jeffrey A.; Kenworthy, Ian J., Replaceable upper chamber parts of plasma processing apparatus.
  27. Nozawa, Toshihisa; Kotani, Koji, Substrate processing apparatus and temperature control device.
  28. Wallace, Jay R.; Takahashi, Hiroyuki, Substrate support for high throughput chemical treatment system.
  29. Singh, Harmeet; Gaff, Keith; Benjamin, Neil; Comendant, Keith, Substrate supports with multi-layer structure including independent operated heater zones.
  30. Mohn, Jonathan D.; te Nijenhuis, Harald; Hamilton, Shawn M.; Madrigal, Kevin; Lingampalli, Ramkishan Rao, System and apparatus for flowable deposition in semiconductor fabrication.
  31. Pease, John, System and method for monitoring temperatures of and controlling multiplexed heater array.
  32. Pease, John, System and method for monitoring temperatures of and controlling multiplexed heater array.
  33. Gowdaru, Keerthi; Shrinivasan, Krishnan, Systems for uniform heat transfer including adaptive portions.
  34. Gaff, Keith William; Comendant, Keith; Ricci, Anthony, Thermal plate with planar thermal zones for semiconductor processing.
  35. Gaff, Keith William; Comendant, Keith; Ricci, Anthony, Thermal plate with planar thermal zones for semiconductor processing.
  36. Reilly, Patrick; te Nijenhuis, Harald; Draeger, Nerissa; van Schravendijk, Bart J.; Ndiege, Nicholas Muga, Treatment for flowable dielectric deposition on substrate surfaces.
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