초록 ▼

A susceptor 24 includes a heater 38 disposed in a planar state, upper and lower ceramic-metal composites 40A and 40B disposed so as to sandwich the heater 38 from above and from below, and a ceramic electrostatic chuck 28 for attracting and holding an object to be treated, W. The electrostatic chuck

A susceptor 24 includes a heater 38 disposed in a planar state, upper and lower ceramic-metal composites 40A and 40B disposed so as to sandwich the heater 38 from above and from below, and a ceramic electrostatic chuck 28 for attracting and holding an object to be treated, W. The electrostatic chuck is joined to an upper surface of the upper ceramic-metal composite 40A. The electrostatic chuck 28 has nearly the same coefficient of linear thermal expansion as that of the upper ceramic-metal composite 40A. Thus, peeling or cracking of the electrostatic chuck 28 due to the difference in thermal expansion and contraction between the electrostatic chuck 28 and the upper ceramic-metal composite 40A can be prevented.

대표청구항 ▼

What is claimed is: 1. An electrode comprising: a base metal formed of a cast metal; a heater embedded in the base metal and arranged on a plane; and a pair of core metal plates embedded in the base metal and arranged substantially parallel to the plane and adjacent to the heater, the core metal pl

What is claimed is: 1. An electrode comprising: a base metal formed of a cast metal; a heater embedded in the base metal and arranged on a plane; and a pair of core metal plates embedded in the base metal and arranged substantially parallel to the plane and adjacent to the heater, the core metal plates being arranged above and below the heater, respectively; wherein the heater and the core metal plates are cast in the base metal such that the core metal plates are entirely surrounded by the base metal and are entirely in metal-to-metal contact with the base metal; wherein a material forming the core metal plates has a rigidity higher than that of a material forming the base metal; and each of the core metal plates has a plurality of through holes, which are filled with the base metal so that the base metal above the respective core metal plates and the base metal below the respective core metal plates are bound together via the base metal filled in the through holes. 2. The electrode according to claim 1, wherein each of the through holes has a diameter ranging from about 0.1 mm to about 10 mm. 3. The electrode according to claim 1, wherein the core metal plates are made of stainless steel, and the base metal is made of aluminum. 4. The electrode according to claim 1, wherein the core metal plates have a thickness ranging from about 1 mm to about 2 mm. 5. The electrode according to claim 1, wherein the core metal plates are disk-shaped. 6. The electrode according to claim 1, wherein the material forming the core metal plates has a softening temperature higher than that of the material forming the base metal. 7. A plasma processing apparatus comprising: a processing vessel; the electrode as defined in claim 1; and a high frequency power source adapted to apply a high frequency voltage to the electrode.