Reduced pressure drying apparatus and reduced pressure drying method
원문보기
IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
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출원번호 |
US-0066317
(2005-02-25)
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등록번호 |
US-7343698
(2008-03-18)
|
우선권정보 |
JP-2004-051687(2004-02-26) |
발명자
/ 주소 |
- Sugimoto,Shinichi
- Honda,Masayuki
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출원인 / 주소 |
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대리인 / 주소 |
Smith, Gambrell & Russell, LLP
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인용정보 |
피인용 횟수 :
5 인용 특허 :
3 |
초록
▼
A reduced pressure drying apparatus comprises a substrate stage section for disposing thereon a substrate having the surface coated with a coating liquid containing a film-forming component and a solvent, a hermetic vessel having the substrate stage section arranged therein, an exhaust means for red
A reduced pressure drying apparatus comprises a substrate stage section for disposing thereon a substrate having the surface coated with a coating liquid containing a film-forming component and a solvent, a hermetic vessel having the substrate stage section arranged therein, an exhaust means for reducing the pressure inside the hermetic vessel, a gaseous stream distribution control plate arranged apart from and in a manner to face the surface of the substrate disposed on the substrate stage section and provided with a plurality of gaseous stream-flowing ports through which flow a gaseous stream, each of the plurality of gaseous stream-flowing ports having a gaseous stream-flowing region, and a control means for controlling the distribution pattern of the gaseous stream-flowing regions of the gaseous stream distribution control plate.
대표청구항
▼
What is claimed is: 1. A reduced pressure drying apparatus, comprising: a substrate stage section for disposing thereon a substrate having a surface coated with a coating liquid containing a film-forming component and a solvent; a hermetic vessel having the substrate stage section arranged therein;
What is claimed is: 1. A reduced pressure drying apparatus, comprising: a substrate stage section for disposing thereon a substrate having a surface coated with a coating liquid containing a film-forming component and a solvent; a hermetic vessel having the substrate stage section arranged therein; an exhaust means for reducing a pressure inside the hermetic vessel; a gaseous stream distribution control plate arranged apart from and in a manner to face the surface of the substrate disposed on the substrate stage section and provided with a plurality of gaseous stream-flowing ports through which flow a gaseous stream, each of the plurality of gaseous stream-flowing ports having a gaseous stream-flowing region; and a control means for controlling a distribution pattern of the gaseous stream-flowing regions of the gaseous stream distribution control plate, wherein the control means permits switching of the distribution pattern of the gaseous stream-flowing regions between a nonuniform distribution pattern over the entire surface of the substrate and a uniform distribution pattern over the entire surface of the substrate, further wherein the nonuniform distribution pattern of the gaseous stream-flowing regions over the entire region of the substrate is determined in accordance with a distribution of solid component concentration in the coating liquid covering the substrate surface. 2. The reduced pressure drying apparatus according to claim 1, wherein the means for controlling the distribution pattern of the gaseous stream-flowing regions comprises an opening-closing mechanism for opening-closing the plurality of gaseous stream-flowing ports and a control means for controlling the opening-closing mechanism. 3. The reduced pressure drying apparatus according to claim 2, wherein the opening-closing mechanism is formed of a piezoelectric element member. 4. The reduced pressure drying apparatus according to claim 1, wherein the plurality of gaseous stream-flowing ports are formed of open portions in the form of slits that are arranged to form a configuration in the form of a mesh on a surface of the gaseous stream distribution control plate. 5. The reduced pressure drying apparatus according to claim 1, wherein the plurality of gaseous stream-flowing ports are formed of arched open portions that are arranged to form a concentric configuration on the surface of the gaseous stream distribution control plate. 6. The reduced pressure drying apparatus according to claim 1, wherein a porous plate is arranged between the substrate disposed on the substrate stage section and the gaseous stream distribution control plate in a manner to face the substrate. 7. A reduced pressure drying method, comprising the steps of: disposing a substrate having a surface coated with a coating liquid containing a film-forming component and a solvent on a substrate stage section arranged within a hermetic vessel; arranging a gaseous stream distribution control plate apart from and in a manner to face the surface of the substrate disposed on the substrate stage section; exhausting the hermetic vessel so as to establish a reduced pressure within the hermetic vessel; and controlling gaseous stream-flowing regions of the gaseous stream distribution control plate such that the gaseous stream formed by a solvent component evaporated from the coating liquid on the substrate is distributed to form a prescribed pattern on a surface of the gaseous stream distribution control plate for discharge to outside of the hermetic vessel, wherein the controlling of the gaseous stream-flowing regions comprises distributing the gaseous stream in a nonuniform pattern over the entire surface of the substrate, followed by distributing the gaseous stream in a uniform pattern over the entire surface of the substrate. 8. A reduced pressure drying method, comprising the steps of: disposing a substrate having a surface coated with a coating liquid containing a film-forming component and a solvent on a substrate stage section arranged within a hermetic vessel; arranging a gaseous stream distribution control plate apart from and in a manner to face the surface of the substrate disposed on the substrate stage section; exhausting the hermetic vessel so as to establish a reduced pressure within the hermetic vessel; and controlling gaseous stream-flowing regions of the gaseous stream distribution control plate such that the gaseous stream formed by a solvent component evaporated from the coating liquid on the substrate is distributed to form a prescribed pattern on a surface of the gaseous stream distribution control plate for discharge to outside of the hermetic vessel wherein the prescribed pattern is determined on the basis of a distribution of a solid component concentration on the surface of the substrate coated with the coating liquid. 9. A computer storage medium containing a software that, when executed, causes a computer to control a reduced pressure drying apparatus equipped with a hermetic vessel using a reduced pressure drying method, the method comprising the steps of: disposing a substrate having a surface coated with a coating liquid containing a film-forming component and a solvent on a substrate stage section arranged within a hermetic vessel; arranging a gaseous stream distribution control plate apart from and in a manner to face the surface of the substrate disposed on the substrate stage section; exhausting the hermetic vessel so as to establish a reduced pressure within the hermetic vessel; and controlling gaseous stream-flowing regions of the gaseous stream distribution control plate such that the gaseous stream formed by a solvent component evaporated from the coating liquid on the substrate is distributed to form a prescribed pattern on a surface of the gaseous stream distribution control plate for discharge to outside of the hermetic vessel, wherein the controlling of the gaseous stream-flowing regions comprises distributing the gaseous stream in a nonuniform pattern over the entire surface of the substrate, followed by distributing the gaseous stream in a uniform pattern over the entire surface of the substrate. 10. A computer storage medium containing a software that, when executed, causes a computer to control a reduced pressure drying apparatus equipped with a hermetic vessel using a reduced pressure drying method, the method comprising the steps of: disposing a substrate having a surface coated with a coating liquid containing a film-forming component and a solvent on a substrate stage section arranged within a hermetic vessel; arranging a gaseous stream distribution control plate apart from and in a manner to face the surface of the substrate disposed on the substrate stage section; exhausting the hermetic vessel so as to establish a reduced pressure within the hermetic vessel; and controlling gaseous stream-flowing regions of the gaseous stream distribution control plate such that the gaseous stream formed by a solvent component evaporated from the coating liquid on the substrate is distributed to form a prescribed pattern on a surface of the gaseous stream distribution control plate for discharge to outside of the hermetic vessel wherein the prescribed pattern of the gaseous stream formed in the step of controlling the gaseous stream-flowing regions is determined on the basis of a distribution of a solid component concentration on the surface of the substrate coated with the coating liquid. 11. A reduced pressure drying apparatus, comprising: a substrate stage section for disposing thereon a substrate having a surface coated with a coating liquid containing a film-forming component and a solvent; a hermetic vessel having the substrate stage section arranged therein; an exhaust means for reducing a pressure inside the hermetic vessel; a gaseous stream distribution control plate arranged apart from and in a manner to face the surface of the substrate disposed on the substrate stage section and provided with a plurality of gaseous stream-flowing ports through which flow a gaseous stream, each of the plurality of gaseous stream-flowing ports having a gaseous stream-flowing region; and a control means for controlling a distribution pattern of the gaseous stream-flowing regions of the gaseous stream distribution control plate, wherein the means for controlling the distribution pattern of the gaseous stream-flowing regions permits switching the distribution pattern of the gaseous stream-flowing regions between a nonuniform distribution pattern over the entire surface of the substrate and a uniform distribution pattern over the entire surface of the substrate, further wherein a plurality of nonuniform distribution patterns of the gaseous stream-flowing regions are prepared in accordance with coating conditions of the coating liquid, and the reduced pressure drying apparatus further comprises a means for selecting the nonuniform distribution pattern in accordance with the coating conditions. 12. The reduced pressure drying apparatus according to claim 11, wherein the means for controlling the distribution pattern of the gaseous stream-flowing regions comprises an opening-closing mechanism for opening-closing the plurality of gaseous stream-flowing ports and a control means for controlling the opening-closing mechanism. 13. The reduced pressure drying apparatus according to claim 12, wherein the opening-closing mechanism is formed of a piezoelectric element member. 14. The reduced pressure drying apparatus according to claim 11, wherein the plurality of gaseous stream-flowing ports are formed of open portions in the form of slits that are arranged to form a configuration in the form of a mesh on a surface of the gaseous stream distribution control plate. 15. The reduced pressure drying apparatus according to claim 11, wherein the plurality of gaseous stream-flowing ports are formed of arched open portions that are arranged to form a concentric configuration on the surface of the gaseous stream distribution control plate. 16. The reduced pressure drying apparatus according to claim 11, wherein a porous plate is arranged between the substrate disposed on the substrate stage section and the gaseous stream distribution control plate in a manner to face the substrate.
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